Inventor · disambiguated record
Rainer Hoch
Also filed as: HOCH RAINER
9 granted patents·2 pending applications·141 citations·filing 2001–2016
88Inventor score
Top patents by PatentIndex Score
11 records- 0186US7436521B2Optical measuring apparatus and operating method for imaging error correction in an optical imaging systemZEISS CARL SMT AG·Filed 2005·Granted Oct 14, 2008·9 cites·17 claims
- 0284US9494483B2Measuring system for measuring an imaging quality of an EUV lensZEISS CARL SMT GMBH·Filed 2014·Granted Nov 15, 2016·5 cites·24 claims
- 0383US7475333B2Defining form formats with layout items that present data of business applicationSAP AG·Filed 2001·Granted Jan 6, 2009·52 cites·20 claims
- 0483US7234105B2Methods and systems for providing a document with interactive elements to retrieve information for processing by business applicationsSAP AG·Filed 2002·Granted Jun 19, 2007·48 cites·6 claims
- 0579US7417745B2Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometryZEISS CARL SMT AG·Filed 2004·Granted Aug 26, 2008·21 cites·4 claims
- 0675US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 0770US8330935B2Exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2010·Granted Dec 11, 2012·2 cites·24 claims
- 0869US7400388B2Method for determining distortion and/or image surfaceZEISS CARL SMT AG·Filed 2005·Granted Jul 15, 2008·3 cites·10 claims
- 0961US10345710B2Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Jul 9, 2019·0 cites·22 claims
- 1057US2008309894A1Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1148US2007070316A1Microlithographic projection exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →