Inventor · disambiguated record
Gim-Syang Chen
Also filed as: CHEN GIM-SYANG
9 granted patents·6 pending applications·81 citations·filing 2002–2021
87Inventor score
Top patents by PatentIndex Score
15 records- 0187US8084280B2Method of manufacturing a solar cell using a pre-cleaning step that contributes to homogeneous texture morphologyKASHKOUSH ISMAIL·Filed 2010·Granted Dec 27, 2011·7 cites·20 claims
- 0278US6837944B2Cleaning and drying method and apparatusAKRION LLC·Filed 2002·Granted Jan 4, 2005·24 cites·8 claims
- 0372US7169253B2Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturingAKRION TECHNOLOGIES INC·Filed 2004·Granted Jan 30, 2007·10 cites·9 claims
- 0472US6626189B2Method of processing substrates using pressurized mist generationAKRION LLC·Filed 2002·Granted Sep 30, 2003·13 cites·14 claims
- 0571US6532974B2Process tank with pressurized mist generationAKRION LLC·Filed 2002·Granted Mar 18, 2003·13 cites·15 claims
- 0665US7976718B2System and method for selective etching of silicon nitride during substrate processingAKRION SYSTEMS LLC·Filed 2004·Granted Jul 12, 2011·10 cites·16 claims
- 0759US2021210352A1Correlation between conductivity and ph measurements for koh texturing solutions and additivesNAURA AKRION INC·Filed 2021·Application pending·0 cites
- 0858US6818563B2Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzlesAKRION LLC·Filed 2003·Granted Nov 16, 2004·4 cites·26 claims
- 0955US10991589B2Correlation between conductivity and pH measurements for KOH texturing solutions and additivesNAURA AKRION INC·Filed 2018·Granted Apr 27, 2021·0 cites·9 claims
- 1051US10170350B2Correlation between conductivity and pH measurements for KOH texturing solutions and additivesAKRION SYSTEMS LLC·Filed 2015·Granted Jan 1, 2019·0 cites·17 claims
- 1149US2007123052A1Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturingKASHKOUSH ISMAIL·Filed 2007·Application pending·0 cites
- 1242US2008169007A1Apparatus and method for processing a hydrophobic surface of a substrateKASHKOUSH ISMAIL·Filed 2007·Application pending·0 cites
- 1340US2015118785A1Method for consistently texturizing silicon wafers during solar cell wet chemical processingAKRION SYSTEMS LLC·Filed 2013·Application pending·0 cites
- 1438US2003139057A1Process and apparatus for removal of photoresist from semiconductor wafersFiled 2002·Application pending·0 cites
- 1537US2014305471A1Reduced consumptions stand alone rinse tool having self-contained closed-loop fluid circuit, and method of rinsing substrates using the sameKASHKOUSH ISMAIL·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →