Inventor · disambiguated record
David Mordo
Also filed as: MORDO DAVID
15 granted patents·985 citations·filing 1990–2016
95Inventor score
Files withNOVELLUS SYSTEMS INC10APPLIED MATERIALS INC1BANDYOPADHYAY ANANDA K1MOSLEHI MEHRDAD M1PROCESSING TECHNOLOGIES INC AG1
Top patents by PatentIndex Score
15 records- 0198US7265061B1Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical propertiesNOVELLUS SYSTEMS INC·Filed 2004·Granted Sep 4, 2007·632 cites·38 claims
- 0296US7611757B1Method to improve mechanical strength of low-K dielectric film using modulated UV exposureNOVELLUS SYSTEMS INC·Filed 2007·Granted Nov 3, 2009·39 cites·20 claims
- 0395US7253125B1Method to improve mechanical strength of low-k dielectric film using modulated UV exposureNOVELLUS SYSTEMS INC·Filed 2004·Granted Aug 7, 2007·82 cites·32 claims
- 0493US8043667B1Method to improve mechanical strength of low-K dielectric film using modulated UV exposureNOVELLUS SYSTEMS INC·Filed 2009·Granted Oct 25, 2011·18 cites·17 claims
- 0592US7241704B1Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groupsNOVELLUS SYSTEMS INC·Filed 2004·Granted Jul 10, 2007·58 cites·30 claims
- 0691US7473653B1Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groupsNOVELLUS SYSTEMS INC·Filed 2007·Granted Jan 6, 2009·12 cites·18 claims
- 0788US7622400B1Method for improving mechanical properties of low dielectric constant materialsNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 24, 2009·42 cites·28 claims
- 0887US8715788B1Method to improve mechanical strength of low-K dielectric film using modulated UV exposureBANDYOPADHYAY ANANDA K·Filed 2011·Granted May 6, 2014·9 cites·18 claims
- 0983US7799705B1Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groupsNOVELLUS SYSTEMS INC·Filed 2009·Granted Sep 21, 2010·5 cites·20 claims
- 1079US5114242ABichannel radiation detection methodPROCESSING TECHNOLOGIES INC AG·Filed 1990·Granted May 19, 1992·54 cites·9 claims
- 1171US7781351B1Methods for producing low-k carbon doped oxide films with low residual stressNOVELLUS SYSTEMS INC·Filed 2004·Granted Aug 24, 2010·14 cites·30 claims
- 1263US9870937B2High productivity deposition reactor comprising a gas flow chamber having a tapered gas flow spaceMOSLEHI MEHRDAD M·Filed 2011·Granted Jan 16, 2018·1 cites·8 claims
- 1363US9659769B1Tensile dielectric films using UV curingVARADARAJAN BHADRI·Filed 2004·Granted May 23, 2017·9 cites·35 claims
- 1442US6214526B1Semiconductor processing using antireflective layer having high wet etch rateNOVELLUS SYSTEMS INC·Filed 1998·Granted Apr 10, 2001·10 cites·12 claims
- 1541US10192762B2Systems and methods for detecting the existence of one or more environmental conditions within a substrate processing systemAPPLIED MATERIALS INC·Filed 2016·Granted Jan 29, 2019·0 cites·18 claims
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