Inventor · disambiguated record
Holger Tuitje
Also filed as: TUITJE HOLGER · TUITJE HOLGER A
17 granted patents·7 pending applications·54 citations·filing 1995–2024
92Inventor score
Top patents by PatentIndex Score
24 records- 0192US10473525B2Spatially resolved optical emission spectroscopy (OES) in plasma processingTOKYO ELECTRON LTD·Filed 2017·Granted Nov 12, 2019·6 cites·20 claims
- 0284US9970818B2Spatially resolved optical emission spectroscopy (OES) in plasma processingTOKYO ELECTRON LTD·Filed 2014·Granted May 15, 2018·5 cites·19 claims
- 0383US12261030B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2024·Granted Mar 25, 2025·0 cites·10 claims
- 0482US10978278B2Normal-incident in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2018·Granted Apr 13, 2021·2 cites·19 claims
- 0580US9059038B2System for in-situ film stack measurement during etching and etch control methodTOKYO ELECTRON LTD·Filed 2013·Granted Jun 16, 2015·5 cites·10 claims
- 0673US2024418501A1Optical sensor for film thickness measurementTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0772US7428044B2Drift compensation for an optical metrology toolTOKYO ELECTRON LTD·Filed 2006·Granted Sep 23, 2008·3 cites·29 claims
- 0872US7215419B2Method and apparatus for position-dependent optical metrology calibrationTOKYO ELECTRON LTD·Filed 2006·Granted May 8, 2007·2 cites·17 claims
- 0971US7095496B2Method and apparatus for position-dependent optical metrology calibrationTOKYO ELECTRON LTD·Filed 2002·Granted Aug 22, 2006·7 cites·21 claims
- 1070US9846088B2Differential acoustic time of flight measurement of temperature of semiconductor substratesTOKYO ELECTRON LTD·Filed 2014·Granted Dec 19, 2017·2 cites·20 claims
- 1169US11961721B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2021·Granted Apr 16, 2024·0 cites·8 claims
- 1269US7924422B2Calibration method for optical metrologyTOKYO ELECTRON LTD·Filed 2009·Granted Apr 12, 2011·5 cites·16 claims
- 1369US7446888B2Matching optical metrology tools using diffraction signalsTOKYO ELECTRON LTD·Filed 2006·Granted Nov 4, 2008·6 cites·25 claims
- 1467US7224450B2Method and apparatus for position-dependent optical metrology calibrationTOKYO ELECTRON LTD·Filed 2006·Granted May 29, 2007·1 cites·4 claims
- 1566US2025060324A1Hybrid x-ray and optical metrology and navigationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1665US7446887B2Matching optical metrology tools using hypothetical profilesTOKYO ELECTRON LTD·Filed 2006·Granted Nov 4, 2008·2 cites·25 claims
- 1764US7505148B2Matching optical metrology tools using spectra enhancementTOKYO ELECTRON LTD·Filed 2006·Granted Mar 17, 2009·1 cites·37 claims
- 1859US2025164410A1Optical metrologyTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1954US2025112065A1Metrology integrated with vacuum processingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2054US2020043764A1Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using sameTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2154US2020006100A1Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using sameTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2253US8107073B2Diffraction order sorting filter for optical metrologyNORTON ADAM·Filed 2009·Granted Jan 31, 2012·2 cites·16 claims
- 2337US2018286643A1Advanced optical sensor, system, and methodologies for etch processing monitoringTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 2429US5621220AApparatus for evaluating measuring valuesHONEYWELL AG·Filed 1995·Granted Apr 15, 1997·5 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →