Inventor · disambiguated record
Seishi Fujiwara
Also filed as: FUJIWARA SEISHI
23 granted patents·6 pending applications·404 citations·filing 1995–2013
96Inventor score
Files withNIKON CORP27
Top patents by PatentIndex Score
29 records- 0193US6649268B1Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical memberNIKON CORP·Filed 2000·Granted Nov 18, 2003·25 cites·13 claims
- 0287US6505484B1Forming method of silica glass and forming apparatus thereofNIKON CORP·Filed 2000·Granted Jan 14, 2003·16 cites·8 claims
- 0384US5679125AMethod for producing silica glass for use with light in a vacuum ultraviolet wavelength rangeNIKON CORP·Filed 1995·Granted Oct 21, 1997·59 cites·9 claims
- 0483US6374639B2Silica glass and its manufacturing methodNIKON CORP·Filed 2001·Granted Apr 23, 2002·10 cites·15 claims
- 0583US5958809AFluorine-containing silica glassNIKON CORP·Filed 1997·Granted Sep 28, 1999·47 cites·7 claims
- 0682US6291377B1Silica glass and its manufacturing methodNIKON CORP·Filed 1998·Granted Sep 18, 2001·25 cites·18 claims
- 0781US6339033B2Silica glass having superior durability against excimer laser beams and method for manufacturing the sameNIKON CORP·Filed 2000·Granted Jan 15, 2002·9 cites·17 claims
- 0877US6094940AManufacturing method of synthetic silica glassNIKON CORP·Filed 1999·Granted Aug 1, 2000·23 cites·10 claims
- 0977US5702495ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1995·Granted Dec 30, 1997·29 cites·7 claims
- 1076US5699183ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1995·Granted Dec 16, 1997·25 cites·10 claims
- 1176US5696624ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1996·Granted Dec 9, 1997·24 cites·3 claims
- 1275US6473226B1Silica glass memberNIKON CORP·Filed 2000·Granted Oct 29, 2002·13 cites·14 claims
- 1373US6061174AImage-focusing optical system for ultraviolet laserNIKON CORP·Filed 1998·Granted May 9, 2000·32 cites·19 claims
- 1469US6174830B1Silica glass having superior durability against excimer laser beams and method for manufacturing the sameNIKON CORP·Filed 1998·Granted Jan 16, 2001·16 cites·14 claims
- 1566US6587262B1UV synthetic silica glass optical member and reduction projection exposure apparatus using the sameNIKON CORP·Filed 2000·Granted Jul 1, 2003·7 cites·12 claims
- 1666US6587181B2Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatusNIKON CORP·Filed 2002·Granted Jul 1, 2003·8 cites·4 claims
- 1760US6378340B2Manufacturing method of synthetic silica glassNIKON CORP·Filed 2000·Granted Apr 30, 2002·1 cites·49 claims
- 1859US5703712ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1995·Granted Dec 30, 1997·11 cites·3 claims
- 1958US2005284177A1Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical memberNIKON CORP·Filed 2005·Application pending·0 cites
- 2052US2004095566A1Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical memberFiled 2003·Application pending·0 cites
- 2149US9580331B2CaF2 polycrystalline body, focus ring, plasma processing apparatus, and method for producing CaF2 polycrystalline bodyNIKON CORP·Filed 2013·Granted Feb 28, 2017·0 cites·8 claims
- 2249US2005047986A1Synthetic quartz glass member and method for producing the sameNIKON CORP·Filed 2004·Application pending·0 cites
- 2348US6075607AMethod for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical memberNIKON CORP·Filed 1998·Granted Jun 13, 2000·13 cites·19 claims
- 2445US2002144517A1Synthetic silica glass optical member and method of manufacturing the sameNIKON CORP·Filed 2002·Application pending·0 cites
- 2544US2003037568A1Fluorine-containing silica glass and its method of manufactureNIKON CORP·Filed 2002·Application pending·0 cites
- 2644US2002050152A1Synthetic silica glass molding method, synthetic silica glass molding apparatus, and synthetic silica glassFiled 2001·Application pending·0 cites
- 2741US6442973B1Synthetic silica glass and its manufacturing methodNIKON CORP·Filed 1999·Granted Sep 3, 2002·6 cites·34 claims
- 2841US6373554B1Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatusNIKON CORP·Filed 1999·Granted Apr 16, 2002·5 cites·19 claims
- 2938US6835683B2Quartz glass member and projection alignerNIKON CORP·Filed 2002·Granted Dec 28, 2004·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →