Inventor · disambiguated record
Hiromitsu Nanba
Also filed as: NANBA HIROMITSU
17 granted patents·2 pending applications·115 citations·filing 2003–2019
93Inventor score
Top patents by PatentIndex Score
19 records- 0191US8043467B2Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Oct 25, 2011·21 cites·26 claims
- 0290US7998308B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Aug 16, 2011·16 cites·12 claims
- 0388US8113221B2Substrate cleaning method, substrate cleaning apparatus and computer readable recording mediumNANBA HIROMITSU·Filed 2011·Granted Feb 14, 2012·10 cites·14 claims
- 0482US7793610B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Sep 14, 2010·8 cites·20 claims
- 0581US7354484B2Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Apr 8, 2008·7 cites·7 claims
- 0679US10490424B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Nov 26, 2019·2 cites·9 claims
- 0779US8479753B2Liquid processing apparatus and methodNANBA HIROMITSU·Filed 2007·Granted Jul 9, 2013·7 cites·13 claims
- 0879US7275553B2Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Oct 2, 2007·22 cites·27 claims
- 0973US8051862B2Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Nov 8, 2011·4 cites·10 claims
- 1072US7699939B2Substrate cleaning methodTOKYO ELECTRON LTD·Filed 2006·Granted Apr 20, 2010·4 cites·16 claims
- 1165US10403518B2Substrate processing method, substrate processing apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Sep 3, 2019·1 cites·5 claims
- 1265US8043440B2Cleaning apparatus and method and computer readable mediumTOKYO ELECTRON LTD·Filed 2007·Granted Oct 25, 2011·2 cites·10 claims
- 1364US8152933B2Substrate processing apparatus, substrate processing method, and drain cup cleaning methodNANBA HIROMITSU·Filed 2007·Granted Apr 10, 2012·2 cites·6 claims
- 1462US8444772B2Liquid processing apparatusITOH NORIHIRO·Filed 2009·Granted May 21, 2013·2 cites·8 claims
- 1562US7927429B2Substrate cleaning method, substrate cleaning apparatus and computer readable recording mediumTOKYO ELECTRON LTD·Filed 2004·Granted Apr 19, 2011·7 cites·12 claims
- 1655US2020016623A1Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1747US7749333B2Substrate processing apparatus and methodTOKYO ELECTRON LTD·Filed 2008·Granted Jul 6, 2010·0 cites·10 claims
- 1840US10431448B2Wet etching method, substrate liquid processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Oct 1, 2019·0 cites·8 claims
- 1929US2015323250A1Substrate processing apparatus, deposit removing method of substrate processing apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →