Inventor · disambiguated record
Satoshi Niikura
Also filed as: NIIKURA SATOSHI
15 granted patents·2 pending applications·103 citations·filing 1993–2007
92Inventor score
Files withTOKYO OHKA KOGYO CO LTD17
Top patents by PatentIndex Score
17 records- 0172US6492085B1Positive photoresist composition and process and synthesizing polyphenol compoundTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Dec 10, 2002·10 cites·6 claims
- 0265US6296992B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Oct 2, 2001·6 cites·7 claims
- 0360US6207340B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Mar 27, 2001·4 cites·6 claims
- 0454US7358028B2Chemically amplified positive photo resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 15, 2008·10 cites·10 claims
- 0553US5728504APositive photoresist compositions and multilayer resist materials using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Mar 17, 1998·15 cites·12 claims
- 0652US5518860APositive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compoundTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted May 21, 1996·13 cites·5 claims
- 0751US6869742B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 22, 2005·5 cites·6 claims
- 0848US5332647APositive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated articleTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 26, 1994·9 cites·10 claims
- 0947US6620978B2Positive photoresist composition and process for synthesizing polyphenol compoundTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Sep 16, 2003·1 cites·2 claims
- 1047US5384228AAlkali-developable positive-working photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jan 24, 1995·8 cites·7 claims
- 1146US6177226B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jan 23, 2001·7 cites·2 claims
- 1243US6106994AProduction process of polyphenol diesters, and positive photosensitive compositionsTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Aug 22, 2000·2 cites·6 claims
- 1343US5738968APositive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Apr 14, 1998·8 cites·8 claims
- 1442US2004137359A1Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 1541US6964838B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 15, 2005·0 cites·4 claims
- 1639US5702861APositive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 30, 1997·5 cites·9 claims
- 1734US2007117045A1Chemical amplification type positive photoresist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →