Inventor · disambiguated record
Ryo Ohkubo
Also filed as: OHKUBO RYO
29 granted patents·7 pending applications·73 citations·filing 1999–2024
95Inventor score
Top patents by PatentIndex Score
36 records- 0198US11762279B2Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Sep 19, 2023·3 cites·13 claims
- 0297US11435662B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Sep 6, 2022·3 cites·13 claims
- 0390US11281089B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Mar 22, 2022·4 cites·20 claims
- 0486US11119400B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Sep 14, 2021·2 cites·20 claims
- 0584US10915016B2Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Feb 9, 2021·3 cites·20 claims
- 0683US9625805B2Reflective mask blank, reflective mask and method of manufacturing reflective maskHOYA CORP·Filed 2015·Granted Apr 18, 2017·2 cites·22 claims
- 0783US2025044677A1Mask blankHOYA CORP·Filed 2024·Application pending·0 cites
- 0881US12007684B2Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2023·Granted Jun 11, 2024·0 cites·34 claims
- 0979US10101650B2Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Oct 16, 2018·2 cites·22 claims
- 1079US9494852B2Mask blank and method of manufacturing phase shift maskHOYA CORP·Filed 2013·Granted Nov 15, 2016·2 cites·15 claims
- 1177US7115341B2Halftone phase shift mask blank, halftone phase shift mask, and method of producing the sameHOYA CORP·Filed 2003·Granted Oct 3, 2006·14 cites·8 claims
- 1274US7282305B2Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defectHOYA CORP·Filed 2004·Granted Oct 16, 2007·17 cites·15 claims
- 1374US7011910B2Halftone-type phase-shift mask blank, and halftone-type phase-shift maskHOYA CORP·Filed 2003·Granted Mar 14, 2006·13 cites·20 claims
- 1473US10481485B2Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Nov 19, 2019·1 cites·29 claims
- 1570US11022875B2Mask blank, phase shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Jun 1, 2021·1 cites·27 claims
- 1669US12153338B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2020·Granted Nov 26, 2024·0 cites·14 claims
- 1765US9726972B2Mask blank, transfer mask, and method for manufacturing transfer maskHOYA CORP·Filed 2014·Granted Aug 8, 2017·1 cites·21 claims
- 1863US11630388B2Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2020·Granted Apr 18, 2023·0 cites·11 claims
- 1963US10527931B2Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Jan 7, 2020·0 cites·20 claims
- 2063US8221941B2Photomask blank manufacturing method and photomask manufacturing methodSUZUKI TOSHIYUKI·Filed 2009·Granted Jul 17, 2012·1 cites·24 claims
- 2162US11415875B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Aug 16, 2022·0 cites·19 claims
- 2259US2020150524A1Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2020·Application pending·0 cites
- 2358US9952497B2Mask blank and method of manufacturing phase shift maskHOYA CORP·Filed 2016·Granted Apr 24, 2018·0 cites·16 claims
- 2457US9075315B2Reflective mask blank, reflective mask and method of manufacturing reflective maskHOYA CORP·Filed 2012·Granted Jul 7, 2015·0 cites·17 claims
- 2556US7632612B2Halftone phase shift mask blank, halftone phase shift mask, and method of producing the sameHOYA CORP·Filed 2006·Granted Dec 15, 2009·1 cites·5 claims
- 2655US11009787B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted May 18, 2021·0 cites·19 claims
- 2755US2024337919A1Mask blank, phase shift mask, and method for producing semiconductor deviceHOYA CORP·Filed 2022·Application pending·0 cites
- 2854US10571797B2Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Feb 25, 2020·0 cites·36 claims
- 2950US9029048B2Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2012·Granted May 12, 2015·0 cites·18 claims
- 3049US10365555B2Mask blank, transfer mask and methods of manufacturing the sameHOYA CORP·Filed 2014·Granted Jul 30, 2019·0 cites·9 claims
- 3146US2022179300A1Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2020·Application pending·0 cites
- 3245US2022043335A1Mask blank, transfer mask, and semiconductor-device manufacturing methodHOYA CORP·Filed 2019·Application pending·0 cites
- 3345US2022035235A1Mask blank, transfer mask, and semiconductor-device manufacturing methodHOYA CORP·Filed 2019·Application pending·0 cites
- 3441US11054735B2Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jul 6, 2021·0 cites·23 claims
- 3538US2019040516A1Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2017·Application pending·0 cites
- 3634US6317480B1Method of manufacturing X-ray mask and X-ray mask blank, and X-ray mask and X-ray mask blank manufactured therebyHOYA CORP·Filed 1999·Granted Nov 13, 2001·3 cites·5 claims
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