Inventor · disambiguated record
Johannes Wilhelmus De Klerk
Also filed as: DE KLERK JOHANNES WILHELMUS
12 granted patents·228 citations·filing 2004–2009
90Inventor score
Files withASML NETHERLANDS BV9DE JONG FREDERIK EDUARD1DE KLERK JOHANNES WILHELMUS1VAN DAM MARINUS JOHANNES MARIA1
Top patents by PatentIndex Score
12 records- 0198US7511799B2Lithographic projection apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 31, 2009·179 cites·11 claims
- 0290US7724351B2Lithographic apparatus, device manufacturing method and exchangeable optical elementASML NETHERLANDS BV·Filed 2006·Granted May 25, 2010·12 cites·34 claims
- 0384US7670731B2Method for exposing a substrate and lithographic projection apparatusASML NETHERLANDS BV·Filed 2006·Granted Mar 2, 2010·7 cites·14 claims
- 0484US7580113B2Method of reducing a wave front aberration, and computer program productASML NETHERLANDS BV·Filed 2006·Granted Aug 25, 2009·12 cites·21 claims
- 0578US7595863B2Lithographic apparatus, excimer laser and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 29, 2009·5 cites·21 claims
- 0673US8514365B2Lithographic apparatus and device manufacturing methodDE JONG FREDERIK EDUARD·Filed 2007·Granted Aug 20, 2013·5 cites·20 claims
- 0764US7732110B2Method for exposing a substrate and lithographic projection apparatusASML NETHERLANDS BV·Filed 2009·Granted Jun 8, 2010·1 cites·20 claims
- 0858US7355674B2Lithographic apparatus, device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2004·Granted Apr 8, 2008·4 cites·20 claims
- 0956US7655368B2Method for exposing a substrate and lithographic projection apparatusASML NETHERLANDS BV·Filed 2004·Granted Feb 2, 2010·3 cites·29 claims
- 1048US8068210B2Lithographic apparatus, device manufacturing method and computer program productDE KLERK JOHANNES WILHELMUS·Filed 2008·Granted Nov 29, 2011·0 cites·23 claims
- 1146US7889316B2Method for patterning a radiation beam, patterning device for patterning a radiation beamASML NETHERLANDS BV·Filed 2006·Granted Feb 15, 2011·0 cites·19 claims
- 1242US8675176B2Parameter control in a lithographic apparatus using polarizationVAN DAM MARINUS JOHANNES MARIA·Filed 2006·Granted Mar 18, 2014·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →