Inventor · disambiguated record
Raviv Yohanan
Also filed as: YOHANAN RAVIV
14 granted patents·43 citations·filing 2015–2023
88Inventor score
Top patents by PatentIndex Score
14 records- 0198US10527951B2Compound imaging metrology targetsKLA TENCOR CORP·Filed 2016·Granted Jan 7, 2020·18 cites·21 claims
- 0297US11355375B2Device-like overlay metrology targets displaying Moiré effectsKLA CORP·Filed 2020·Granted Jun 7, 2022·6 cites·21 claims
- 0392US11862524B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jan 2, 2024·2 cites·20 claims
- 0491US10274837B2Metrology target for combined imaging and scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 30, 2019·5 cites·18 claims
- 0588US11532566B2Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devicesKLA CORP·Filed 2020·Granted Dec 20, 2022·2 cites·19 claims
- 0688US10002806B2Metrology targets with filling elements that reduce inaccuracies and maintain contrastKLA TENCOR CORP·Filed 2015·Granted Jun 19, 2018·6 cites·22 claims
- 0787US12111580B2Optical metrology utilizing short-wave infrared wavelengthsKLA CORP·Filed 2021·Granted Oct 8, 2024·2 cites·38 claims
- 0880US12055859B2Overlay mark design for electron beam overlayKLA CORP·Filed 2023·Granted Aug 6, 2024·0 cites·15 claims
- 0976US10303835B2Method and apparatus for direct self assembly in target design and productionKLA TENCOR CORP·Filed 2015·Granted May 28, 2019·2 cites·26 claims
- 1070US11703767B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jul 18, 2023·0 cites·10 claims
- 1166US11067904B2System for combined imaging and scatterometry metrologyKLA TENCOR CORP·Filed 2019·Granted Jul 20, 2021·0 cites·22 claims
- 1256US11720031B2Overlay design for electron beam and scatterometry overlay measurementsKLA CORP·Filed 2021·Granted Aug 8, 2023·0 cites·12 claims
- 1347US10401841B2Identifying registration errors of DSA linesKLA TENCOR CORP·Filed 2015·Granted Sep 3, 2019·0 cites·20 claims
- 1442US11353493B2Data-driven misregistration parameter configuration and measurement system and methodKLA TENCOR CORP·Filed 2019·Granted Jun 7, 2022·0 cites·19 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →