Inventor · disambiguated record
Faruk Gungor
Also filed as: GUNGOR FARUK
12 granted patents·2 pending applications·402 citations·filing 2010–2019
89Inventor score
Top patents by PatentIndex Score
14 records- 0198USRE47440EApparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2017·Granted Jun 18, 2019·360 cites·31 claims
- 0291US8955547B2Apparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2013·Granted Feb 17, 2015·15 cites·20 claims
- 0389US10407771B2Atomic layer deposition chamber with thermal lidAPPLIED MATERIALS INC·Filed 2014·Granted Sep 10, 2019·12 cites·18 claims
- 0487US10418246B2Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformityAPPLIED MATERIALS INC·Filed 2017·Granted Sep 17, 2019·4 cites·8 claims
- 0587US10175093B2Apparatus for sensing a level of a processing medium in a delivery apparatusAPPLIED MATERIALS INC·Filed 2016·Granted Jan 8, 2019·2 cites·14 claims
- 0686US9145612B2Deposition of N-metal films comprising aluminum alloysAPPLIED MATERIALS INC·Filed 2013·Granted Sep 29, 2015·3 cites·18 claims
- 0781US10770300B2Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Sep 8, 2020·2 cites·15 claims
- 0879US9109754B2Apparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2012·Granted Aug 18, 2015·4 cites·26 claims
- 0966USRE48994EApparatus and method for providing uniform flow of gasAPPLIED MATERIALS INC·Filed 2019·Granted Mar 29, 2022·0 cites·33 claims
- 1059US9683287B2Deposition of films comprising aluminum alloys with high aluminum contentAPPLIED MATERIALS INC·Filed 2013·Granted Jun 20, 2017·0 cites·15 claims
- 1150US11598003B2Substrate processing chamber having heated showerhead assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Mar 7, 2023·0 cites·7 claims
- 1247US2012135609A1Apparatus and Process for Atomic Layer DepositionYUDOVSKY JOSEPH·Filed 2010·Application pending·0 cites
- 1343US2010305884A1Methods for determining the quantity of precursor in an ampouleAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1439US11380557B2Apparatus and method for gas delivery in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2017·Granted Jul 5, 2022·0 cites·12 claims
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