Inventor · disambiguated record
Khalid Makhamreh
Also filed as: MAKHAMREH KHALID
23 granted patents·7 pending applications·283 citations·filing 1999–2025
95Inventor score
Files withAPPLIED MATERIALS INC17NANOCLEAN TECHNOLOGIES INC7ALLIED SIGNAL INC1APPLIED MATERALS INC1DYNATEX1
Top patents by PatentIndex Score
30 records- 0193US11798799B2Ultraviolet and ozone clean systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 24, 2023·2 cites·20 claims
- 0290US6530823B1Methods for cleaning surfaces substantially free of contaminantsNANOCLEAN TECHNOLOGIES INC·Filed 2000·Granted Mar 11, 2003·70 cites·50 claims
- 0389US11803118B2Methods and apparatus for photomask processingAPPLIED MATERIALS INC·Filed 2021·Granted Oct 31, 2023·2 cites·20 claims
- 0486US7297286B2Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminantsNANOCLEAN TECHNOLOGIES INC·Filed 2005·Granted Nov 20, 2007·12 cites·20 claims
- 0585US6764385B2Methods for resist stripping and cleaning surfaces substantially free of contaminantsNANOCLEAN TECHNOLOGIES INC·Filed 2002·Granted Jul 20, 2004·34 cites·24 claims
- 0684US6427096B1Processing tool interface apparatus for use in manufacturing environmentHONEYWELL INT INC·Filed 1999·Granted Jul 30, 2002·61 cites·40 claims
- 0781US12128456B2Megasonic clean with cavity property monitoringAPPLIED MATERIALS INC·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 0880US6543462B1Apparatus for cleaning surfaces substantially free of contaminantsNANO CLEAN TECHNOLOGIES INC·Filed 2000·Granted Apr 8, 2003·36 cites·22 claims
- 0977US12159782B2Ultraviolet and ozone clean systemAPPLIED MATERIALS INC·Filed 2023·Granted Dec 3, 2024·0 cites·20 claims
- 1077US7101260B2Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminantsNANOCLEAN TECHNOLOGIES INC·Filed 2005·Granted Sep 5, 2006·6 cites·19 claims
- 1175US12233441B2Ultraviolet and ozone cleaning apparatus and method of usingAPPLIED MATERIALS INC·Filed 2022·Granted Feb 25, 2025·0 cites·8 claims
- 1274US11654460B2Megasonic clean with cavity property monitoringAPPLIED MATERIALS INC·Filed 2021·Granted May 23, 2023·0 cites·9 claims
- 1373US2024027894A1Methods and apparatus for photomask processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1472US7066789B2Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminantsMANOCLEAN TECHNOLOGIES INC·Filed 2005·Granted Jun 27, 2006·6 cites·19 claims
- 1572US2025161999A1Ultraviolet and ozone cleaning apparatus and method of usingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1671US11114350B2Method for removing photoresist from photomask substrateAPPLIED MATERIALS INC·Filed 2019·Granted Sep 7, 2021·1 cites·15 claims
- 1770US6945853B2Methods for cleaning utilizing multi-stage filtered carbon dioxideNANOCLEAN TECHNOLOGIES INC·Filed 2004·Granted Sep 20, 2005·12 cites·20 claims
- 1869US6719613B2Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxideNANOCLEAN TECHNOLOGIES INC·Filed 2003·Granted Apr 13, 2004·12 cites·1 claims
- 1960US11644748B2Multi-volume baking chamber for mask cleanAPPLIED MATERIALS INC·Filed 2021·Granted May 9, 2023·0 cites·15 claims
- 2060US6249990B1Method and apparatus for transporting articlesALLIED SIGNAL INC·Filed 1999·Granted Jun 26, 2001·24 cites·48 claims
- 2160US2025157800A1Oxidation-Reduction Adjustable PlasmaAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2259US12085849B2Baking chamber with shroud for mask cleanAPPLIED MATERIALS INC·Filed 2021·Granted Sep 10, 2024·0 cites·19 claims
- 2359US10962889B2Method and apparatus for high throughput photomask curingAPPLIED MATERIALS INC·Filed 2019·Granted Mar 30, 2021·0 cites·20 claims
- 2459US10928724B2Attachment feature removal from photomask in extreme ultraviolet lithography applicationAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·0 cites·19 claims
- 2556US7040961B2Methods for resist stripping and cleaning surfaces substantially free of contaminantsNANOCLEAN TECHNOLOGIES INC·Filed 2004·Granted May 9, 2006·5 cites·28 claims
- 2656US2024118603A1Methods and apparatus for ruthenium oxide reduction on extreme ultraviolet photomasksAPPLIED MATERALS INC·Filed 2022·Application pending·0 cites
- 2756US2024339324A1Atmospheric Pressure Plasma for Substrate AnnealingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2853US11921422B2Single-volume baking chamber for mask cleanAPPLIED MATERIALS INC·Filed 2021·Granted Mar 5, 2024·0 cites·19 claims
- 2946US2021185793A1Adhesive material removal from photomask in ultraviolet lithography applicationAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3044US2008213978A1Debris management for wafer singulationDYNATEX·Filed 2007·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →