Inventor · disambiguated record
Tsuyoshi Hida
Also filed as: HIDA TSUYOSHI
7 granted patents·4 pending applications·67 citations·filing 1999–2022
80Inventor score
Top patents by PatentIndex Score
11 records- 0193US9076636B2Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the methodOHATA MITSUNORI·Filed 2011·Granted Jul 7, 2015·29 cites·5 claims
- 0268US11942357B2Workpiece placement apparatus and processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Mar 26, 2024·0 cites·10 claims
- 0366US10020172B2Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the methodTOKYO ELECTRON LTD·Filed 2015·Granted Jul 10, 2018·1 cites·3 claims
- 0465US6199582B1Flow control valveADVANCE DENKI KOGYO KK·Filed 1999·Granted Mar 13, 2001·36 cites·9 claims
- 0556US8517392B2Electrostatic chuck and manufacturing method thereofHIDA TSUYOSHI·Filed 2009·Granted Aug 27, 2013·1 cites·13 claims
- 0654US11410871B2Workpiece placement apparatus and processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Aug 9, 2022·0 cites·9 claims
- 0752US8776356B2Electrostatic chuck and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2013·Granted Jul 15, 2014·0 cites·18 claims
- 0852US2009223932A1Electrode unit, substrate processing apparatus, and temperature control method for electrode unitTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 0947US2015170891A1Particle backflow preventing part and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1040US2012273135A1Electrode unit, substrate processing apparatus, and temperature control method for electrode unitHIDA TSUYOSHI·Filed 2012·Application pending·0 cites
- 1133US2004083970A1Vacuum processing deviceFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →