Inventor · disambiguated record
Clément Lansalot-Matras
Also filed as: LANSALOT-MATRAS CLEMENT · LANSALOT-MATRAS CLÉMENT
36 granted patents·21 pending applications·539 citations·filing 2008–2021
96Inventor score
Files withAIR LIQUIDE15DUSSARRAT CHRISTIAN12L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude12LANSALOT-MATRAS CLEMENT4KOROLEV ANDREY V3
Top patents by PatentIndex Score
57 records- 0198US9691771B2Vanadium-containing film forming compositions and vapor deposition of vanadium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Jun 27, 2017·471 cites·20 claims
- 0296US10094021B2Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2015·Granted Oct 9, 2018·15 cites·19 claims
- 0394US10174423B2Niobium-containing film forming compositions and vapor deposition of Niobium-containing filmsAIR LIQUIDE·Filed 2017·Granted Jan 8, 2019·5 cites·6 claims
- 0491US8617649B2Cyclopentadienyl transition metal precursors for deposition of transition metal-containing filmsDUSSARRAT CHRISTIAN·Filed 2012·Granted Dec 31, 2013·4 cites·16 claims
- 0590US10023462B2Niobium-Nitride film forming compositions and vapor deposition of Niobium-Nitride filmsAIR LIQUIDE·Filed 2015·Granted Jul 17, 2018·4 cites·16 claims
- 0688US9099301B1Preparation of lanthanum-containing precursors and deposition of lanthanum-containing filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR I ETUDE ET I EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2013·Granted Aug 4, 2015·10 cites·17 claims
- 0787US9518075B2Group 5 cyclopentadienyl transition metal-containing precursors for deposition of group 5 transition metal-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2013·Granted Dec 13, 2016·3 cites·20 claims
- 0887US9499571B2Germanium- and zirconium-containing compositions for vapor deposition of zirconium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2014·Granted Nov 22, 2016·4 cites·20 claims
- 0982US9416443B2Method for the deposition of a ruthenium containing film using arene diazadiene ruthenium(0) precursorsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2012·Granted Aug 16, 2016·5 cites·20 claims
- 1082US8236979B2Methods for synthesis of heteroleptic cyclopentadienyl transition metal precursorsDUSSARRAT CHRISTIAN·Filed 2009·Granted Aug 7, 2012·3 cites·5 claims
- 1181US9786671B2Niobium-containing film forming compositions and vapor deposition of niobium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Oct 10, 2017·2 cites·19 claims
- 1281US8686138B2Heteroleptic pyrrolecarbaldimine precursorsKOROLEV ANDREY V·Filed 2011·Granted Apr 1, 2014·2 cites·19 claims
- 1380US11549182B2Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2021·Granted Jan 10, 2023·0 cites·9 claims
- 1480US9663547B2Silicon- and Zirconium-containing compositions for vapor deposition of Zirconium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2014·Granted May 30, 2017·2 cites·10 claims
- 1577US8691985B2Heteroleptic pyrrolecarbaldimine precursorsKOROLEV ANDREY V·Filed 2011·Granted Apr 8, 2014·2 cites·19 claims
- 1676US9206507B2Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing films depositionsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2012·Granted Dec 8, 2015·3 cites·18 claims
- 1775US10731251B2Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2018·Granted Aug 4, 2020·0 cites·20 claims
- 1875US8298616B2Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing filmsDUSSARRAT CHRISTIAN·Filed 2009·Granted Oct 30, 2012·1 cites·19 claims
- 1974US11162175B2Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2020·Granted Nov 2, 2021·0 cites·13 claims
- 2069US11021793B2Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2018·Granted Jun 1, 2021·0 cites·2 claims
- 2167US12173403B2Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing filmsAIR LIQUIDE·Filed 2021·Granted Dec 24, 2024·0 cites·4 claims
- 2266US9868753B2Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Jan 16, 2018·0 cites·20 claims
- 2365US10106887B2Group 5 transition metal-containing compounds for vapor deposition of group 5 transition metal-containing filmsAIR LIQUIDE·Filed 2013·Granted Oct 23, 2018·1 cites·12 claims
- 2462US8349738B2Metal precursors for deposition of metal-containing filmsAIR LIQUIDE·Filed 2011·Granted Jan 8, 2013·1 cites·16 claims
- 2558US2015072085A1Titanium bis diazadienyl precursor for vapor deposition of titanium oxide filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2014·Application pending·0 cites
- 2657US8906457B2Method of atomic layer deposition using metal precursorsTHOMPSON DAVID·Filed 2012·Granted Dec 9, 2014·0 cites·20 claims
- 2756US9748249B2Tantalum-containing film forming compositions and vapor deposition of tantalum-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Aug 29, 2017·0 cites·19 claims
- 2856US9691770B2Vanadium-containing film forming compositions and vapor deposition of vanadium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Jun 27, 2017·0 cites·19 claims
- 2954US9034761B2Heteroleptic (allyl)(pyrroles-2-aldiminate) metal-containing precursors, their synthesis and vapor deposition thereof to deposit metal-containing filmsLANSALOT-MATRAS CLÉMENT·Filed 2012·Granted May 19, 2015·1 cites·20 claims
- 3052US9790591B2Titanium-containing film forming compositions for vapor deposition of titanium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2015·Granted Oct 17, 2017·0 cites·20 claims
- 3151US2016032454A1Bis(alkylimido)-bis(alkylamido)tungsten molecules for deposition of tungsten-containing filmsAIR LIQUIDE·Filed 2013·Application pending·0 cites
- 3250US2013089681A1Plasma-enhanced deposition of titanium-containing films for various applications using amidinate titanium precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 3350US2016040289A1Bis(alkylimido)-bis(alkylamido)molybdenum molecules for deposition of molybdenum-containing filmsGATINEAU JULIEN·Filed 2014·Application pending·0 cites
- 3450US2010119406A1Allyl-containing precursors for the deposition of metal-containing filmsDUSSARRAT CHRISTIAN·Filed 2009·Application pending·0 cites
- 3550US2013089680A1Plasma-enhanced deposition of ruthenium-containing films for various applications using amidinate ruthenium precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 3650US2010256405A1Synthesis of allyl-containing precursors for the deposition of metal-containing filmsDUSSARRAT CHRISTIAN·Filed 2009·Application pending·0 cites
- 3750US2013089679A1Plasma-enhanced deposition of manganese-containing films for various applications using amidinate manganese precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 3850US2013084407A1Plasma-enhanced deposition of copper-containing films for various applications using amidinate copper precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 3950US2013089678A1Plasma-enhanced deposition of nickel-containing films for various applications using amidinate nickel precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 4049US10648087B2Etching reactants and plasma-free etching processes using the sameAIR LIQUIDE·Filed 2016·Granted May 12, 2020·0 cites·16 claims
- 4149US9121093B2Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereofDUSSARRAT CHRISTIAN·Filed 2010·Granted Sep 1, 2015·0 cites·10 claims
- 4248US10106568B2Hafnium-containing film forming compositions for vapor deposition of hafnium-containing filmsAIR LIQUIDE·Filed 2016·Granted Oct 23, 2018·0 cites·15 claims
- 4347US8431719B1Heteroleptic pyrrolecarbaldimine precursorsKOROLEV ANDREY V·Filed 2011·Granted Apr 30, 2013·0 cites·13 claims
- 4446US8076243B2Metal precursors for deposition of metal-containing filmsDUSSARRAT CHRISTIAN·Filed 2010·Granted Dec 13, 2011·0 cites·5 claims
- 4546US2012308739A1Methods for deposition of alkaline earth metal fluoride filmsLANSALOT-MATRAS CLEMENT·Filed 2012·Application pending·0 cites
- 4645US8530592B2Catalyst components based on fulvene complexesLANSALOT-MATRAS CLEMENT·Filed 2008·Granted Sep 10, 2013·0 cites·14 claims
- 4744US8436115B2Catalyst systems based on carbonylamino fulvenesLANSALOT-MATRAS CLEMENT·Filed 2008·Granted May 7, 2013·0 cites·13 claims
- 4843US2016002786A1Bis(alkylimido)-bis(alkylamido)molybdenum molecules for deposition of molybdenum-containing filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET I EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2015·Application pending·0 cites
- 4940US2013337192A1Bis-pyrroles-2-aldiminate manganese precursors for deposition of manganese containing filmsAIR LIQUIDE·Filed 2011·Application pending·0 cites
- 5039US2010003532A1Beta-diketiminate precursors for metal containing film depositionFEIST BENJAMIN J·Filed 2009·Application pending·0 cites
Showing the top 50 of 57 patent records by PatentIndex Score.
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