Inventor · disambiguated record
Michael M. Crouse
Also filed as: CROUSE MICHAEL · CROUSE MICHAEL M · CROUSE MICHAEL MATTHEW · CROUSE MICHAEL MATTHEW M
7 granted patents·3 pending applications·58 citations·filing 2003–2023
80Inventor score
Files withIBM5ASML NETHERLANDS BV1CHARTERED SEMICONDUCTOR MFG1CROUSE DAVID THOMAS1CROUSE MICHAEL MATTHEW M1
Top patents by PatentIndex Score
10 records- 0184US7537870B2Lithography process optimization and systemCHARTERED SEMICONDUCTOR MFG·Filed 2006·Granted May 26, 2009·12 cites·20 claims
- 0284US6869671B1Enabling nanostructured materials via multilayer thin film precursor and applications to biosensorsUNIV NOTRE DAME·Filed 2003·Granted Mar 22, 2005·42 cites·53 claims
- 0376US10725454B2Mask process aware calibration using mask pattern fidelity inspectionsIBM·Filed 2018·Granted Jul 28, 2020·1 cites·20 claims
- 0464US7493186B2Method and algorithm for the control of critical dimensions in a thermal flow processIBM·Filed 2006·Granted Feb 17, 2009·2 cites·12 claims
- 0563US2025217705A1Method for radiation spectrum aware source mask optimization for lithographyASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0658US7975246B2MEEF reduction by elongation of square shapesIBM·Filed 2008·Granted Jul 5, 2011·1 cites·20 claims
- 0751US2011247690A1Semiconductor devices comprising antireflective conductive layers and methods of making and usingCROUSE DAVID THOMAS·Filed 2009·Application pending·0 cites
- 0849US7892705B2Photomask and method of making thereofIBM·Filed 2007·Granted Feb 22, 2011·0 cites·13 claims
- 0945US2009191468A1Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist FeaturesIBM·Filed 2008·Application pending·0 cites
- 1038US9940427B2Lens heating aware source mask optimization for advanced lithographyCROUSE MICHAEL MATTHEW M·Filed 2013·Granted Apr 10, 2018·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →