Inventor · disambiguated record
Yasunobu Someya
Also filed as: SOMEYA YASUNOBU
27 granted patents·4 pending applications·56 citations·filing 2011–2020
94Inventor score
Files withNISSAN CHEMICAL IND LTD14NISSAN CHEMICAL CORP13SHINJO TETSUYA2OKUYAMA HIROAKI1SOMEYA YASUNOBU1
Top patents by PatentIndex Score
31 records- 0190US8993215B2Resist underlayer film forming composition containing phenylindole-containing novolac resinNISSAN CHEMICAL IND LTD·Filed 2013·Granted Mar 31, 2015·11 cites·8 claims
- 0289US9746772B2Resist underlayer film forming composition for lithography containing polyether structure-containing resinNISSAN CHEMICAL IND LTD·Filed 2016·Granted Aug 29, 2017·5 cites·9 claims
- 0388US10804111B2Method for roughening surface using wet treatmentNISSAN CHEMICAL IND LTD·Filed 2016·Granted Oct 13, 2020·5 cites·16 claims
- 0487US9263286B2Diarylamine novolac resinNISSAN CHEMICAL IND LTD·Filed 2012·Granted Feb 16, 2016·8 cites·13 claims
- 0583US9263285B2Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resinSHINJO TETSUYA·Filed 2011·Granted Feb 16, 2016·7 cites·10 claims
- 0682US10865262B2Upper-layer film forming composition and method for producing a phase-separated patternNISSAN CHEMICAL CORP·Filed 2017·Granted Dec 15, 2020·3 cites·14 claims
- 0780US9469777B2Resist underlayer film forming composition that contains novolac resin having polynuclear phenolNISSAN CHEMICAL IND LTD·Filed 2013·Granted Oct 18, 2016·4 cites·12 claims
- 0878US9261790B2Resist underlayer film-forming composition containing copolymer resin having heterocyclic ringNISSAN CHEMICAL IND LTD·Filed 2013·Granted Feb 16, 2016·4 cites·15 claims
- 0974US11460771B2Protective film forming composition having an acetal structureNISSAN CHEMICAL CORP·Filed 2018·Granted Oct 4, 2022·1 cites·12 claims
- 1074US9384977B2Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography processNISSAN CHEMICAL IND LTD·Filed 2013·Granted Jul 5, 2016·2 cites·12 claims
- 1173US9343324B2Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resinSHINJO TETSUYA·Filed 2012·Granted May 17, 2016·3 cites·8 claims
- 1271US12222651B2Resist underlayer film forming composition having a disulfide structureNISSAN CHEMICAL CORP·Filed 2019·Granted Feb 11, 2025·1 cites·12 claims
- 1369US12072631B2Resist underlayer film-forming composition and method for forming resist pattern using the sameNISSAN CHEMICAL CORP·Filed 2019·Granted Aug 27, 2024·1 cites·25 claims
- 1455US9514949B2Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structureSOMEYA YASUNOBU·Filed 2012·Granted Dec 6, 2016·1 cites·14 claims
- 1555US2023103242A1Method for producing polymerNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 1655US2023029997A1Composition for forming resist underlayer filmNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 1754US11674053B2Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structureNISSAN CHEMICAL IND LTD·Filed 2014·Granted Jun 13, 2023·0 cites·14 claims
- 1853US10508181B2Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compoundNISSAN CHEMICAL IND LTD·Filed 2013·Granted Dec 17, 2019·0 cites·11 claims
- 1952US10280328B2Bottom layer film-forming composition of self-organizing film containing styrene structureNISSAN CHEMICAL IND LTD·Filed 2013·Granted May 7, 2019·0 cites·9 claims
- 2049US12510823B2Resist underlayer film-forming composition containing alicyclic compound-terminated polymerNISSAN CHEMICAL CORP·Filed 2020·Granted Dec 30, 2025·0 cites·19 claims
- 2149US11768436B2Protective film forming composition having a diol structureNISSAN CHEMICAL CORP·Filed 2018·Granted Sep 26, 2023·0 cites·9 claims
- 2247US10995172B2Self-organized film-forming composition for use in forming a micro-phase-separated patternNISSAN CHEMICAL CORP·Filed 2018·Granted May 4, 2021·0 cites·11 claims
- 2347US2013189533A1Resist underlayer film forming composition for lithography containing polyether structure-containing resinOKUYAMA HIROAKI·Filed 2011·Application pending·0 cites
- 2444US12087576B2Composition for forming coating film and method for manufacturing semiconductor deviceNISSAN CHEMICAL CORP·Filed 2019·Granted Sep 10, 2024·0 cites·3 claims
- 2544US11592747B2Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resinNISSAN CHEMICAL IND LTD·Filed 2013·Granted Feb 28, 2023·0 cites·16 claims
- 2644US2016147151A1Resist underlayer film-forming composition contaning pyrrole novolac resinNISSAN CHEMICAL IND LTD·Filed 2014·Application pending·0 cites
- 2741US12030974B2Composition for forming block copolymer layer for formation of microphase-separated patternNISSAN CHEMICAL CORP·Filed 2019·Granted Jul 9, 2024·0 cites·6 claims
- 2840US11440985B2Underlayer film-forming composition for use in forming a microphase-separated patternNISSAN CHEMICAL CORP·Filed 2018·Granted Sep 13, 2022·0 cites·16 claims
- 2938US11339242B2Method for manufacturing semiconductor substrate having group-III nitride compound layerNISSAN CHEMICAL CORP·Filed 2017·Granted May 24, 2022·0 cites·7 claims
- 3038US10295907B2Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structureNISSAN CHEMICAL IND LTD·Filed 2015·Granted May 21, 2019·0 cites·11 claims
- 3135US11194251B2Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structureNISSAN CHEMICAL IND LTD·Filed 2015·Granted Dec 7, 2021·0 cites·4 claims
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