Inventor · disambiguated record
Minoru Hanazaki
Also filed as: HANAZAKI MINORU
18 granted patents·2 pending applications·667 citations·filing 1986–2008
96Inventor score
Top patents by PatentIndex Score
20 records- 0194US6287980B1Plasma processing method and plasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Sep 11, 2001·186 cites·40 claims
- 0291US4894510AApparatus for uniformly distributing plasma over a substrateMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Jan 16, 1990·58 cites·22 claims
- 0390US4947085APlasma processorMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Aug 7, 1990·48 cites·10 claims
- 0487US6054016AMagnetically enhanced microwave plasma generating apparatusMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Apr 25, 2000·61 cites·9 claims
- 0584US6109208APlasma generating apparatus with multiple microwave introducing meansMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Aug 29, 2000·50 cites·8 claims
- 0684US5275651AMonodisperse vaterite type calcium carbonate, its manufacturing method and method of controlling growth of particles and shape thereofMARUO CALCIUM·Filed 1991·Granted Jan 4, 1994·42 cites·5 claims
- 0783US6929712B2Plasma processing apparatus capable of evaluating process performanceRENESAS TECH CORP·Filed 2002·Granted Aug 16, 2005·24 cites·7 claims
- 0877US5494651AMethod for manufacturing monodisperse vaterite type calcium carbonateMARUO CALCIUM·Filed 1993·Granted Feb 27, 1996·28 cites·5 claims
- 0973US6273023B1Plasma processing apparatus capable of reliably, electrostatically attracting and holding and thus fixing semiconductor waferMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Aug 14, 2001·26 cites·10 claims
- 1069US6218196B1Etching apparatus, etching method, manufacturing method of a semiconductor device, and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Apr 17, 2001·41 cites·9 claims
- 1168US6033780AFine particles of petaloid porous hydroxyapatite and process for producing the sameMARUO CALCIUM·Filed 1996·Granted Mar 7, 2000·30 cites·19 claims
- 1266US7790478B2Manufacturing method of semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2008·Granted Sep 7, 2010·3 cites·27 claims
- 1362US4725318AFiller for paper-making and neutral paper-making process by the use thereofMARUO CALCIUM·Filed 1986·Granted Feb 16, 1988·25 cites·2 claims
- 1452US6864982B2Gas analyzing method and gas analyzer for semiconductor treaterRENESAS TECH CORP·Filed 2002·Granted Mar 8, 2005·2 cites·6 claims
- 1551US6024105ASemiconductor manufacturing device and method of removing particles therefromMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Feb 15, 2000·16 cites·19 claims
- 1648US6416618B2Wafer processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jul 9, 2002·16 cites·18 claims
- 1745US5844022AAdditive for synthetic resins and synthetic resin compositionsMARUO CALCIUM·Filed 1996·Granted Dec 1, 1998·7 cites·11 claims
- 1844US2003056899A1Semiconductor processing apparatus and manufacturing method of semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
- 1939US2004182311A1Semiconductor processing apparatus having semiconductor wafer mountingRENESAS TECH CORP·Filed 2004·Application pending·0 cites
- 2037US5976687AAdditive for synthetic resins and a synthetic resin compositionMARUO CALCIUM·Filed 1998·Granted Nov 2, 1999·4 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →