Inventor · disambiguated record
Walter Glashauser
Also filed as: GLASHAUSER WALTER
14 granted patents·330 citations·filing 1981–2003
94Inventor score
Top patents by PatentIndex Score
14 records- 0188US6419567B1Retaining ring for chemical-mechanical polishing (CMP) head, polishing apparatus, slurry cycle system, and methodSEMICONDUCTOR 300 GMBH & CO KG·Filed 2000·Granted Jul 16, 2002·48 cites·14 claims
- 0284US6812141B1Recessed metal lines for protective enclosure in integrated circuitsINFINEON TECHNOLOGIES AG·Filed 2003·Granted Nov 2, 2004·39 cites·32 claims
- 0381US7070479B2Arrangement and method for conditioning a polishing padINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jul 4, 2006·41 cites·9 claims
- 0480US6103592AManufacturing self-aligned polysilicon fet devices isolated with maskless shallow trench isolation and gate conductor fill technology with active devices and dummy doped regions formed in mesasIBM·Filed 1997·Granted Aug 15, 2000·68 cites·16 claims
- 0575US6739013B2Wafer cleaning apparatusINFINEON TECHNOLOGIES SC300·Filed 2001·Granted May 25, 2004·22 cites·9 claims
- 0674US6375549B1Polishing head for wafer, and method for polishingMOTOROLA INC·Filed 2000·Granted Apr 23, 2002·22 cites·17 claims
- 0763US6824456B2Configuration for polishing disk-shaped objectsINFINEON TECHNOLOGIES SC300·Filed 2003·Granted Nov 30, 2004·10 cites·20 claims
- 0862US6974770B2Self-aligned mask to reduce cell layout areaIBM·Filed 2003·Granted Dec 13, 2005·10 cites·19 claims
- 0960US5804490AMethod of filling shallow trenchesIBM·Filed 1997·Granted Sep 8, 1998·27 cites·6 claims
- 1058US7097535B2Method and configuration for conditioning a polishing pad surfaceINFINEON TECHNOLOGIES AG·Filed 2002·Granted Aug 29, 2006·9 cites·7 claims
- 1158US4393129AMethod of stress-free development of irradiated polymethylmetacrylateSIEMENS AG·Filed 1981·Granted Jul 12, 1983·17 cites·5 claims
- 1257US6593238B1Method for determining an endpoint and semiconductor waferMOTOROLA INC·Filed 2000·Granted Jul 15, 2003·7 cites·15 claims
- 1348US4528071AProcess for the production of masks having a metal carrier foilSIEMENS AG·Filed 1984·Granted Jul 9, 1985·9 cites·10 claims
- 1437US7156933B2Configuration and method for mounting a backing film to a polish headINFINEON TECHNOLOGIES SC 300 G·Filed 2003·Granted Jan 2, 2007·1 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →