Inventor · disambiguated record
Terufumi Wakiyama
Also filed as: WAKIYAMA TERUFUMI
10 granted patents·2 pending applications·28 citations·filing 2012–2021
84Inventor score
Technology areasH10P
Top patents by PatentIndex Score
12 records- 0191US9773687B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Sep 26, 2017·11 cites·17 claims
- 0284US9953848B2Substrate liquid processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·6 cites·15 claims
- 0381US8845815B2Liquid processing apparatus, liquid processing method, and computer-readable recording medium having program stored thereinOGATA NOBUHIRO·Filed 2012·Granted Sep 30, 2014·5 cites·5 claims
- 0474US9387520B2Liquid processing apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2013·Granted Jul 12, 2016·4 cites·10 claims
- 0572US10297473B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted May 21, 2019·1 cites·15 claims
- 0664US10276425B2Substrate processing systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 30, 2019·1 cites·12 claims
- 0753US9108231B2Liquid processing apparatus, liquid processing method, and computer-readable recording medium having program stored thereinTOKYO ELECTRON LTD·Filed 2014·Granted Aug 18, 2015·0 cites·6 claims
- 0847US12269052B2Substrate liquid processing apparatus and liquid discharge evaluation methodTOKYO ELECTRON LTD·Filed 2021·Granted Apr 8, 2025·0 cites·16 claims
- 0942US2014137893A1Substrate processing apparatus, substrate processing method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1039US11322373B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 3, 2022·0 cites·15 claims
- 1139US10460962B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Oct 29, 2019·0 cites·9 claims
- 1239US2018185856A1Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →