Inventor · disambiguated record
Hitoshi Osaki
Also filed as: OSAKI HITOSHI
16 granted patents·7 pending applications·8 citations·filing 2011–2021
86Inventor score
Top patents by PatentIndex Score
23 records- 0191US11426761B2Modification method of surface of base, composition, and polymerJSR CORP·Filed 2020·Granted Aug 30, 2022·2 cites·18 claims
- 0279US9594303B2Resist pattern-forming method and photoresist compositionJSR CORP·Filed 2014·Granted Mar 14, 2017·4 cites·9 claims
- 0378US10923342B2Selective modification method of a base material surfaceJSR CORP·Filed 2019·Granted Feb 16, 2021·2 cites·20 claims
- 0466US11705331B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2021·Granted Jul 18, 2023·0 cites·20 claims
- 0559US10950438B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2019·Granted Mar 16, 2021·0 cites·19 claims
- 0658US11525067B2Modification method of substrate surface, and composition and polymerJSR CORP·Filed 2019·Granted Dec 13, 2022·0 cites·16 claims
- 0757US10394121B2Pattern-forming method and compositionJSR CORP·Filed 2018·Granted Aug 27, 2019·0 cites·14 claims
- 0851US11211246B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2019·Granted Dec 28, 2021·0 cites·20 claims
- 0950US11370872B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2019·Granted Jun 28, 2022·0 cites·19 claims
- 1050US2021318614A9Pattern-forming method and radiation-sensitive compositionJSR CORP·Filed 2020·Application pending·0 cites
- 1149US10175575B2Pattern-forming method and compositionJSR CORP·Filed 2016·Granted Jan 8, 2019·0 cites·18 claims
- 1248US10691019B2Pattern-forming method and compositionJSR CORP·Filed 2019·Granted Jun 23, 2020·0 cites·20 claims
- 1347US9040221B2Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compoundOSAKI HITOSHI·Filed 2011·Granted May 26, 2015·0 cites·11 claims
- 1446US2019194365A1Composition, modification method and selective modification method of base material surface, pattern-forming method, and polymerJSR CORP·Filed 2019·Application pending·0 cites
- 1544US11462405B2Pattern-forming method and patterned substrateJSR CORP·Filed 2019·Granted Oct 4, 2022·0 cites·20 claims
- 1644US2020148845A1Method for forming cover filmJSR CORP·Filed 2019·Application pending·0 cites
- 1744US2015093704A1Radiation-sensitive resin composition, resist-patterning method, and block copolymerJSR CORP·Filed 2014·Application pending·0 cites
- 1843US11460767B2Composition for film formation, film-forming method and directed self-assembly lithography processJSR CORP·Filed 2019·Granted Oct 4, 2022·0 cites·17 claims
- 1942US11195714B2Pattern-forming methodJSR CORP·Filed 2020·Granted Dec 7, 2021·0 cites·18 claims
- 2042US9847232B1Pattern-forming methodJSR CORP·Filed 2017·Granted Dec 19, 2017·0 cites·5 claims
- 2142US2020013617A1Substrate treatment method, substrate treatment system and directed self-assembling materialJSR CORP·Filed 2019·Application pending·0 cites
- 2235US2018192524A1Forming method of contact hole patternJSR CORP·Filed 2016·Application pending·0 cites
- 2333US2017255096A1Pattern-forming methodJSR CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →