Inventor · disambiguated record
Taira Takase
Also filed as: TAKASE TAIRA
17 granted patents·1 pending application·321 citations·filing 2002–2021
94Inventor score
Top patents by PatentIndex Score
18 records- 0194US7166200B2Method and apparatus for an improved upper electrode plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 23, 2007·49 cites·56 claims
- 0293US7163585B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Jan 16, 2007·56 cites·24 claims
- 0392US7166166B2Method and apparatus for an improved baffle plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 23, 2007·40 cites·34 claims
- 0491US7811428B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Oct 12, 2010·14 cites·24 claims
- 0591US7566368B2Method and apparatus for an improved upper electrode plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Jul 28, 2009·13 cites·75 claims
- 0691US6798519B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Sep 28, 2004·44 cites·40 claims
- 0790US7678226B2Method and apparatus for an improved bellows shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Mar 16, 2010·15 cites·35 claims
- 0888US6790289B2Method of cleaning a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Sep 14, 2004·22 cites·14 claims
- 0985US11032899B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Jun 8, 2021·4 cites·9 claims
- 1081US8117986B2Apparatus for an improved deposition shield in a plasma processing systemSAIGUSA HIDEHITO·Filed 2006·Granted Feb 21, 2012·6 cites·22 claims
- 1181US7204912B2Method and apparatus for an improved bellows shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Apr 17, 2007·23 cites·30 claims
- 1277US7137353B2Method and apparatus for an improved deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Nov 21, 2006·32 cites·49 claims
- 1370US8118936B2Method and apparatus for an improved baffle plate in a plasma processing systemSAIGUSA HIDEHITO·Filed 2007·Granted Feb 21, 2012·2 cites·26 claims
- 1468US11825589B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Nov 21, 2023·0 cites·22 claims
- 1566US10727101B2Mounting table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 28, 2020·1 cites·19 claims
- 1661US11705356B2Mounting table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 18, 2023·0 cites·13 claims
- 1750US2004216769A1Method of cleaning a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1843US7585385B2Plasma processing apparatus, control method thereof and program for performing sameTOKYO ELECTRON LTD·Filed 2005·Granted Sep 8, 2009·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →