Inventor · disambiguated record
Dinesh N. Khanna
Also filed as: KHANNA DINESH · KHANNA DINESH N
51 granted patents·3 pending applications·1,265 citations·filing 1987–2010
99Inventor score
Files withHOECHST CELANESE CORP32CLARIANT FINANCE BVI LTD15CABOT MICROELECTRONICS CORP5KHANNA DINESH N1
Top patents by PatentIndex Score
54 records- 0198US4927736AHydroxy polyimides and high temperature positive photoresists therefromHOECHST CELANESE CORP·Filed 1987·Granted May 22, 1990·165 cites·36 claims
- 0297US4803147APhotosensitive polyimide polymer compositionsHOECHST CELANESE CORP·Filed 1987·Granted Feb 7, 1989·93 cites·16 claims
- 0394US5037720AHydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and useHOECHST CELANESE CORP·Filed 1989·Granted Aug 6, 1991·62 cites·4 claims
- 0492US7582127B2Polishing composition for a tungsten-containing substrateCABOT MICROELECTRONICS CORP·Filed 2007·Granted Sep 1, 2009·21 cites·13 claims
- 0591US5994430AAntireflective coating compositions for photoresist compositions and use thereofCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 30, 1999·42 cites·22 claims
- 0689US4931540APolymers prepared from 4,4'-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydrideHOECHST CELANESE CORP·Filed 1987·Granted Jun 5, 1990·39 cites·40 claims
- 0789US4845183AHeat resistant polyamide and polybenzoxazole from bis-((amino-hydroxyphenyl)hexafluoroisopropyl)diphenyl ethersHOECHST CELANESE CORP·Filed 1987·Granted Jul 4, 1989·40 cites·14 claims
- 0887US5077378APolyamide containing the hexafluoroisopropylidene groupHOECHST CELANESE CORP·Filed 1990·Granted Dec 31, 1991·40 cites·6 claims
- 0987US5021320APolyamide containing the hexafluoroisopropylidene group with O-quinone diazide in positive working photoresistHOECHST CELANESE CORP·Filed 1989·Granted Jun 4, 1991·37 cites·21 claims
- 1085US5981145ALight absorbing polymersCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 9, 1999·59 cites·7 claims
- 1183US4980447APolyamide-polyimide and polybenzoxazole-polyimide polymerHOECHST CELANESE CORP·Filed 1989·Granted Dec 25, 1990·28 cites·19 claims
- 1282US5071948APolyamide-polyimide and polybenzoxazole-polyimide polymerHOECHST CELANESE CORP·Filed 1990·Granted Dec 10, 1991·29 cites·11 claims
- 1381US5733714AAntireflective coating for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 1996·Granted Mar 31, 1998·78 cites·28 claims
- 1480US7294576B1Tunable selectivity slurries in CMP applicationsCABOT MICROELECTRONICS CORP·Filed 2006·Granted Nov 13, 2007·9 cites·13 claims
- 1578US5106720ABase developable negative acting photoresistsHOECHST CELANESE CORP·Filed 1989·Granted Apr 21, 1992·23 cites·10 claims
- 1678US4939215AHeat resistant polybenzoxazole from bis-((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl etherHOECHST CELANESE CORP·Filed 1989·Granted Jul 3, 1990·26 cites·13 claims
- 1778US4925915APolymers prepared from 4,4'-bis(2-(amino(halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl etherHOECHST CELANESE CORP·Filed 1987·Granted May 15, 1990·22 cites·65 claims
- 1877US5101005ACrosslinkable polyimides from bis (aminophenoxy) benzonitrilesHOECHST CELANESE CORP·Filed 1989·Granted Mar 31, 1992·22 cites·7 claims
- 1977US4978733APolyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymer having at least one fluorine-containing linking groupHOECHST CELANESE CORP·Filed 1989·Granted Dec 18, 1990·21 cites·13 claims
- 2076US5130481ABis-n,n' nitro or amino benzoyl amino phenolsHOECHST CELANESE CORP·Filed 1991·Granted Jul 14, 1992·21 cites·11 claims
- 2175US7247567B2Method of polishing a tungsten-containing substrateCABOT MICROELECTRONICS CORP·Filed 2004·Granted Jul 24, 2007·18 cites·20 claims
- 2275US5652297AAqueous antireflective coatings for photoresist compositionsHOECHST CELANESE CORP·Filed 1996·Granted Jul 29, 1997·38 cites·19 claims
- 2375US5521052AMetal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefromHOECHST CELANESE CORP·Filed 1994·Granted May 28, 1996·39 cites·9 claims
- 2474US6187506B1Antireflective coating for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Feb 13, 2001·38 cites·28 claims
- 2566US5055550APolymers prepared from 4,4'-bis(2-[3,4(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydrideHOECHST CELANESE CORP·Filed 1990·Granted Oct 8, 1991·14 cites·13 claims
- 2666US4877653AProcess for insolublizing solvent soluble polyimide compositionsHOECHST CELANESE CORP·Filed 1988·Granted Oct 31, 1989·23 cites·10 claims
- 2764US5240819APolyamide containing the hexafluoroisopropylidene group and process of using to form a positive imageHOECHST CELANESE CORP·Filed 1991·Granted Aug 31, 1993·19 cites·18 claims
- 2863US6368421B1Composition for stripping photoresist and organic materials from substrate surfacesCLARIANT FINANCE BVI LTD·Filed 1998·Granted Apr 9, 2002·24 cites·10 claims
- 2962US6346361B1Method for synthesizing polymeric AZO dyesCLARIANT FINANCE BVI LTD·Filed 1999·Granted Feb 12, 2002·7 cites·8 claims
- 3059US5739265AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromCLARIANT FINANCE BVI LTD·Filed 1995·Granted Apr 14, 1998·13 cites·20 claims
- 3159US4866155APolester of bis(2-(hydroxyphenyl)-hexafluoroisopropyl)diphenyl etherHOECHST CELANESE CORP·Filed 1987·Granted Sep 12, 1989·18 cites·21 claims
- 3258US4978734APolyamide-polyamide and polybenzoxazole-polyamide polymerHOECHST CELANESE CORP·Filed 1989·Granted Dec 18, 1990·10 cites·19 claims
- 3356US5837417AQuinone diazide compositions containing low metals p-cresol oligomers and process of producing the compositionCLARIANT FINANCE BVI LTD·Filed 1994·Granted Nov 17, 1998·11 cites·9 claims
- 3454US6106995AAntireflective coating material for photoresistsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 22, 2000·14 cites·17 claims
- 3554US5371169ANovolak resin mixturesHOECHST CELANESE CORP·Filed 1992·Granted Dec 6, 1994·12 cites·6 claims
- 3651US2007266641A1Method of polishing a tungsten-containing substrateCABOT MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 3750US5037949APolymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl etherHOECHST CELANESE CORP·Filed 1990·Granted Aug 6, 1991·7 cites·21 claims
- 3850US4978738AHigh molecular weight, thermally soluble polyimidesHOECHST CELANESE CORP·Filed 1988·Granted Dec 18, 1990·7 cites·20 claims
- 3948US5693749AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromHOECHST CELANESE CORP·Filed 1995·Granted Dec 2, 1997·11 cites·23 claims
- 4048US5011753APhotoresist compositions containing polyamides polybenzoxa from bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethersHOECHST CELANESE CORP·Filed 1990·Granted Apr 30, 1991·14 cites·11 claims
- 4146US5876897APositive photoresists containing novel photoactive compoundsCLARIANT FINANCE BVI LTD·Filed 1997·Granted Mar 2, 1999·9 cites·19 claims
- 4242US5763135ALight sensitive composition containing an arylhydrazo dyeCLARIANT FINANCE BVI LTD·Filed 1996·Granted Jun 9, 1998·7 cites·18 claims
- 4341US5853947AQuinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetateCLARIANT FINANCE BVI LTD·Filed 1995·Granted Dec 29, 1998·7 cites·12 claims
- 4441US5221592ADiazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo esterHOECHST CELANESE CORP·Filed 1992·Granted Jun 22, 1993·6 cites·12 claims
- 4539US5300396AProcess of making naphthoquinone diazide esters using lactone solventsHOECHST CELANESE CORP·Filed 1990·Granted Apr 5, 1994·5 cites·8 claims
- 4638US2002061473A1Method for synthesizing polymeric azo dyesFiled 2001·Application pending·0 cites
- 4736US5348842AMethod for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chlorideHOECHST CELANESE CORP·Filed 1993·Granted Sep 20, 1994·4 cites·14 claims
- 4836US4822868APolycarbonamide of bis(2-(4-carboxyphenyl)-hexafluoroisopropyl)diphenyl etherHOECHST CELANESE CORP·Filed 1987·Granted Apr 18, 1989·3 cites·14 claims
- 4935US5866295APhotosensitive quinolone compounds and a process of preparationCLARIANT FINANCE BVI LTD·Filed 1997·Granted Feb 2, 1999·3 cites·9 claims
- 5035US5858627AImage formation utilizing photosensitive compositions containing low metal content p-cresol oligomersCLARIANT FINANCE BVI LTD·Filed 1997·Granted Jan 12, 1999·3 cites·12 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Dinesh N. Khanna files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →