Inventor · disambiguated record
Natale M. Ceglio
Also filed as: CEGLIO NATALE · CEGLIO NATALE M
21 granted patents·2 pending applications·801 citations·filing 1987–2014
95Inventor score
Top patents by PatentIndex Score
23 records- 0199US5691541AMaskless, reticle-free, lithographyUNIV CALIFORNIA·Filed 1996·Granted Nov 25, 1997·358 cites·20 claims
- 0294US6002553AGiant magnetoresistive sensorUS ENERGY·Filed 1994·Granted Dec 14, 1999·118 cites·19 claims
- 0392US5257132ABroadband diffractive lens or imaging elementUS ARMY·Filed 1991·Granted Oct 26, 1993·116 cites·43 claims
- 0490US8258485B2Source-collector module with GIC mirror and xenon liquid EUV LPP target systemLEVESQUE RICHARD A·Filed 2010·Granted Sep 4, 2012·15 cites·20 claims
- 0590US5071207ABroadband diffractive lens or imaging elementUS ENERGY·Filed 1990·Granted Dec 10, 1991·94 cites·26 claims
- 0684US8330131B2Source-collector module with GIC mirror and LPP EUV light sourceCEGLIO NATALE M·Filed 2010·Granted Dec 11, 2012·8 cites·15 claims
- 0778US8895946B2Source-collector modules for EUV lithography employing a GIC mirror and a LPP sourceMEDIA LARIO SRL·Filed 2013·Granted Nov 25, 2014·7 cites·19 claims
- 0878US4870648AX-ray beamsplitterUS ENERGY·Filed 1987·Granted Sep 26, 1989·35 cites·25 claims
- 0977US9057962B2Source-collector module with GIC mirror and LPP EUV light sourceCEGLIO NATALE M·Filed 2012·Granted Jun 16, 2015·3 cites·11 claims
- 1073US8344339B2Source-collector module with GIC mirror and tin rod EUV LPP target systemMEDIA LARIO SRL·Filed 2010·Granted Jan 1, 2013·4 cites·11 claims
- 1172US8686381B2Source-collector module with GIC mirror and tin vapor LPP target systemLEVESQUE RICHARD·Filed 2010·Granted Apr 1, 2014·3 cites·27 claims
- 1268US6770862B1Scalable wafer inspectionKLA TENCOR TECH CORP·Filed 2003·Granted Aug 3, 2004·8 cites·20 claims
- 1362US8587768B2EUV collector system with enhanced EUV radiation collectionCEGLIO NATALE M·Filed 2011·Granted Nov 19, 2013·1 cites·11 claims
- 1461US8746975B2Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithographyBIANUCCI GIOVANNI·Filed 2012·Granted Jun 10, 2014·2 cites·26 claims
- 1558US9609731B2Systems and methods for synchronous operation of debris-mitigation devicesMEDIA LARIO SRL·Filed 2014·Granted Mar 28, 2017·1 cites·9 claims
- 1654US8873025B2EUV collector system with enhanced EUV radiation collectionMEDIA LARIO SRL·Filed 2013·Granted Oct 28, 2014·0 cites·26 claims
- 1751US5178974AVirtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beamsUS ENERGY·Filed 1991·Granted Jan 12, 1993·10 cites·9 claims
- 1846US9585236B2Sn vapor EUV LLP source system for EUV lithographyMEDIA LARIO SRL·Filed 2014·Granted Feb 28, 2017·0 cites·19 claims
- 1946US6010600AMaskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracyUNIV CALIFORNIA·Filed 1996·Granted Jan 4, 2000·12 cites·36 claims
- 2043US5176970AVirtually distortion-free imaging system for large field, high resolution lithographyUS ENERGY·Filed 1990·Granted Jan 5, 1993·6 cites·10 claims
- 2138US8731139B2Evaporative thermal management of grazing incidence collectors for EUV lithographyGREK BORIS·Filed 2011·Granted May 20, 2014·0 cites·23 claims
- 2234US2012050707A1Source-collector module with GIC mirror and tin wire EUV LPP target systemLEVESQUE RICHARD A·Filed 2010·Application pending·0 cites
- 2333US2012050706A1Source-collector module with GIC mirror and xenon ice EUV LPP target systemLEVESQUE RICHARD A·Filed 2010·Application pending·0 cites
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