Inventor · disambiguated record
Bryan C. Hendrix
Also filed as: HENDRIX BRYAN · HENDRIX BRYAN C · HENDRIX BRYAN CLARK
96 granted patents·54 pending applications·2,322 citations·filing 1996–2025
99Inventor score
Top patents by PatentIndex Score
150 records- 0198US9337054B2Precursors for silicon dioxide gap fillHUNKS WILLIAM·Filed 2008·Granted May 10, 2016·443 cites·20 claims
- 0298US8821640B2Solid precursor-based delivery of fluid utilizing controlled solids morphologyCLEARY JOHN M·Filed 2007·Granted Sep 2, 2014·536 cites·21 claims
- 0398US7838329B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted Nov 23, 2010·55 cites·21 claims
- 0496US10392700B2Solid vaporizerENTEGRIS INC·Filed 2015·Granted Aug 27, 2019·14 cites·15 claims
- 0596US7910765B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2010·Granted Mar 22, 2011·19 cites·20 claims
- 0696US7887883B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2010·Granted Feb 15, 2011·23 cites·8 claims
- 0796US7786320B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2009·Granted Aug 31, 2010·29 cites·7 claims
- 0896US7713346B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2008·Granted May 11, 2010·31 cites·8 claims
- 0995US10895010B2Solid precursor-based delivery of fluid utilizing controlled solids morphologyENTEGRIS INC·Filed 2016·Granted Jan 19, 2021·5 cites·18 claims
- 1095US8802882B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsWANG ZIYUN·Filed 2010·Granted Aug 12, 2014·15 cites·20 claims
- 1195US8008117B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2010·Granted Aug 30, 2011·14 cites·20 claims
- 1295US7005392B2Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using sameADVANCED TECH MATERIALS·Filed 2001·Granted Feb 28, 2006·71 cites·9 claims
- 1395US6869638B2Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using sameADVANCED TEHNOLOGY MATERIALS I·Filed 2001·Granted Mar 22, 2005·108 cites·46 claims
- 1494US8236097B2Composition and method for low temperature deposition of silicon-containing filmsWANG ZIYUN·Filed 2011·Granted Aug 7, 2012·13 cites·5 claims
- 1594US7531679B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2002·Granted May 12, 2009·55 cites·22 claims
- 1694US7285308B2Chemical vapor deposition of high conductivity, adherent thin films of rutheniumADVANCED TECH MATERIALS·Filed 2004·Granted Oct 23, 2007·45 cites·79 claims
- 1793US9102693B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsENTEGRIS INC·Filed 2014·Granted Aug 11, 2015·8 cites·20 claims
- 1893US8877549B2Low temperature deposition of phase change memory materialsADVANCED TECH MATERIALS·Filed 2014·Granted Nov 4, 2014·7 cites·19 claims
- 1993US8288198B2Low temperature deposition of phase change memory materialsROEDER JEFFREY F·Filed 2007·Granted Oct 16, 2012·11 cites·18 claims
- 2093US8268665B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsHUNKS WILLIAM·Filed 2011·Granted Sep 18, 2012·12 cites·20 claims
- 2193US7781605B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsADVANCED TECH MATERIALS·Filed 2009·Granted Aug 24, 2010·14 cites·20 claims
- 2292US8709863B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2012·Granted Apr 29, 2014·9 cites·22 claims
- 2391US10385452B2Source reagent-based delivery of fluid with high material flux for batch depositionENTEGRIS INC·Filed 2013·Granted Aug 20, 2019·11 cites·22 claims
- 2489US11466038B2Vapor deposition precursor compounds and process of useENTEGRIS INC·Filed 2020·Granted Oct 11, 2022·2 cites·2 claims
- 2589US7446217B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2003·Granted Nov 4, 2008·29 cites·31 claims
- 2689US6514835B1Stress control of thin films by mechanical deformation of wafer substrateADVANCED TECH MATERIALS·Filed 2000·Granted Feb 4, 2003·41 cites·20 claims
- 2785US10186570B2ALD processes for low leakage current and low equivalent oxide thickness BiTaO filmsENTEGRIS INC·Filed 2014·Granted Jan 22, 2019·9 cites·14 claims
- 2885US8034407B2Chemical vapor deposition of high conductivity, adherent thin films of rutheniumADVANCED TECH MATERIALS·Filed 2007·Granted Oct 11, 2011·4 cites·16 claims
- 2985US6623656B2Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using sameADVANCED TECH MATERIALS·Filed 2001·Granted Sep 23, 2003·28 cites·45 claims
- 3084US6900498B2Barrier structures for integration of high K oxides with Cu and Al electrodesADVANCED TECH MATERIALS·Filed 2001·Granted May 31, 2005·36 cites·39 claims
- 3183US11371138B2Chemical vapor deposition processes using ruthenium precursor and reducing gasENTEGRIS INC·Filed 2019·Granted Jun 28, 2022·2 cites·18 claims
- 3283US10895347B2Heat transfer to ampoule traysENTEGRIS INC·Filed 2018·Granted Jan 19, 2021·1 cites·11 claims
- 3383US10002772B2Vapor phase etching of hafnia and zirconiaENTEGRIS INC·Filed 2017·Granted Jun 19, 2018·3 cites·21 claims
- 3483US2024140819A1Oxhalide precursorsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 3582US7601860B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsADVANCED TECH MATERIALS·Filed 2004·Granted Oct 13, 2009·17 cites·2 claims
- 3682US7005303B2Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devicesADVANCED TECH MATERIALS·Filed 2004·Granted Feb 28, 2006·27 cites·12 claims
- 3782US6340386B1MOCVD of SBT using toluene based solvent system for precursor deliveryADVANCED TECH MATERIALS·Filed 1999·Granted Jan 22, 2002·23 cites·22 claims
- 3882US6156623AStress control of thin films by mechanical deformation of wafer substrateADVANCED TECH MATERIALS·Filed 1998·Granted Dec 5, 2000·54 cites·42 claims
- 3981US8153833B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideWANG ZIYUN·Filed 2011·Granted Apr 10, 2012·3 cites·20 claims
- 4081US7094284B2Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using sameADVANCED TECH MATERIALS·Filed 2001·Granted Aug 22, 2006·17 cites·63 claims
- 4181US6120846AMethod for the selective deposition of bismuth based ferroelectric thin films by chemical vapor depositionADVANCED TECH MATERIALS·Filed 1997·Granted Sep 19, 2000·65 cites·33 claims
- 4280US7370511B1Gas sensor with attenuated drift characteristicMST TECHNOLOGY GMBH·Filed 2004·Granted May 13, 2008·18 cites·50 claims
- 4380US5737850AMethod and apparatus for drying poultry manureROSE ACRE FARMS INC·Filed 1996·Granted Apr 14, 1998·28 cites·17 claims
- 4479US7964746B2Copper precursors for CVD/ALD/digital CVD of copper metal filmsADVANCED TECH MATERIALS·Filed 2008·Granted Jun 21, 2011·3 cites·14 claims
- 4578US12237170B2Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobaltENTEGRIS INC·Filed 2023·Granted Feb 25, 2025·0 cites·14 claims
- 4678US10475575B2In-situ oxidized NiO as electrode surface for high k MIM deviceENTEGRIS INC·Filed 2013·Granted Nov 12, 2019·1 cites·14 claims
- 4778US6660331B2MOCVD of SBT using toluene-based solvent system for precursor deliveryADVANCED TECH MATERIALS·Filed 2001·Granted Dec 9, 2003·15 cites·15 claims
- 4877US7858525B2Fluorine-free precursors and methods for the deposition of conformal conductive films for nanointerconnect seed and fillINTEL CORP·Filed 2007·Granted Dec 28, 2010·5 cites·5 claims
- 4977US6730523B2Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devicesADVANCED TECH MATERIALS·Filed 2001·Granted May 4, 2004·17 cites·47 claims
- 5077US6010744AMethod for nucleation controlled chemical vapor deposition of metal oxide ferroelectric thin filmsADVANCED TECH MATERIALS·Filed 1997·Granted Jan 4, 2000·55 cites·45 claims
Showing the top 50 of 150 patent records by PatentIndex Score.
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