Inventor · disambiguated record
Kyusaku Nishioka
Also filed as: NISHIOKA KYUSAKU
7 granted patents·132 citations·filing 1987–1991
87Inventor score
Files withMITSUBISHI ELECTRIC CORP7
Top patents by PatentIndex Score
7 records- 0188US4877509ASemiconductor wafer treating apparatus utilizing a plasmaMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Oct 31, 1989·43 cites·8 claims
- 0279US4915979ASemiconductor wafer treating device utilizing ECR plasmaMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Apr 10, 1990·24 cites·6 claims
- 0378US4891095AMethod and apparatus for plasma treatmentMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Jan 2, 1990·23 cites·16 claims
- 0474US4982138ASemiconductor wafer treating device utilizing a plasmaMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jan 1, 1991·19 cites·5 claims
- 0542US5070030AMethod of making an oxide isolated, lateral bipolar transistorMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Dec 3, 1991·8 cites·2 claims
- 0639US4990991ABipolar transistor and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Feb 5, 1991·6 cites·3 claims
- 0737US5304775AMethod of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert elementMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Apr 19, 1994·9 cites·25 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →