Inventor · disambiguated record
Hideaki Tsubaki
Also filed as: TSUBAKI HIDEAKI
69 granted patents·30 pending applications·885 citations·filing 2006–2024
99Inventor score
Top patents by PatentIndex Score
99 records- 0199US8227183B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2007·Granted Jul 24, 2012·88 cites·29 claims
- 0299US8088557B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2010·Granted Jan 3, 2012·79 cites·17 claims
- 0399US8071272B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2010·Granted Dec 6, 2011·87 cites·20 claims
- 0499US7998655B2Method of forming patternsFUJIFILM CORP·Filed 2008·Granted Aug 16, 2011·90 cites·19 claims
- 0598US8017304B2Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming methodFUJIFILM CORP·Filed 2009·Granted Sep 13, 2011·79 cites·19 claims
- 0698US8017298B2Method of forming patternsFUJIFILM CORP·Filed 2008·Granted Sep 13, 2011·59 cites·29 claims
- 0798US7985534B2Pattern forming methodFUJIFILM CORP·Filed 2008·Granted Jul 26, 2011·65 cites·14 claims
- 0898US7851140B2Resist composition for negative tone development and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Dec 14, 2010·46 cites·22 claims
- 0997US8900791B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Dec 2, 2014·23 cites·21 claims
- 1096US11156915B2Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Oct 26, 2021·7 cites·12 claims
- 1196US8034547B2Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming methodFUJIFILM CORP·Filed 2008·Granted Oct 11, 2011·70 cites·12 claims
- 1295US9465298B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodFUJIFILM CORP·Filed 2015·Granted Oct 11, 2016·4 cites·8 claims
- 1395US9291904B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodFUJIFILM CORP·Filed 2014·Granted Mar 22, 2016·6 cites·5 claims
- 1495US8951718B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2012·Granted Feb 10, 2015·7 cites·21 claims
- 1594US8822129B2Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic deviceIWATO KAORU·Filed 2012·Granted Sep 2, 2014·12 cites·18 claims
- 1694US8642253B2Resist composition for negative tone development and pattern forming method using the sameTSUBAKI HIDEAKI·Filed 2010·Granted Feb 4, 2014·9 cites·19 claims
- 1794US7799505B2Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive compositionFUJIFILM CORP·Filed 2007·Granted Sep 21, 2010·16 cites·16 claims
- 1893US9527809B2Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Dec 27, 2016·6 cites·12 claims
- 1993US8546063B2Organic solvent development or multiple development pattern-forming method using electron beams or EUV raysTSUBAKI HIDEAKI·Filed 2010·Granted Oct 1, 2013·10 cites·33 claims
- 2093US8241840B2Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2010·Granted Aug 14, 2012·50 cites·15 claims
- 2191US10663864B2Pattern forming method, method for manufacturing electronic device, and laminateFUJIFILM CORP·Filed 2018·Granted May 26, 2020·4 cites·11 claims
- 2291US9188865B2Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Nov 17, 2015·7 cites·11 claims
- 2389US8530148B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2008·Granted Sep 10, 2013·10 cites·13 claims
- 2487US9470980B2Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic deviceFUJIFILM CORP·Filed 2014·Granted Oct 18, 2016·5 cites·18 claims
- 2587US8632942B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2011·Granted Jan 21, 2014·4 cites·22 claims
- 2685US9170489B2Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic deviceFUJIFILM CORP·Filed 2014·Granted Oct 27, 2015·4 cites·54 claims
- 2784US8617794B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2011·Granted Dec 31, 2013·4 cites·39 claims
- 2882US10788754B2Pattern forming method and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Sep 29, 2020·2 cites·13 claims
- 2981US8088550B2Positive resist composition and pattern forming methodTARUTANI SHINJI·Filed 2008·Granted Jan 3, 2012·6 cites·19 claims
- 3080US8637222B2Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist patternTSUCHIHASHI TORU·Filed 2010·Granted Jan 28, 2014·4 cites·16 claims
- 3179US8865389B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming patternHIRANO SHUJI·Filed 2011·Granted Oct 21, 2014·3 cites·18 claims
- 3277US11042094B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2018·Granted Jun 22, 2021·1 cites·10 claims
- 3376US9223215B2Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2014·Granted Dec 29, 2015·2 cites·16 claims
- 3476US8637220B2Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Jan 28, 2014·2 cites·14 claims
- 3575US8476001B2Pattern forming methodTSUBAKI HIDEAKI·Filed 2011·Granted Jul 2, 2013·2 cites·17 claims
- 3673US10890847B2Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Jan 12, 2021·1 cites·13 claims
- 3771US10761426B2Pattern forming method, method for manufacturing electronic device, and laminateFUJIFILM CORP·Filed 2018·Granted Sep 1, 2020·1 cites·11 claims
- 3871US9323153B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the sameFUJIFILM CORP·Filed 2014·Granted Apr 26, 2016·2 cites·17 claims
- 3971US7338744B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Mar 4, 2008·1 cites·7 claims
- 4071US2024329531A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 4168US9411230B2Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Aug 9, 2016·1 cites·25 claims
- 4268US9323150B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming patternFUJIFILM CORP·Filed 2014·Granted Apr 26, 2016·1 cites·22 claims
- 4366US12306538B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2021·Granted May 20, 2025·0 cites·5 claims
- 4465US9052590B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTAKAHASHI HIDENORI·Filed 2010·Granted Jun 9, 2015·1 cites·14 claims
- 4565US8637229B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2010·Granted Jan 28, 2014·1 cites·9 claims
- 4665US8603733B2Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming methodTARUTANI SHINJI·Filed 2011·Granted Dec 10, 2013·1 cites·29 claims
- 4765US2024353753A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 4864US2024053679A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 4963US7824836B2Photosensitive composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted Nov 2, 2010·1 cites·13 claims
- 5062US2016349619A1Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodFUJIFILM CORP·Filed 2016·Application pending·0 cites
Showing the top 50 of 99 patent records by PatentIndex Score.
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