Inventor · disambiguated record
Mircea Dusa
Also filed as: DUSA MIRCEA
31 granted patents·4 pending applications·512 citations·filing 1998–2021
97Inventor score
Files withASML NETHERLANDS BV27SEWELL HARRY2APPLIED MATERIALS INC1ASML HOLDING NV1DEN BOEF ARIE JEFFREY1
Top patents by PatentIndex Score
35 records- 0198US8760662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2013·Granted Jun 24, 2014·16 cites·7 claims
- 0298US7791727B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2004·Granted Sep 7, 2010·89 cites·32 claims
- 0398US7791732B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2005·Granted Sep 7, 2010·80 cites·15 claims
- 0497US8054467B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2010·Granted Nov 8, 2011·15 cites·13 claims
- 0597US7791724B2Characterization of transmission losses in an optical systemASML NETHERLANDS BV·Filed 2006·Granted Sep 7, 2010·59 cites·21 claims
- 0696US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 0795US7916284B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 29, 2011·23 cites·12 claims
- 0894US7564555B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Jul 21, 2009·21 cites·19 claims
- 0993US8553230B2Method and apparatus for angular-resolved spectroscopic lithography characterizationDEN BOEF ARIE JEFFREY MARIA·Filed 2011·Granted Oct 8, 2013·10 cites·8 claims
- 1092US10955353B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2019·Granted Mar 23, 2021·2 cites·7 claims
- 1192US8189195B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2007·Granted May 29, 2012·15 cites·33 claims
- 1290US10241055B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2014·Granted Mar 26, 2019·3 cites·11 claims
- 1389US7480050B2Lithographic system, sensor, and method of measuring properties of a substrateASML NETHERLANDS BV·Filed 2006·Granted Jan 20, 2009·13 cites·22 claims
- 1483US7315384B2Inspection apparatus and method of inspectionASML NETHERLANDS BV·Filed 2005·Granted Jan 1, 2008·8 cites·19 claims
- 1581US8612045B2Optimization method and a lithographic cellMOS EVERHARDUS CORNELIS·Filed 2009·Granted Dec 17, 2013·7 cites·12 claims
- 1681US7532307B2Focus determination method, device manufacturing method, and maskASML NETHERLANDS BV·Filed 2005·Granted May 12, 2009·6 cites·14 claims
- 1778US11525786B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2021·Granted Dec 13, 2022·0 cites·4 claims
- 1878US8945800B2Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer programASML NETHERLANDS BV·Filed 2013·Granted Feb 3, 2015·3 cites·19 claims
- 1978US8625096B2Method and system for increasing alignment target contrastSEWELL HARRY·Filed 2010·Granted Jan 7, 2014·3 cites·23 claims
- 2076US7312860B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 25, 2007·4 cites·2 claims
- 2175US7148959B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Dec 12, 2006·16 cites·19 claims
- 2274US6608920B1Target acquisition technique for CD measurement machineAPPLIED MATERIALS INC·Filed 1998·Granted Aug 19, 2003·35 cites·12 claims
- 2371US7704850B2Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 27, 2010·3 cites·18 claims
- 2471US7466413B2Marker structure, mask pattern, alignment method and lithographic method and apparatusASML NETHERLANDS BV·Filed 2004·Granted Dec 16, 2008·11 cites·3 claims
- 2564US9368366B2Methods for providing spaced lithography features on a substrate by self-assembly of block copolymersASML NETHERLANDS BV·Filed 2014·Granted Jun 14, 2016·1 cites·17 claims
- 2663US8709908B2Improving alignment target contrast in a lithographic double patterning processSEWELL HARRY·Filed 2010·Granted Apr 29, 2014·1 cites·18 claims
- 2761US7786477B2Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Aug 31, 2010·1 cites·4 claims
- 2861US7151594B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Dec 19, 2006·6 cites·14 claims
- 2956US8980724B2Alignment target contrast in a lithographic double patterning processASML HOLDING NV·Filed 2014·Granted Mar 17, 2015·0 cites·20 claims
- 3051US2009073406A1Marker structure, mask pattern, alignment method, and lithographic method and apparatusASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 3150US2006139592A1Latent overlay metrologyASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 3247US2013017378A1Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic ProcessASML NETHERLANDS BV·Filed 2012·Application pending·0 cites
- 3344US2006109463A1Latent overlay metrologyASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 3441US8329366B2Apparatus and method for providing resist alignment marks in a double patterning lithographic processDOYTCHEVA MAYA ANGELOVA·Filed 2010·Granted Dec 11, 2012·0 cites·13 claims
- 3536US10656536B2Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted May 19, 2020·0 cites·20 claims
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