Inventor · disambiguated record
Radha Sundararajan
Also filed as: SUNDARARAJAN RADHA
29 granted patents·5 pending applications·385 citations·filing 2005–2016
97Inventor score
Top patents by PatentIndex Score
34 records- 0196US7477960B2Fault detection and classification (FDC) using a run-to-run controllerTOKYO ELECTRON LTD·Filed 2005·Granted Jan 13, 2009·86 cites·51 claims
- 0295US7324193B2Measuring a damaged structure formed on a wafer using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Jan 29, 2008·30 cites·20 claims
- 0393US7967995B2Multi-layer/multi-input/multi-output (MLMIMO) models and method for usingTOKYO ELECTRON LTD·Filed 2008·Granted Jun 28, 2011·25 cites·19 claims
- 0493US7894927B2Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for metal-gate structuresTOKYO ELECTRON LTD·Filed 2008·Granted Feb 22, 2011·23 cites·32 claims
- 0591US7502709B2Dynamic metrology sampling for a dual damascene processTOKYO ELECTRON LTD·Filed 2006·Granted Mar 10, 2009·17 cites·33 claims
- 0690US8968588B2Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatusZHAO JIANPING·Filed 2012·Granted Mar 3, 2015·23 cites·13 claims
- 0789US8816281B2Ion energy analyzer and methods of manufacturing the sameFUNK MERRITT·Filed 2012·Granted Aug 26, 2014·16 cites·20 claims
- 0889US8343371B2Apparatus and method for improving photoresist properties using a quasi-neutral beamTOKYO ELECTRON LTD·Filed 2010·Granted Jan 1, 2013·10 cites·2 claims
- 0989US7713758B2Method and apparatus for optimizing a gate channelTOKYO ELECTON LTD·Filed 2007·Granted May 11, 2010·22 cites·20 claims
- 1089US7567700B2Dynamic metrology sampling with wafer uniformity controlTOKYO ELECTRON LTD·Filed 2006·Granted Jul 28, 2009·11 cites·24 claims
- 1188US9087677B2Methods of electrical signaling in an ion energy analyzerFUNK MERRITT·Filed 2012·Granted Jul 21, 2015·8 cites·20 claims
- 1288US7939450B2Method and apparatus for spacer-optimization (S-O)TOKYO ELECTRON LTD·Filed 2007·Granted May 10, 2011·13 cites·20 claims
- 1387US8847159B2Ion energy analyzerCHEN LEE·Filed 2012·Granted Sep 30, 2014·6 cites·25 claims
- 1485US9396900B2Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma propertiesTOKYO ELECTRON LTD·Filed 2012·Granted Jul 19, 2016·10 cites·18 claims
- 1585US7899637B2Method and apparatus for creating a gate optimization evaluation libraryTOKYO ELECTRON LTD·Filed 2007·Granted Mar 1, 2011·11 cites·15 claims
- 1685US7619731B2Measuring a damaged structure formed on a wafer using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Nov 17, 2009·11 cites·18 claims
- 1784US8486798B1Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted Jul 16, 2013·6 cites·20 claims
- 1883US9431218B2Scalable and uniformity controllable diffusion plasma sourceTOKYO ELECTRON LTD·Filed 2014·Granted Aug 30, 2016·5 cites·15 claims
- 1980US8721833B2Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted May 13, 2014·4 cites·15 claims
- 2080US7623978B2Damage assessment of a wafer using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Nov 24, 2009·7 cites·45 claims
- 2178US7988813B2Dynamic control of process chemistry for improved within-substrate process uniformityTOKYO ELECTRON LTD·Filed 2007·Granted Aug 2, 2011·9 cites·8 claims
- 2277US7674636B2Dynamic temperature backside gas control for improved within-substrate process uniformityTOKYO ELECTRON LTD·Filed 2007·Granted Mar 9, 2010·5 cites·24 claims
- 2376US7576851B2Creating a library for measuring a damaged structure formed on a wafer using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Aug 18, 2009·5 cites·8 claims
- 2475US8019458B2Creating multi-layer/multi-input/multi-output (MLMIMO) models for metal-gate structuresTOKYO ELECTRON LTD·Filed 2008·Granted Sep 13, 2011·14 cites·26 claims
- 2572US8501499B2Adaptive recipe selectorSUNDARARAJAN RADHA·Filed 2011·Granted Aug 6, 2013·4 cites·18 claims
- 2668US10354841B2Plasma generation and control using a DC ringTOKYO ELECTRON LTD·Filed 2016·Granted Jul 16, 2019·1 cites·17 claims
- 2768US8183062B2Creating metal gate structures using Lithography-Etch-Lithography-Etch (LELE) processing sequencesFUNK MERRITT·Filed 2009·Granted May 22, 2012·3 cites·19 claims
- 2854US9301383B2Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Mar 29, 2016·0 cites·9 claims
- 2953US2008137078A1Measuring a damaged structure formed on a wafer using optical metrologyTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3051US10375812B2Low electron temperature, edge-density enhanced, surface-wave plasma (SWP) processing method and apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Aug 6, 2019·0 cites·9 claims
- 3148US2010081285A1Apparatus and Method for Improving Photoresist PropertiesTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3245US2014263182A1Dc pulse etcherTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3342US2014262040A1Method and system using plasma tuning rods for plasma processingTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3442US2007238201A1Dynamic metrology sampling with wafer uniformity controlFUNK MERRITT·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →