Inventor · disambiguated record
Bunsen B. Nie
Also filed as: NIE BUNSEN · NIE BUNSEN B
24 granted patents·3 pending applications·2,226 citations·filing 2000–2025
97Inventor score
Top patents by PatentIndex Score
27 records- 0198US7790633B1Sequential deposition/anneal film densification methodNOVELLUS SYSTEMS INC·Filed 2006·Granted Sep 7, 2010·643 cites·23 claims
- 0298US7482247B1Conformal nanolaminate dielectric deposition and etch bag gap fill processNOVELLUS SYSTEMS INC·Filed 2006·Granted Jan 27, 2009·583 cites·27 claims
- 0398US7148155B1Sequential deposition/anneal film densification methodNOVELLUS SYSTEMS INC·Filed 2004·Granted Dec 12, 2006·416 cites·34 claims
- 0497US6576345B1Dielectric films with low dielectric constantsNOVELLUS SYSTEMS INC·Filed 2000·Granted Jun 10, 2003·110 cites·45 claims
- 0597US6340628B1Method to deposit SiOCH films with dielectric constant below 3.0NOVELLUS SYSTEMS INC·Filed 2000·Granted Jan 22, 2002·166 cites·22 claims
- 0693US7297608B1Method for controlling properties of conformal silica nanolaminates formed by rapid vapor depositionNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 20, 2007·68 cites·32 claims
- 0793US6867152B1Properties of a silica thin film produced by a rapid vapor deposition (RVD) processNOVELLUS SYSTEMS INC·Filed 2003·Granted Mar 15, 2005·83 cites·31 claims
- 0892US12165918B2Conformal titanium nitride-based thin films and methods of forming sameEUGENUS INC·Filed 2022·Granted Dec 10, 2024·2 cites·19 claims
- 0990US7202185B1Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layerNOVELLUS SYSTEMS INC·Filed 2004·Granted Apr 10, 2007·48 cites·37 claims
- 1089US11482413B2Conformal and smooth titanium nitride layers and methods of forming the sameEUGENUS INC·Filed 2019·Granted Oct 25, 2022·5 cites·23 claims
- 1189US7097878B1Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 filmsNOVELLUS SYSTEMS INC·Filed 2004·Granted Aug 29, 2006·35 cites·19 claims
- 1285US11587784B2Smooth titanium nitride layers and methods of forming the sameEUGENUS INC·Filed 2019·Granted Feb 21, 2023·3 cites·15 claims
- 1384US12444648B2Conformal titanium silicon nitride-based thin films and methods of forming sameEUGENUS INC·Filed 2022·Granted Oct 14, 2025·1 cites·33 claims
- 1484US12431388B2Conformal titanium silicon nitride-based thin films and methods of forming sameEUGENUS INC·Filed 2022·Granted Sep 30, 2025·1 cites·23 claims
- 1582US11361992B2Conformal titanium nitride-based thin films and methods of forming sameEUGENUS INC·Filed 2019·Granted Jun 14, 2022·3 cites·32 claims
- 1682US7129189B1Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD)NOVELLUS SYSTEMS INC·Filed 2004·Granted Oct 31, 2006·26 cites·26 claims
- 1777US7294583B1Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 filmsNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 13, 2007·18 cites·23 claims
- 1872US12444603B2Smooth titanium nitride layers and methods of forming the sameEUGENUS INC·Filed 2023·Granted Oct 14, 2025·0 cites·19 claims
- 1972US12308226B2Conformal and smooth titanium nitride layers and methods of forming the sameEUGENUS INC·Filed 2022·Granted May 20, 2025·0 cites·20 claims
- 2071US7223707B1Dynamic rapid vapor deposition process for conformal silica laminatesNOVELLUS SYSTEMS INC·Filed 2004·Granted May 29, 2007·10 cites·36 claims
- 2170US7678709B1Method of forming low-temperature conformal dielectric filmsNOVELLUS SYSTEMS INC·Filed 2007·Granted Mar 16, 2010·3 cites·19 claims
- 2267US2025279318A1Conformal and smooth titanium nitride layers and methods of forming the sameEUGENUS INC·Filed 2025·Application pending·0 cites
- 2365US12272599B2Conformal and smooth titanium nitride layers and methods of forming the sameEUGENUS INC·Filed 2021·Granted Apr 8, 2025·0 cites·24 claims
- 2462US2024124978A1Gas diffuser plate coated with emissivity-controlling thin film and methods of forming sameEUGENUS INC·Filed 2023·Application pending·0 cites
- 2557US12283486B2Conformal and smooth titanium nitride layers and methods of forming the sameEUGENUS INC·Filed 2022·Granted Apr 22, 2025·0 cites·24 claims
- 2657US7700155B1Method and apparatus for modulation of precursor exposure during a pulsed deposition processNOVELLUS SYSTEMS INC·Filed 2004·Granted Apr 20, 2010·2 cites·19 claims
- 2756US2010173074A1Method and apparatus for modulation of precursor exposure during a pulsed deposition processNOVELLUS SYSTEMS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →