Inventor · disambiguated record
Keum-Joo Lee
Also filed as: LEE KEUM-JOO
11 granted patents·9 pending applications·289 citations·filing 2000–2025
91Inventor score
Top patents by PatentIndex Score
20 records- 0192US6461937B1Methods of forming trench isolation regions having recess-inhibiting layers therein that protect against overetchingSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Oct 8, 2002·78 cites·7 claims
- 0289US6717231B2Trench isolation regions having recess-inhibiting layers therein that protect against overetchingSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Apr 6, 2004·52 cites·6 claims
- 0388US6834440B2Wafer spin drying apparatus with a plurality of supply nozzles and methods for using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Dec 28, 2004·46 cites·22 claims
- 0486US6500726B2Shallow trench isolation type semiconductor device and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Dec 31, 2002·44 cites·16 claims
- 0579US6802911B2Method for cleaning damaged layers and polymer residue from semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Oct 12, 2004·22 cites·40 claims
- 0677US2025380401A1Semiconductor Memory Device And Method For Manufacturing The SameSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0775US6331478B1Methods for manufacturing semiconductor devices having chamfered metal silicide layersSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Dec 18, 2001·25 cites·17 claims
- 0872US7629218B2Method of manufacturing a capacitor and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Dec 8, 2009·5 cites·18 claims
- 0967US7582539B2Methods of cleaning a semiconductor device and methods of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 1, 2009·4 cites·18 claims
- 1065US8058128B2Methods of fabricating recessed channel metal oxide semiconductor (MOS) transistorsLEE KEUM-JOO·Filed 2010·Granted Nov 15, 2011·3 cites·18 claims
- 1164US12402302B2Semiconductor memory device and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 1262US6699773B2Shallow trench isolation type semiconductor device and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 2, 2004·10 cites·5 claims
- 1348US2006287208A1Methods of Forming Corrosion-Inhibiting Cleaning Compositions for Metal Layers and Patterns on Semiconductor SubstratesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1444US2007138126A1Methods of forming a conductive structureSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1543US2005261151A1Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substratesLEE KWANG-WOOK·Filed 2005·Application pending·0 cites
- 1642US2007004218A1Method of cleaning a semiconductor device and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1739US2006270241A1Method of removing a photoresist pattern and method of manufacturing a semiconductor device using the sameKIM KYOUNG-CHUL·Filed 2006·Application pending·0 cites
- 1837US2007298596A1Method of removing a photoresist pattern, method of forming a dual polysilicon layer using the removing method and method of manufacturing a semiconductor device using the removingSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1934US2010173470A1Methods of forming a silicon oxide layer and methods of forming an isolation layerSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 2030US2002003275A1Shallow trench isolation type semiconductor device and method of the sameFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →