Inventor · disambiguated record
Jothilingam Ramalingam
Also filed as: RAMALINGAM JOTHILINGAM
21 granted patents·3 pending applications·22 citations·filing 2013–2023
91Inventor score
Files withAPPLIED MATERIALS INC24
Top patents by PatentIndex Score
24 records- 0197US11915918B2Cleaning of sin with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2021·Granted Feb 27, 2024·4 cites·8 claims
- 0294US11550222B2Dose reduction of patterned metal oxide photoresistsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·3 cites·20 claims
- 0392US11842890B2Methods and apparatus for physical vapor deposition (PVD) dielectric depositionAPPLIED MATERIALS INC·Filed 2020·Granted Dec 12, 2023·2 cites·14 claims
- 0489US11469096B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·2 cites·20 claims
- 0588US11572618B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·2 cites·18 claims
- 0687US10043670B2Systems and methods for low resistivity physical vapor deposition of a tungsten filmAPPLIED MATERIALS INC·Filed 2015·Granted Aug 7, 2018·4 cites·11 claims
- 0785US11495461B2Film stack for lithography applicationsAPPLIED MATERIALS INC·Filed 2020·Granted Nov 8, 2022·2 cites·20 claims
- 0881US12368033B2Methods and apparatus for physical vapor deposition (PVD) dielectric depositionAPPLIED MATERIALS INC·Filed 2023·Granted Jul 22, 2025·0 cites·5 claims
- 0978US12176205B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 1077US10388532B2Methods and devices using PVD rutheniumAPPLIED MATERIALS INC·Filed 2017·Granted Aug 20, 2019·2 cites·20 claims
- 1176US11661651B2Methods and apparatus for passivating a targetAPPLIED MATERIALS INC·Filed 2022·Granted May 30, 2023·0 cites·10 claims
- 1275US12142478B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2022·Granted Nov 12, 2024·0 cites·20 claims
- 1375US11994800B2Dose reduction of patterned metal oxide photoresistsAPPLIED MATERIALS INC·Filed 2022·Granted May 28, 2024·0 cites·20 claims
- 1474US10734235B2Systems and methods for low resistivity physical vapor deposition of a tungsten filmAPPLIED MATERIALS INC·Filed 2018·Granted Aug 4, 2020·1 cites·7 claims
- 1572US11655534B2Apparatus for reducing tungsten resistivityAPPLIED MATERIALS INC·Filed 2022·Granted May 23, 2023·0 cites·10 claims
- 1672US11447857B2Methods and apparatus for reducing tungsten resistivityAPPLIED MATERIALS INC·Filed 2020·Granted Sep 20, 2022·0 cites·14 claims
- 1769US12027354B2Cleaning of SIN with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2022·Granted Jul 2, 2024·0 cites·10 claims
- 1868US11512387B2Methods and apparatus for passivating a targetAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·0 cites·19 claims
- 1958US11450514B1Methods of reducing particles in a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2021·Granted Sep 20, 2022·0 cites·20 claims
- 2056US2020048760A1High power impulse magnetron sputtering physical vapor deposition of tungsten films having improved bottom coverageAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2152US11270898B2Apparatus for enhancing flow uniformity in a process chamberAPPLIED MATERIALS INC·Filed 2019·Granted Mar 8, 2022·0 cites·19 claims
- 2247US9461137B1Tungsten silicide nitride films and methods of formationAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·0 cites·20 claims
- 2341US2016168687A1Particle reduction in a deposition chamber using thermal expansion coefficient compatible coatingAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 2441US2015118833A1Method of making source/drain contacts by sputtering a doped targetAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →