Inventor · disambiguated record
Thomas E. Seidel
Also filed as: SEIDEL THOMAS · SEIDEL THOMAS E · SEIDEL THOMAS EDWARD
31 granted patents·9 pending applications·3,989 citations·filing 1974–2022
98Inventor score
Top patents by PatentIndex Score
40 records- 0199US6503330B1Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 1999·Granted Jan 7, 2003·616 cites·15 claims
- 0298US6174377B1Processing chamber for atomic layer deposition processesGENUS INC·Filed 1999·Granted Jan 16, 2001·639 cites·9 claims
- 0398US5879459AVertically-stacked process reactor and cluster tool system for atomic layer depositionGENUS INC·Filed 1997·Granted Mar 9, 1999·1.2k cites·25 claims
- 0497US6638859B2Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 2002·Granted Oct 28, 2003·154 cites·31 claims
- 0597US6551399B1Fully integrated process for MIM capacitors using atomic layer depositionGENUS INC·Filed 2000·Granted Apr 22, 2003·169 cites·12 claims
- 0697US6037664ADual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layerSEMATECH INC·Filed 1998·Granted Mar 14, 2000·306 cites·26 claims
- 0796US6387185B2Processing chamber for atomic layer deposition processesGENUS INC·Filed 2001·Granted May 14, 2002·123 cites·10 claims
- 0896US6100184AMethod of making a dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layerSEMATECH INC·Filed 1997·Granted Aug 8, 2000·236 cites·12 claims
- 0993US6905547B1Method and apparatus for flexible atomic layer depositionGENUS INC·Filed 2002·Granted Jun 14, 2005·78 cites·74 claims
- 1091US6897119B1Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 2003·Granted May 24, 2005·46 cites·3 claims
- 1191US6720259B2Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor depositionGENUS INC·Filed 2002·Granted Apr 13, 2004·56 cites·30 claims
- 1290US7981473B2Transient enhanced atomic layer depositionAIXTRON INC·Filed 2004·Granted Jul 19, 2011·63 cites·19 claims
- 1389US6902624B2Massively parallel atomic layer deposition/chemical vapor deposition systemGENUS INC·Filed 2002·Granted Jun 7, 2005·67 cites·18 claims
- 1488US10896823B2Limited dose atomic layer processes for localizing coatings on non-planar surfacesSEIDEL THOMAS E·Filed 2019·Granted Jan 19, 2021·5 cites·5 claims
- 1586US7129580B1Methods and procedures for engineering of composite conductive films by atomic layer depositionGENUS INC·Filed 2005·Granted Oct 31, 2006·13 cites·15 claims
- 1684USD1018756SRifleRHINELAND ARMS INC·Filed 2022·Granted Mar 19, 2024·10 cites·1 claims
- 1784US7164203B1Methods and procedures for engineering of composite conductive by atomic layer depositionGENUS INC·Filed 2005·Granted Jan 16, 2007·8 cites·14 claims
- 1882US3965453APiezoresistor effects in semiconductor resistorsBELL TELEPHONE LABOR INC·Filed 1974·Granted Jun 22, 1976·26 cites·7 claims
- 1977US4258078AMetallization for integrated circuitsBELL TELEPHONE LABOR INC·Filed 1979·Granted Mar 24, 1981·30 cites·13 claims
- 2073US9246042B2Method for contacting and connecting solar cellsSOLARWORLD INNOVATIONS GMBH·Filed 2012·Granted Jan 26, 2016·2 cites·12 claims
- 2173US4653177AMethod of making and selectively doping isolation trenches utilized in CMOS devicesAT & T BELL LAB·Filed 1985·Granted Mar 31, 1987·39 cites·6 claims
- 2270US10996562B2Method and structure for nanoimprint lithography masks using optical film coatingsSEIDEL THOMAS E·Filed 2018·Granted May 4, 2021·0 cites·16 claims
- 2361US5102816AStaircase sidewall spacer for improved source/drain architectureSEMATECH INC·Filed 1991·Granted Apr 7, 1992·39 cites·14 claims
- 2460US7183649B1Methods and procedures for engineering of composite conductive films by atomic layer depositionGENUS INC·Filed 2002·Granted Feb 27, 2007·6 cites·20 claims
- 2556US10156786B2Method and structure for nanoimprint lithography masks using optical film coatingsSEIDEL THOMAS E·Filed 2016·Granted Dec 18, 2018·0 cites·6 claims
- 2654US2010012036A1Isolation for multi-single-wafer processing apparatusSILVA HUGO·Filed 2009·Application pending·0 cites
- 2753US6502605B2Process for the production of a face-to-face carpet fabricSCHOENHERR TEXTILMASCHINENBAU·Filed 2001·Granted Jan 7, 2003·6 cites·12 claims
- 2851US4364778AFormation of multilayer dopant distributions in a semiconductorBELL TELEPHONE LABOR INC·Filed 1980·Granted Dec 21, 1982·16 cites·18 claims
- 2950US10923359B2Limited dose and angle directed beam assisted ALE and ALD processes for localized coatings on non-planar surfacesSEIDEL THOMAS E·Filed 2020·Granted Feb 16, 2021·0 cites·13 claims
- 3050US2005281949A1Massively parallel atomic layer deposition/chemical vapor deposition systemSEIDEL THOMAS E·Filed 2005·Application pending·0 cites
- 3150US2005274323A1Massively parallel atomic layer deposition/chemical vapor deposition systemSEIDEL THOMAS E·Filed 2005·Application pending·0 cites
- 3250US2007042119A1Vaporizer for atomic layer deposition systemMATTHYSSE LARRY·Filed 2006·Application pending·0 cites
- 3348US4643804AForming thick dielectric at the bottoms of trenches utilized in integrated-circuit devicesAT & T BELL LAB·Filed 1985·Granted Feb 17, 1987·14 cites·14 claims
- 3447US2008072821A1Small volume symmetric flow single wafer ald apparatusDALTON JEREMIC J·Filed 2007·Application pending·0 cites
- 3545US9311234B2Method for reliably addressing a large flash memory and flash memoryHYPERSTONE GMBH·Filed 2014·Granted Apr 12, 2016·0 cites·11 claims
- 3643US2005016453A1Collection of unused precursors in ALDFiled 2004·Application pending·0 cites
- 3741US6635570B1PECVD and CVD processes for WNx depositionFiled 1999·Granted Oct 21, 2003·13 cites·11 claims
- 3841US2005016956A1Methods and apparatus for cycle time improvements for atomic layer depositionFiled 2004·Application pending·0 cites
- 3936US2006137609A1Multi-single wafer processing apparatusPUCHACZ JERZY P·Filed 2005·Application pending·0 cites
- 4035US2016379828A1Silicon doping source films by ald depositionMANE ANIL U·Filed 2016·Application pending·0 cites
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