Inventor · disambiguated record
Martin Schlott
Also filed as: SCHLOTT MARTIN
14 granted patents·12 pending applications·74 citations·filing 1994–2021
89Inventor score
Files withMATERION ADVANCED MAT GERMANY GMBH7LEYBOLD MATERIALS GMBH6HERAEUS DEUTSCHLAND GMBH & CO KG3HERAEUS GMBH W C3HERAEUS AMLOY TECH GMBH1
Top patents by PatentIndex Score
26 records- 0168US10487392B2Double-layer system comprising a partially absorbing layer, and method and sputter target for producing said layerHERAEUS DEUTSCHLAND GMBH & CO KG·Filed 2015·Granted Nov 26, 2019·1 cites·11 claims
- 0261US2021071293A1Process for preparing a tubular articleMATERION ADVANCED MAT GERMANY GMBH·Filed 2020·Application pending·0 cites
- 0360US5480532ASputter target for cathodic atomization to produce transparent, conductive layersLEYBOLD MATERIALS GMBH·Filed 1994·Granted Jan 2, 1996·21 cites·5 claims
- 0459US11566320B2NiW(X) sputtering target with improved structureMATERION ADVANCED MAT GERMANY GMBH·Filed 2020·Granted Jan 31, 2023·0 cites·6 claims
- 0556US9051646B2Sputtering target having amorphous and microcrystalline portions and method of producing sameHERZOG ANDREAS·Filed 2011·Granted Jun 9, 2015·1 cites·4 claims
- 0655US11125708B2Silver alloy-based sputter targetMATERION ADVANCED MAT GERMANY GMBH·Filed 2016·Granted Sep 21, 2021·0 cites·16 claims
- 0754US9334564B2Tube-shaped sputtering targetSIMONS CHRISTOPH·Filed 2012·Granted May 10, 2016·1 cites·25 claims
- 0854US2024018645A1CoZrTa(X) Sputtering Target with Improved Magnetic PropertiesMATERION ADVANCED MAT GERMANY GMBH·Filed 2021·Application pending·0 cites
- 0951US2016070033A1Light-absorbing layer and layer system containing the layer, method for producing the layer system and a sputter target suited thereforHERAEUS DEUTSCHLAND GMBH & CO KG·Filed 2014·Application pending·0 cites
- 1050US2007240981A1Sputter Target With High-Melting PhaseHERAEUS GMBH W C·Filed 2007·Application pending·0 cites
- 1149US9960022B2Sputtering target with optimized performance characteristicsMATERION ADVANCED MAT GERMANY GMBH·Filed 2013·Granted May 1, 2018·0 cites·9 claims
- 1248US2009250337A1Tubular target having a connecting layer arranged between the target tube and the carrier tubeHERAEUS GMBH W C·Filed 2005·Application pending·0 cites
- 1347US5728279ACobalt base alloy target for a magnetron cathode sputtering systemLEYBOLD MATERIALS GMBH·Filed 1994·Granted Mar 17, 1998·14 cites·6 claims
- 1446US8974707B2Planar or tubular sputtering target and method for the production thereofHERAEUS MATERIALS TECH GMBH·Filed 2013·Granted Mar 10, 2015·0 cites·13 claims
- 1544US2010038240A1Powder-Fiber AdhesiveHERAEUS GMBH W C·Filed 2006·Application pending·0 cites
- 1644US2018105925A1Process for preparing a tubular articleMATERION ADVANCED MAT GERMANY GMBH·Filed 2016·Application pending·0 cites
- 1742US2006151320A1Tubular sputtering targetWEIGERT MARTIN·Filed 2005·Application pending·0 cites
- 1841US6372104B1Cobalt base alloy sputtering target with high magnetic field penetrationLEYBOLD MATERIALS GMBH·Filed 1995·Granted Apr 16, 2002·11 cites·4 claims
- 1941US5531948AProcess for the production of partially reduced indium oxide-tin oxide targetsLEYBOLD MATERIALS GMBH·Filed 1995·Granted Jul 2, 1996·9 cites·5 claims
- 2041US2020002235A1Cylindrical titanium oxide sputtering target and process for manufacturing the sameMATERION ADVANCED MAT GERMANY GMBH·Filed 2018·Application pending·0 cites
- 2141US2017166999A1Silver-alloy based sputtering targetHERAEUS DEUTSCHLAND GMBH & CO KG·Filed 2015·Application pending·0 cites
- 2239US5660599AProcess for the recycling of spent indium oxide-tin oxide sputtering targetsLEYBOLD MATERIALS GMBH·Filed 1995·Granted Aug 26, 1997·9 cites·4 claims
- 2335US6187253B1Method of preparing indium oxide/tin oxide target for cathodic sputteringLEYBOLD MATERIALS GMBH·Filed 1997·Granted Feb 13, 2001·7 cites·1 claims
- 2435US2022161312A1Shaped parts having uniform mechanical properties, comprising solid metallic glassHERAEUS AMLOY TECH GMBH·Filed 2020·Application pending·0 cites
- 2533US2003168333A1Metal or metal alloy based sputter target and method for the production thereofFiled 2001·Application pending·0 cites
- 2628US8581248B2Thin film transistor (TFT) having copper electrodesSCHNEIDER-BETZ SABINE·Filed 2010·Granted Nov 12, 2013·0 cites·10 claims
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