Inventor · disambiguated record

Shang-Ying Wu

Also filed as: WU SHANG-YING

11 granted patents·29 citations·filing 2017–2023

87Inventor score

Technology areasH10P H05G G03F

Files withTAIWAN SEMICONDUCTOR MFG CO LTD11

Top patents by PatentIndex Score

11 records

0197US10656539B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 19, 2020·7 cites·20 claims
0295US10928741B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 23, 2021·3 cites·20 claims
0394US10875060B2Method and apparatus for removing debris from collectorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·8 cites·20 claims
0493US11275318B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 15, 2022·2 cites·20 claims
0591US11832372B2EUV light source and apparatus for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·1 cites·20 claims
0691US10718718B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 21, 2020·4 cites·20 claims
0787US10429314B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·3 cites·20 claims
0882US12167525B2EUV light source and apparatus for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 10, 2024·0 cites·20 claims
0977US11829082B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·0 cites·20 claims
1075US11272606B2EUV light source and apparatus for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Mar 8, 2022·1 cites·18 claims
1170US11092555B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 17, 2021·0 cites·20 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →