Inventor · disambiguated record
Dario L. Goldfarb
Also filed as: GOLDFARB DARIO · GOLDFARB DARIO L · GOLDFARB DARIO LEONARDO
82 granted patents·11 pending applications·344 citations·filing 2001–2023
99Inventor score
Top patents by PatentIndex Score
93 records- 0199US10553522B1Semiconductor microcoolerIBM·Filed 2018·Granted Feb 4, 2020·20 cites·6 claims
- 0294US10553516B1Semiconductor microcoolerIBM·Filed 2018·Granted Feb 4, 2020·10 cites·6 claims
- 0394US10096477B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2017·Granted Oct 9, 2018·7 cites·15 claims
- 0493US7588879B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2008·Granted Sep 15, 2009·15 cites·24 claims
- 0592US10347486B1Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2017·Granted Jul 9, 2019·5 cites·20 claims
- 0691US7727708B2Method for fabricating dual damascene structuresIBM·Filed 2008·Granted Jun 1, 2010·10 cites·24 claims
- 0790US9915867B2Mechanical isolation control for an extreme ultraviolet (EUV) pellicleIBM·Filed 2015·Granted Mar 13, 2018·3 cites·20 claims
- 0890US8124485B1Molecular spacer layer for semiconductor oxide surface and high-K dielectric stackGOLDFARB DARIO L·Filed 2011·Granted Feb 28, 2012·11 cites·20 claims
- 0990US6398875B1Process of drying semiconductor wafers using liquid or supercritical carbon dioxideIBM·Filed 2001·Granted Jun 4, 2002·53 cites·10 claims
- 1089US9057957B2Extreme ultraviolet (EUV) radiation pellicle formation methodIBM·Filed 2013·Granted Jun 16, 2015·5 cites·20 claims
- 1189US7579137B2Method for fabricating dual damascene structuresIBM·Filed 2005·Granted Aug 25, 2009·9 cites·1 claims
- 1288US8354336B2Forming an electrode having reduced corrosion and water decomposition on surface using an organic protective layerIBM·Filed 2010·Granted Jan 15, 2013·10 cites·31 claims
- 1388US8084193B2Self-segregating multilayer imaging stack with built-in antireflective propertiesCHENG JOY·Filed 2008·Granted Dec 27, 2011·11 cites·3 claims
- 1487US10490480B1Copper microcooler structure and fabricationIBM·Filed 2018·Granted Nov 26, 2019·4 cites·25 claims
- 1587US10345702B2Polymer brushes for extreme ultraviolet photolithographyIBM·Filed 2017·Granted Jul 9, 2019·4 cites·9 claims
- 1687US9057960B2Resist performance for the negative tone develop organic development processIBM·Filed 2013·Granted Jun 16, 2015·4 cites·30 claims
- 1787US8293451B2Near-infrared absorbing film compositionsGLODDE MARTIN·Filed 2009·Granted Oct 23, 2012·8 cites·17 claims
- 1886US10998191B2Graded hardmask interlayer for enhanced extreme ultraviolet performanceIBM·Filed 2018·Granted May 4, 2021·3 cites·16 claims
- 1985US11037786B2Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2019·Granted Jun 15, 2021·2 cites·16 claims
- 2085US10553432B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2018·Granted Feb 4, 2020·2 cites·20 claims
- 2185US10490481B1Copper microcooler structure and fabricationIBM·Filed 2018·Granted Nov 26, 2019·3 cites·20 claims
- 2285US8137874B2Organic graded spin on BARC compositions for high NA lithographyGOLDFARB DARIO L·Filed 2008·Granted Mar 20, 2012·7 cites·12 claims
- 2385US8017303B2Ultra low post exposure bake photoresist materialsIBM·Filed 2009·Granted Sep 13, 2011·7 cites·32 claims
- 2485US7816069B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2006·Granted Oct 19, 2010·7 cites·8 claims
- 2584US10312087B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2017·Granted Jun 4, 2019·2 cites·5 claims
- 2683US6509136B1Process of drying a cast polymeric film disposed on a workpieceIBM·Filed 2001·Granted Jan 21, 2003·21 cites·11 claims
- 2782US10276384B2Plasma shallow doping and wet removal of depth control capIBM·Filed 2017·Granted Apr 30, 2019·2 cites·14 claims
- 2882US7446859B2Apparatus and method for reducing contamination in immersion lithographyIBM·Filed 2006·Granted Nov 4, 2008·6 cites·10 claims
- 2981US7521172B2Topcoat material and use thereof in immersion lithography processesIBM·Filed 2006·Granted Apr 21, 2009·7 cites·17 claims
- 3080US11307496B2Metal brush layer for EUV patterningIBM·Filed 2019·Granted Apr 19, 2022·2 cites·20 claims
- 3180US10678135B2Surface treatment of titanium containing hardmasksIBM·Filed 2017·Granted Jun 9, 2020·2 cites·17 claims
- 3280US6838015B2Liquid or supercritical carbon dioxide compositionIBM·Filed 2001·Granted Jan 4, 2005·20 cites·8 claims
- 3380US6454869B1Process of cleaning semiconductor processing, handling and manufacturing equipmentIBM·Filed 2001·Granted Sep 24, 2002·24 cites·9 claims
- 3479US10241396B2Mechanical isolation control for an extreme ultraviolet (EUV) pellicleIBM·Filed 2017·Granted Mar 26, 2019·1 cites·20 claims
- 3579US9465290B2Near-infrared absorbing film compositionsGLOBALFOUNDRIES INC·Filed 2014·Granted Oct 11, 2016·2 cites·8 claims
- 3679US8373271B2Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabricationIBM·Filed 2010·Granted Feb 12, 2013·4 cites·28 claims
- 3777US10831102B2Photoactive polymer brush materials and EUV patterning using the sameIBM·Filed 2018·Granted Nov 10, 2020·1 cites·10 claims
- 3876US8652762B2Organic graded spin on BARC compositions for high NA lithographyGOLDFARB DARIO L·Filed 2012·Granted Feb 18, 2014·2 cites·10 claims
- 3975US12019376B2Polymer brush adhesion promoter with UV cleavable linkerIBM·Filed 2021·Granted Jun 25, 2024·0 cites·20 claims
- 4075US8772376B2Near-infrared absorbing film compositionsHUANG WU-SONG·Filed 2009·Granted Jul 8, 2014·3 cites·13 claims
- 4175US7288155B2Method for the rapid thermal control of a work piece in liquid or supercritical fluidIBM·Filed 2005·Granted Oct 30, 2007·3 cites·7 claims
- 4274US8828143B2Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluidSIMONS JOHN P·Filed 2007·Granted Sep 9, 2014·3 cites·12 claims
- 4372US8536031B2Method of fabricating dual damascene structures using a multilevel multiple exposure patterning schemeARNOLD JOHN C·Filed 2010·Granted Sep 17, 2013·2 cites·11 claims
- 4471US10937764B2Three-dimensional microelectronic package with embedded cooling channelsIBM·Filed 2019·Granted Mar 2, 2021·1 cites·17 claims
- 4571US7869002B2Reducing contamination in immersion lithographyIBM·Filed 2008·Granted Jan 11, 2011·3 cites·7 claims
- 4668US11556057B2Surface treatment of titanium containing hardmasksIBM·Filed 2019·Granted Jan 17, 2023·0 cites·19 claims
- 4768US11367617B2Graded hardmask interlayer for enhanced extreme ultraviolet performanceIBM·Filed 2021·Granted Jun 21, 2022·0 cites·20 claims
- 4868US10964541B2Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithographyIBM·Filed 2019·Granted Mar 30, 2021·0 cites·20 claims
- 4968US10569307B2Drying an extreme ultraviolet (EUV) pellicleIBM·Filed 2017·Granted Feb 25, 2020·0 cites·16 claims
- 5067US9182686B2Extreme ultraviolet radiation (EUV) pellicle formation apparatusIBM·Filed 2013·Granted Nov 10, 2015·1 cites·20 claims
Showing the top 50 of 93 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →