Inventor · disambiguated record
Reza Sadjadi
Also filed as: SADJADI REZA
19 granted patents·4 pending applications·777 citations·filing 2000–2017
95Inventor score
Top patents by PatentIndex Score
23 records- 0197US9805965B2Pixelated capacitance controlled ESCAPPLIED MATERIALS INC·Filed 2016·Granted Oct 31, 2017·54 cites·9 claims
- 0297US7708859B2Gas distribution system having fast gas switching capabilitiesLAM RES CORP·Filed 2004·Granted May 4, 2010·268 cites·17 claims
- 0396US9472410B2Pixelated capacitance controlled ESCAPPLIED MAT·Filed 2014·Granted Oct 18, 2016·294 cites·20 claims
- 0494US9536769B1Pixelated capacitance controlled ESCAPPLIED MATERIALS INC·Filed 2016·Granted Jan 3, 2017·11 cites·12 claims
- 0592US8673785B2Gas distribution system having fast gas switching capabilitiesHUANG ZHISONG·Filed 2010·Granted Mar 18, 2014·10 cites·10 claims
- 0689US9646843B2Tunable magnetic field to improve uniformityAPPLIED MATERIALS INC·Filed 2015·Granted May 9, 2017·6 cites·16 claims
- 0782US9111724B2Apparatus and method for controlling plasma potentialKEIL DOUGLAS·Filed 2010·Granted Aug 18, 2015·5 cites·18 claims
- 0882US7294580B2Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon additionLAM RES CORP·Filed 2004·Granted Nov 13, 2007·29 cites·20 claims
- 0979US6518174B2Combined resist strip and barrier etch process for dual damascene structuresLAM RES CORP·Filed 2000·Granted Feb 11, 2003·23 cites·12 claims
- 1074US7838086B2Magnetic enhancement for mechanical confinement of plasmaLAM RES CORP·Filed 2008·Granted Nov 23, 2010·3 cites·7 claims
- 1174US7169695B2Method for forming a dual damascene structureLAM RES CORP·Filed 2003·Granted Jan 30, 2007·16 cites·14 claims
- 1274US6780569B1Post-development treatment of patterned photoresist to promote cross-linking of polymer chainsLAM RES CORP·Filed 2002·Granted Aug 24, 2004·13 cites·18 claims
- 1371US7192531B1In-situ plug fillLAM RES CORP·Filed 2003·Granted Mar 20, 2007·14 cites·17 claims
- 1470US7288488B2Method for resist strip in presence of regular low k and/or porous low k dielectric materialsLAM RES CORP·Filed 2005·Granted Oct 30, 2007·3 cites·20 claims
- 1567US7455748B2Magnetic enhancement for mechanical confinement of plasmaLAM RES CORP·Filed 2003·Granted Nov 25, 2008·9 cites·17 claims
- 1659US6979579B1Methods and apparatus for inspecting contact openings in a plasma processing systemLAM RES CORP·Filed 2004·Granted Dec 27, 2005·6 cites·40 claims
- 1755US2009032192A1Method for Resist Strip in Presence of Low K Dielectric Material and Apparatus for Performing the SameLAM RES CORP·Filed 2008·Application pending·0 cites
- 1854US2008006205A1Apparatus and Method for Controlling Plasma PotentialKEIL DOUGLAS·Filed 2006·Application pending·0 cites
- 1953US7632375B2Electrically enhancing the confinement of plasmaLAM RES CORP·Filed 2004·Granted Dec 15, 2009·11 cites·50 claims
- 2052US7452660B1Method for resist strip in presence of low K dielectric material and apparatus for performing the sameLAM RES CORP·Filed 2004·Granted Nov 18, 2008·2 cites·13 claims
- 2151US10811233B2Process chamber having tunable showerhead and tunable linerAPPLIED MATERIALS INC·Filed 2017·Granted Oct 20, 2020·0 cites·18 claims
- 2243US2004211517A1Method of etching with NH3 and fluorine chemistriesFiled 2004·Application pending·0 cites
- 2339US2002121500A1Method of etching with NH3 and fluorine chemistriesFiled 2000·Application pending·0 cites
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