Inventor · disambiguated record
Henry Povolny
Also filed as: POVOLNY HENRY · POVOLNY HENRY S · POVOLNY HENRY STEPHEN
27 granted patents·2 pending applications·984 citations·filing 2002–2021
97Inventor score
Top patents by PatentIndex Score
29 records- 0199US9508529B2System, method and apparatus for RF power compensation in a plasma processing systemLAM RES CORP·Filed 2014·Granted Nov 29, 2016·123 cites·18 claims
- 0298US8501631B2Plasma processing system control based on RF voltageVALCORE JR JOHN C·Filed 2010·Granted Aug 6, 2013·31 cites·20 claims
- 0398US6638839B2Hot-filament chemical vapor deposition chamber and process with multiple gas inletsUNIV TOLEDO·Filed 2002·Granted Oct 28, 2003·532 cites·15 claims
- 0497US10102321B2System, method and apparatus for refining radio frequency transmission system modelsLAM RES CORP·Filed 2014·Granted Oct 16, 2018·52 cites·20 claims
- 0597US8216486B2Temperature control module using gas pressure to control thermal conductance between liquid coolant and component bodyDHINDSA RAJINDER·Filed 2011·Granted Jul 10, 2012·131 cites·17 claims
- 0696US9673025B2Electrostatic chuck including embedded faraday cage for RF delivery and associated methods for operation, monitoring, and controlLAM RES CORP·Filed 2016·Granted Jun 6, 2017·10 cites·22 claims
- 0796US9455126B2Arrangement for plasma processing system control based on RF voltageLAM RES CORP·Filed 2015·Granted Sep 27, 2016·12 cites·12 claims
- 0895US9224583B2System and method for heating plasma exposed surfacesLAM RES CORP·Filed 2013·Granted Dec 29, 2015·9 cites·18 claims
- 0993US8083855B2Temperature control module using gas pressure to control thermal conductance between liquid coolant and component bodyDHINDSA RAJINDER·Filed 2008·Granted Dec 27, 2011·25 cites·13 claims
- 1090US10879053B2Temperature controlled substrate support assemblyLAM RES CORP·Filed 2016·Granted Dec 29, 2020·5 cites·14 claims
- 1188US10014161B2Electrostatic chuck including embedded faraday cage for RF delivery and associated methods for operation, monitoring, and controlLAM RES CORP·Filed 2017·Granted Jul 3, 2018·3 cites·26 claims
- 1285US9652567B2System, method and apparatus for improving accuracy of RF transmission models for selected portions of an RF transmission pathLAM RES CORP·Filed 2014·Granted May 16, 2017·9 cites·19 claims
- 1384US8454027B2Adjustable thermal contact between an electrostatic chuck and a hot edge ring by clocking a coupling ringPOVOLNY HENRY S·Filed 2009·Granted Jun 4, 2013·11 cites·24 claims
- 1483US10832979B2Feedback control system for iterative etch processLAM RES CORP·Filed 2018·Granted Nov 10, 2020·3 cites·30 claims
- 1583US9911577B2Arrangement for plasma processing system control based on RF voltageLAM RES CORP·Filed 2016·Granted Mar 6, 2018·2 cites·9 claims
- 1683US9502221B2Etch rate modeling and use thereof with multiple parameters for in-chamber and chamber-to-chamber matchingLAM RES CORP·Filed 2014·Granted Nov 22, 2016·4 cites·23 claims
- 1782US10192767B2Ceramic electrostatic chuck including embedded faraday cage for RF delivery and associated methods for operation, monitoring, and controlLAM RES CORP·Filed 2018·Granted Jan 29, 2019·2 cites·20 claims
- 1880US9082594B2Etch rate modeling and use thereof for in-chamber and chamber-to-chamber matchingLAM RES CORP·Filed 2014·Granted Jul 14, 2015·3 cites·20 claims
- 1979US10079168B2Ceramic electrostatic chuck including embedded Faraday cage for RF delivery and associated methods for operation, monitoring, and controlLAM RES CORP·Filed 2017·Granted Sep 18, 2018·2 cites·20 claims
- 2077US10475623B2Ceramic layer for electrostatic chuck including embedded faraday cage for RF delivery and associated methodsLAM RES CORP·Filed 2017·Granted Nov 12, 2019·1 cites·18 claims
- 2176US9128473B2Arrangement for plasma processing system control based on RF voltageLAM RES CORP·Filed 2013·Granted Sep 8, 2015·2 cites·20 claims
- 2274US10892197B2Edge seal configurations for a lower electrode assemblyLAM RES CORP·Filed 2018·Granted Jan 12, 2021·1 cites·16 claims
- 2373US8832916B2Methods of dechucking and system thereofPOVOLNY HENRY S·Filed 2011·Granted Sep 16, 2014·3 cites·10 claims
- 2472US10090211B2Edge seal for lower electrode assemblyLAM RES CORP·Filed 2013·Granted Oct 2, 2018·2 cites·19 claims
- 2570US10892179B2Electrostatic chuck including clamp electrode assembly forming portion of Faraday cage for RF delivery and associated methodsLAM RES CORP·Filed 2017·Granted Jan 12, 2021·1 cites·18 claims
- 2666US11101107B2Ceramic layer for electrostatic chuck including embedded faraday cage for RF delivery and associated methodsLAM RES CORP·Filed 2019·Granted Aug 24, 2021·0 cites·22 claims
- 2764US6755151B2Hot-filament chemical vapor deposition chamber and process with multiple gas inletsUNIV TOLEDO·Filed 2003·Granted Jun 29, 2004·5 cites·14 claims
- 2851US2014356985A1Temperature controlled substrate support assemblyLAM RES CORP·Filed 2013·Application pending·0 cites
- 2946US2023057217A1Gas distribution faceplate with oblique flow pathsLAM RES CORP·Filed 2021·Application pending·0 cites
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