Inventor · disambiguated record
Masafumi Kubota
Also filed as: KUBOTA MASAFUMI
32 granted patents·3 pending applications·1,388 citations·filing 1987–2021
98Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD28HAYASHI SHIGENORI1ISUZU MOTORS LTD1MATSUSHITA ELECTRIC COMPANY LT1NISHIJIMA OSAMU1
Top patents by PatentIndex Score
35 records- 0197US5404079APlasma generating apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Apr 4, 1995·136 cites·8 claims
- 0295US5928528APlasma treatment method and plasma treatment systemMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Jul 27, 1999·190 cites·22 claims
- 0395US4912065APlasma doping methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1988·Granted Mar 27, 1990·171 cites·5 claims
- 0494US4845048AMethod of fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1988·Granted Jul 4, 1989·127 cites·6 claims
- 0593US4837172AMethod for removing impurities existing in semiconductor substrateMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Jun 6, 1989·120 cites·4 claims
- 0692US6667246B2Wet-etching method and method for manufacturing semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Dec 23, 2003·75 cites·10 claims
- 0791US6033928AMethod of manufacturing aggregate of semiconductor micro-needlesMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1994·Granted Mar 7, 2000·98 cites·12 claims
- 0886US6177291B1Method of making aggregate of semiconductor micro-needlesMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Jan 23, 2001·26 cites·8 claims
- 0985US5330606APlasma source for etchingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1991·Granted Jul 19, 1994·37 cites·11 claims
- 1083US5593539APlasma source for etchingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1994·Granted Jan 14, 1997·32 cites·5 claims
- 1182US8574972B2Method for fabricating semiconductor device and plasma doping apparatusSASAKI YUICHIRO·Filed 2010·Granted Nov 5, 2013·5 cites·24 claims
- 1281US6087197AAggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1999·Granted Jul 11, 2000·44 cites·3 claims
- 1377US5332880AMethod and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric fieldMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jul 26, 1994·44 cites·19 claims
- 1475US6210593B1Etching method and etching apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Apr 3, 2001·35 cites·8 claims
- 1571US5436424APlasma generating method and apparatus for generating rotating electrons in the plasmaMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jul 25, 1995·22 cites·6 claims
- 1670US8216922B2Plasma doping methodHAYASHI SHIGENORI·Filed 2011·Granted Jul 10, 2012·3 cites·20 claims
- 1769US4997786AMethod of fabricating a semiconductor device having buried insulation layer separated by ditchesMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1989·Granted Mar 5, 1991·33 cites·2 claims
- 1868US7094639B2Method for fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Aug 22, 2006·9 cites·24 claims
- 1966US5345145AMethod and apparatus for generating highly dense uniform plasma in a high frequency electric fieldMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Sep 6, 1994·33 cites·22 claims
- 2065US6812101B2Semiconductor device and method for manufacture thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Nov 2, 2004·9 cites·34 claims
- 2164US7144761B2Semiconductor device and method for fabricating the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Dec 5, 2006·9 cites·10 claims
- 2262US6489629B1Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Dec 3, 2002·5 cites·7 claims
- 2361US7800181B2Semiconductor device and method for fabricating the samePANASONIC CORP·Filed 2006·Granted Sep 21, 2010·2 cites·9 claims
- 2460US5324388ADry etching method and dry etching apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jun 28, 1994·14 cites·10 claims
- 2559US6734451B2Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted May 11, 2004·6 cites·33 claims
- 2659US5869402APlasma generating and processing method and apparatus thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Feb 9, 1999·14 cites·25 claims
- 2759US5312776AMethod of preventing the corrosion of metallic wiringsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1992·Granted May 17, 1994·28 cites·9 claims
- 2855US5259922ADrying etching methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1991·Granted Nov 9, 1993·25 cites·9 claims
- 2951US5753066APlasma source for etchingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted May 19, 1998·7 cites·12 claims
- 3050US5170098APlasma processing method and apparatus for use in carrying out the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1992·Granted Dec 8, 1992·20 cites·10 claims
- 3150US2006205131A1Method for fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Application pending·0 cites
- 3246US5424905APlasma generating method and apparatusMATSUSHITA ELECTRIC COMPANY LT·Filed 1993·Granted Jun 13, 1995·9 cites·18 claims
- 3340US12172663B2Warning device utilizing azimuth angles of vehiclesISUZU MOTORS LTD·Filed 2021·Granted Dec 24, 2024·0 cites·8 claims
- 3440US2002050651A1Semiconductor device and method for fabricating the sameFiled 2001·Application pending·0 cites
- 3538US2011303146A1Plasma doping apparatusNISHIJIMA OSAMU·Filed 2010·Application pending·0 cites
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