Inventor · disambiguated record
I-Hsiung Huang
Also filed as: HUANG I-HSIUNG
41 granted patents·13 pending applications·332 citations·filing 1999–2025
97Inventor score
Files withUNITED MICROELECTRONICS CORP21TAIWAN SEMICONDUCTOR MFG CO LTD7AU OPTRONICS CORP5HUANG I-HSIUNG4LIN LING-CHIEH3
Top patents by PatentIndex Score
54 records- 0191US8592102B2Cost-effective method for extreme ultraviolet (EUV) mask productionLIN CHIN-HSIANG·Filed 2009·Granted Nov 26, 2013·16 cites·13 claims
- 0290US9671685B2Lithographic plane check for mask processingLIN CHIN-HSIANG·Filed 2010·Granted Jun 6, 2017·8 cites·13 claims
- 0390US7617475B2Method of manufacturing photomask and method of repairing optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 2006·Granted Nov 10, 2009·12 cites·14 claims
- 0487US8592287B2Overlay alignment mark and method of detecting overlay alignment error using the markSHIH CHI-YUAN·Filed 2011·Granted Nov 26, 2013·7 cites·13 claims
- 0585US6458705B1Method for forming via-first dual damascene interconnect structureUNITED MICROELECTRONICS CORP·Filed 2001·Granted Oct 1, 2002·44 cites·20 claims
- 0685US2025321506A1Euv lithography apparatus and operating method for mitigating contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0784US6664028B2Method of forming opening in wafer layerUNITED MICROELECTRONICS CORP·Filed 2000·Granted Dec 16, 2003·24 cites·20 claims
- 0881US6080527AOptical proximity correction of L and T shaped patterns on negative photoresistUNITED MICROELECTRONICS CORP·Filed 1999·Granted Jun 27, 2000·59 cites·3 claims
- 0979US2025244661A1Methods for cleaning lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1077US6492097B1Process for increasing a line width window in a semiconductor processUNITED MICROELECTRONICS CORP·Filed 2000·Granted Dec 10, 2002·19 cites·10 claims
- 1176US12429783B2EUV lithography apparatus and operating method for mitigating contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 1276US12276906B2Methods for cleaning lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 15, 2025·0 cites·20 claims
- 1375US10416804B2Dual-mode capacitive touch display panelAU OPTRONICS CORP·Filed 2016·Granted Sep 17, 2019·2 cites·16 claims
- 1475US6589881B2Method of forming dual damascene structureUNITED MICROELECTRONICS CORP·Filed 2001·Granted Jul 8, 2003·23 cites·15 claims
- 1573US6839126B2Photolithography process with multiple exposuresUNITED MICROELECTRONICS CORP·Filed 2002·Granted Jan 4, 2005·13 cites·29 claims
- 1673US6337269B1Method of fabricating a dual damascene structureUNITED MICROELECTRONICS CORP·Filed 2001·Granted Jan 8, 2002·22 cites·18 claims
- 1772US9196515B2Litho cluster and modulization to enhance productivityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Nov 24, 2015·2 cites·20 claims
- 1869US8278762B2Method of manufacturing photomask and method of repairing optical proximity correctionLIN LING-CHIEH·Filed 2009·Granted Oct 2, 2012·2 cites·17 claims
- 1968US6391757B1Dual damascene processUNITED MICROELECTRONICS CORP·Filed 2001·Granted May 21, 2002·17 cites·12 claims
- 2067US6489085B2Thermal reflow photolithographic processUNITED MICROELECTRONICS CORP·Filed 2000·Granted Dec 3, 2002·10 cites·7 claims
- 2167US6444410B1Method of improving photoresist profileUNITED MICROELECTRONICS CORP·Filed 2000·Granted Sep 3, 2002·10 cites·13 claims
- 2264US10996498B2Display apparatus with touch sensing and force sensing functionsAU OPTRONICS CORP·Filed 2016·Granted May 4, 2021·1 cites·6 claims
- 2363US6579790B1Dual damascene manufacturing processUNITED MICROELECTRONICS CORP·Filed 2000·Granted Jun 17, 2003·8 cites·23 claims
- 2462US6582858B2Alternating phase shifting maskUNITED MICROELECTRONICS CORP·Filed 2001·Granted Jun 24, 2003·8 cites·14 claims
- 2559US10712864B2Dual-mode capacitive touch display panelAU OPTRONICS CORP·Filed 2019·Granted Jul 14, 2020·0 cites·11 claims
- 2658US6350681B1Method of forming dual damascene structureUNITED MICROELECTRONICS CORP·Filed 2001·Granted Feb 26, 2002·9 cites·18 claims
- 2756US8101530B2Lithography patterning methodHUANG I-HSIUNG·Filed 2009·Granted Jan 24, 2012·1 cites·20 claims
- 2855US2023008957A1Lithography focus control methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 2954US6680163B2Method of forming opening in wafer layerUNITED MICROELECTRONICS CORP·Filed 2002·Granted Jan 20, 2004·3 cites·16 claims
- 3053US9601324B2Method of making wafer assemblyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 21, 2017·0 cites·21 claims
- 3153US8338960B2Method of manufacturing photomask and method of repairing optical proximity correctionLIN LING-CHIEH·Filed 2012·Granted Dec 25, 2012·0 cites·13 claims
- 3252US9111982B2Wafer assembly with carrier waferHUANG I-HSIUNG·Filed 2012·Granted Aug 18, 2015·0 cites·20 claims
- 3352US6316340B1Photolithographic process for preventing corner roundingUNITED MICROELECTRONICS CORP·Filed 2000·Granted Nov 13, 2001·3 cites·15 claims
- 3449US6656667B2Multiple resist layer photolithographic processUNITED MICROELECTRONICS CORP·Filed 2001·Granted Dec 2, 2003·2 cites·8 claims
- 3547US8237132B2Method and apparatus for reducing down time of a lithography systemPENG JUI-CHUN·Filed 2009·Granted Aug 7, 2012·2 cites·20 claims
- 3647US2010053575A1Thermal Control For EUV LithographyTAIWAN SEMICONDUCTOR MFG·Filed 2008·Application pending·0 cites
- 3746US6380077B1Method of forming contact openingUNITED MICROELECTRONICS CORP·Filed 2001·Granted Apr 30, 2002·1 cites·18 claims
- 3845US9128320B2Three-dimensional display and three dimensional display systemCHEN WEN-LUNG·Filed 2009·Granted Sep 8, 2015·0 cites·23 claims
- 3945US8338262B2Dual wavelength exposure method and system for semiconductor device manufacturingLEE HENG-JEN·Filed 2009·Granted Dec 25, 2012·0 cites·14 claims
- 4045US2002034647A1Methof for forming dielectric of low dielectric constant on hydrophilic dielectric and the structureFiled 2001·Application pending·0 cites
- 4143US9025092B2Liquid crystal display comprising liquid crystal lens driven at a first time period and a second time periodAU OPTRONICS CORP·Filed 2012·Granted May 5, 2015·0 cites·12 claims
- 4243US2008178140A1Method for correcting photomask patternUNITED MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 4342US8903532B2Litho cluster and modulization to enhance productivityHUANG I-HSIUNG·Filed 2012·Granted Dec 2, 2014·0 cites·20 claims
- 4442US2008163892A1Cleaning wafer including detergent layer for exposure apparatus of immersion lithography system, composition of detergent layer, method of using cleaning wafer and application systemUNITED MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 4541US8609545B2Method to improve mask critical dimension uniformity (CDU)HUANG I-HSIUNG·Filed 2008·Granted Dec 17, 2013·0 cites·12 claims
- 4637US8906599B2Enhanced scanner throughput system and methodLIU YU-MEI·Filed 2012·Granted Dec 9, 2014·0 cites·13 claims
- 4737US6541782B2Electron beam photolithographic processUNITED MICROELECTRONICS COPR·Filed 2000·Granted Apr 1, 2003·0 cites·6 claims
- 4837US6312855B1Three-phase phase shift maskUNITED MICROELECTRONICS CORP·Filed 1999·Granted Nov 6, 2001·4 cites·11 claims
- 4937US2017300163A1Touch display panel and driving method thereofAU OPTRONICS CORP·Filed 2016·Application pending·0 cites
- 5036US2007053077A1Customer illumination aperture structureLIN LING-CHIEH·Filed 2005·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →