Inventor · disambiguated record
Yoshiyuki Kuramoto
Also filed as: KURAMOTO YOSHIYUKI
31 granted patents·6 pending applications·74 citations·filing 2001–2016
95Inventor score
Top patents by PatentIndex Score
37 records- 0187US7608808B2Injection-locked pulsed laser with high wavelength stabilityCANON KK·Filed 2007·Granted Oct 27, 2009·8 cites·10 claims
- 0286US7276717B2Measuring apparatus, exposure apparatus and device manufacturing methodCANON KK·Filed 2005·Granted Oct 2, 2007·9 cites·18 claims
- 0375US6937345B2Measuring system for measuring performance of imaging optical systemCANON KK·Filed 2001·Granted Aug 30, 2005·17 cites·42 claims
- 0474US8363226B2Optical interference measuring apparatusCANON KK·Filed 2010·Granted Jan 29, 2013·4 cites·11 claims
- 0572US8339611B2Interferometric distance measurement with harmonic frequency comb generated beamsKURAMOTO YOSHIYUKI·Filed 2009·Granted Dec 25, 2012·7 cites·13 claims
- 0670US7773233B2Method of measuring wavefront retardance aberration based on wavefront and birefringent characteristicsCANON KK·Filed 2008·Granted Aug 10, 2010·2 cites·6 claims
- 0769US8559015B2Measuring apparatusKURAMOTO YOSHIYUKI·Filed 2010·Granted Oct 15, 2013·3 cites·16 claims
- 0867US8576404B2Optical interferometerKURAMOTO YOSHIYUKI·Filed 2011·Granted Nov 5, 2013·3 cites·8 claims
- 0967US8502986B2Lightwave interference measurement apparatus that calculates absolute distance using lightwave interferenceKODA YUSUKE·Filed 2011·Granted Aug 6, 2013·5 cites·8 claims
- 1065US8243256B2Measurement apparatus for measuring an aberration of an optical system, measurement method, exposure apparatus, and device fabrication methodSUZUKI TAKESHI·Filed 2009·Granted Aug 14, 2012·2 cites·8 claims
- 1165US8174675B2Measuring apparatus, optical system manufacturing method, exposure apparatus, device manufacturing method, and processing apparatusSUZUKI TAKESHI·Filed 2010·Granted May 8, 2012·1 cites·10 claims
- 1264US9115971B2Measuring apparatusKURAMOTO YOSHIYUKI·Filed 2012·Granted Aug 25, 2015·2 cites·6 claims
- 1362US9175953B2Measurement apparatus to calculate wavefront aberration of optical system using shearing interference fringes, exposure apparatus, and method of manufacturing deviceKURAMOTO YOSHIYUKI·Filed 2010·Granted Nov 3, 2015·2 cites·9 claims
- 1458US7910871B2Injection-locked laser, interferometer, exposure apparatus, and device manufacturing methodCANON KK·Filed 2009·Granted Mar 22, 2011·0 cites·13 claims
- 1556US8797542B2Measurement apparatusTOKIMITSU TAKUMI·Filed 2011·Granted Aug 5, 2014·2 cites·7 claims
- 1656US8416422B2Lightwave interference measurement apparatus used to measure optical path length or distanceSASAKI TAKAMASA·Filed 2011·Granted Apr 9, 2013·2 cites·8 claims
- 1754US7532019B2Measuring apparatus and measuring methodCANON KK·Filed 2006·Granted May 12, 2009·1 cites·6 claims
- 1851US9297745B2Shape measuring apparatus, and method of manufacturing articleCANON KK·Filed 2014·Granted Mar 29, 2016·0 cites·12 claims
- 1951US7907263B2Apparatuses and methods using measurement of a flare generated in an optical systemCANON KK·Filed 2009·Granted Mar 15, 2011·0 cites·6 claims
- 2051US7787103B2Projection exposure apparatus, optical member, and device manufacturing methodCANON KK·Filed 2007·Granted Aug 31, 2010·0 cites·3 claims
- 2149US7995213B2Measurement method, measurement apparatus, exposure apparatus, and device fabrication methodCANON KK·Filed 2010·Granted Aug 9, 2011·0 cites·1 claims
- 2248US7161681B2Aberration measuring apparatus comprising wavelength calibration and stabilizationCANON KK·Filed 2004·Granted Jan 9, 2007·2 cites·4 claims
- 2348US2009257037A1Measurement method, measurement apparatus, exposure apparatus, and device fabrication methodCANON KK·Filed 2009·Application pending·0 cites
- 2447US7548077B2Measuring apparatus and a measuring method for measuring a polarization characteristic of an optical systemCANON KK·Filed 2007·Granted Jun 16, 2009·0 cites·6 claims
- 2545US8724114B2Interferometer and distance calculation method thereforKURAMOTO YOSHIYUKI·Filed 2011·Granted May 13, 2014·0 cites·9 claims
- 2645US8174670B2Measurement method and exposure apparatusTEZUKA TARO·Filed 2009·Granted May 8, 2012·1 cites·12 claims
- 2745US2015057972A1Measuring apparatus and measuring methodCANON KK·Filed 2014·Application pending·0 cites
- 2844US8542345B2Measurement apparatus, exposure apparatus, and device manufacturing method to measure numerical aperture of the optical system using interference fringeSUZUKI TAKESHI·Filed 2009·Granted Sep 24, 2013·0 cites·5 claims
- 2940US2014182150A1Measurement apparatus and measurement methodCANON KK·Filed 2013·Application pending·0 cites
- 3039US9372068B2Measuring apparatus including multi-wavelength interferometerCANON KK·Filed 2012·Granted Jun 21, 2016·0 cites·11 claims
- 3138US8692975B2Measurement apparatus, exposure apparatus, and device fabrication methodKURAMOTO YOSHIYUKI·Filed 2010·Granted Apr 8, 2014·0 cites·7 claims
- 3238US2016354881A1Measurement apparatus, system, and method of manufacturing articleCANON KK·Filed 2016·Application pending·0 cites
- 3337US6790111B2Outboard motorSUZUKI CO LTD·Filed 2002·Granted Sep 14, 2004·1 cites·11 claims
- 3436US10018722B2Measurement apparatusCANON KK·Filed 2016·Granted Jul 10, 2018·0 cites·13 claims
- 3535US2015253128A1Measurement apparatus, measurement method, and method of manufacturing articleCANON KK·Filed 2015·Application pending·0 cites
- 3633US2016238380A1Image measuring method and image measuring apparatusCANON KK·Filed 2016·Application pending·0 cites
- 3730US8830480B2Measurement apparatusTEZUKA TARO·Filed 2011·Granted Sep 9, 2014·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →