Inventor · disambiguated record
Siegfried Schwarzl
Also filed as: SCHWARZL SIEGFRIED
40 granted patents·11 pending applications·669 citations·filing 1984–2011
98Inventor score
Top patents by PatentIndex Score
51 records- 0195US6458603B1Method of fabricating a micro-technical structure, and micro-technical componentINFINEON TECHNOLOGIES AG·Filed 2001·Granted Oct 1, 2002·104 cites·9 claims
- 0292US8501373B2Passivation of multi-layer mirror for extreme ultraviolet lithographySCHWARZL SIEGFRIED·Filed 2011·Granted Aug 6, 2013·9 cites·20 claims
- 0392US6379978B2Memory cell configuration in which an electrical resistance of a memory element represents an information item and can be influenced by a magnetic field, and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2001·Granted Apr 30, 2002·98 cites·5 claims
- 0491US6351408B1Memory cell configurationINFINEON TECHNOLOGIES AG·Filed 2000·Granted Feb 26, 2002·61 cites·9 claims
- 0587US6510078B2Memory cell array and method for manufacturing itSIEMENS AG·Filed 2001·Granted Jan 21, 2003·40 cites·14 claims
- 0684US7323821B2Device for generating and/or influencing electromagnetic radiation from a plasmaQIMONDA AG·Filed 2005·Granted Jan 29, 2008·7 cites·20 claims
- 0781US7859648B2Passivation of multi-layer mirror for extreme ultraviolet lithographyINFINEON TECHNOLOGIES AG·Filed 2009·Granted Dec 28, 2010·5 cites·21 claims
- 0879US6574138B2Memory cell configuration and method for operating the configurationINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jun 3, 2003·28 cites·10 claims
- 0976US5529950AMethod for manufacturing a cubically integrated circuit arrangementSIEMENS AG·Filed 1995·Granted Jun 25, 1996·53 cites·20 claims
- 1075US7078134B2Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coatingINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jul 18, 2006·22 cites·19 claims
- 1172US6872495B2Method for fabricating a lithographic reflection mask in particular for the patterning of a semiconductor wafer, and a reflection maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Mar 29, 2005·11 cites·43 claims
- 1271US6925002B2Semiconductor memory having mutually crossing word and bit lines, at which magnetoresistive memory cells are arrangedINFINEON TECHNOLOGIES AG·Filed 2004·Granted Aug 2, 2005·18 cites·32 claims
- 1371US4581319AMethod for the manufacture of bipolar transistor structures with self-adjusting emitter and base regions for extreme high frequency circuitsSIEMENS AG·Filed 1984·Granted Apr 8, 1986·37 cites·14 claims
- 1469US7064439B1Integrated electrical circuit and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2000·Granted Jun 20, 2006·17 cites·26 claims
- 1568US7023063B2Arrangement of microstructuresINFINEON TECHNOLOGIES AG·Filed 2004·Granted Apr 4, 2006·12 cites·8 claims
- 1668US6577526B1Magnetoresistive element and the use thereof as storage element in a storage cell arrayINFINEON TECHNOLOGIES AG·Filed 1999·Granted Jun 10, 2003·21 cites·13 claims
- 1766US6717843B1Polyvalent, magnetoresistive write/read memory and method for writing and reading a memory of this typeINFINEON TECHNOLOGIES AG·Filed 2000·Granted Apr 6, 2004·14 cites·17 claims
- 1866US6462980B2MRAM memory with drive logic arrangementINFINEON TECHNOLOGIES AG·Filed 2001·Granted Oct 8, 2002·16 cites·18 claims
- 1965US7407729B2EUV magnetic contrast lithography mask and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2004·Granted Aug 5, 2008·7 cites·26 claims
- 2065US6424562B1Read/write architecture for MRAMINFINEON TECHNOLOGIES AG·Filed 2001·Granted Jul 23, 2002·14 cites·11 claims
- 2163US6930052B2Method for producing an integrated circuit having at least one metalicized surfaceINFINEON TECHNOLOGIES AG·Filed 2003·Granted Aug 16, 2005·7 cites·10 claims
- 2262US7626682B2Reticle stages for lithography systems and lithography methodsINFINEON TECHNOLOGIES AG·Filed 2006·Granted Dec 1, 2009·1 cites·12 claims
- 2362US7029808B2Photosensitive coating material for a substrate and process for exposing the coated substrateINFINEON TECHNOLOGIES AG·Filed 2003·Granted Apr 18, 2006·6 cites·3 claims
- 2460US7316933B2Method for producing an annular microstructure elementINFINEON TECHNOLOGIES AG·Filed 2005·Granted Jan 8, 2008·2 cites·17 claims
- 2558US5262002AMethod for manufacturing a trench structure in a substrateSIEMENS AG·Filed 1992·Granted Nov 16, 1993·19 cites·13 claims
- 2655US6686643B2Substrate with at least two metal structures deposited thereon, and method for fabricating the sameINFINEON TECHNOLOGIES AG·Filed 2000·Granted Feb 3, 2004·7 cites·6 claims
- 2754US6579729B2Memory cell configuration and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2001·Granted Jun 17, 2003·8 cites·7 claims
- 2854US2010035431A1Reticle Stages for Lithography Systems and Lithography MethodsWURM STEFAN·Filed 2009·Application pending·0 cites
- 2952US6825098B2Method for fabricating microstructures and arrangement of microstructuresINFINEON TECHNOLOGIES AG·Filed 2003·Granted Nov 30, 2004·4 cites·16 claims
- 3051US2008204695A1EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated EnvironmentSCHWARZL SIEGFRIED·Filed 2008·Application pending·0 cites
- 3150US6849365B2Reflection mask for EUV-lithography and method for fabricating the reflection maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Feb 1, 2005·1 cites·13 claims
- 3247US6495873B2Magnetoresistive element and use thereof as a memory element in a memory cell configurationINFINEON TECHNOLOGIES AG·Filed 2001·Granted Dec 17, 2002·2 cites·4 claims
- 3346US8076055B2Passivation of multi-layer mirror for extreme ultraviolet lithographySCHWARZL SIEGFRIED·Filed 2010·Granted Dec 13, 2011·0 cites·9 claims
- 3446US6630703B2Magnetoresistive memory cell configuration and method for its productionINFINEON TECHNOLOGIES AG·Filed 2001·Granted Oct 7, 2003·5 cites·8 claims
- 3545US6605837B2Memory cell configuration and production methodINFINEON TECHNOLOGIES AG·Filed 2001·Granted Aug 12, 2003·4 cites·19 claims
- 3643US7259441B2Hollow structure in an integrated circuit and method for producing such a hollow structure in an integrated circuitINFINEON TECHNOLOGIES AG·Filed 2002·Granted Aug 21, 2007·1 cites·9 claims
- 3743US6943393B2Memory cell arrangement and method of fabricating itINFINEON TECHNOLOGIES AG·Filed 2001·Granted Sep 13, 2005·4 cites·8 claims
- 3842US2006024589A1Passivation of multi-layer mirror for extreme ultraviolet lithographySCHWARZL SIEGFRIED·Filed 2004·Application pending·0 cites
- 3942US2005223973A1EUV lithography system and chuck for releasing reticle in a vacuum isolated environmentINFINEON TECHNOLOGIES AG·Filed 2004·Application pending·0 cites
- 4041US7332444B2Method for smoothing areas in structures by utilizing the surface tensionINFINEON TECHNOLOGIES AG·Filed 2005·Granted Feb 19, 2008·0 cites·26 claims
- 4140US7417736B2Method for determining a radiation power and an exposure apparatusINFINEON TECHNOLOGIES AG·Filed 2005·Granted Aug 26, 2008·0 cites·22 claims
- 4240US2008063982A1Fluids and methods of forming thereofWURM STEFAN·Filed 2006·Application pending·0 cites
- 4340US2002098679A1Method for producing an integrated circuit having at least one metalicized surfaceFiled 2001·Application pending·0 cites
- 4440US2008073572A1Systems and methods of measuring power in lithography systemsSCHWARZL SIEGFRIED·Filed 2006·Application pending·0 cites
- 4538US7341875B2Semiconductor memory device with a capacitor formed therein and a method for forming the sameINFINEON TECHNOLOGIES AG·Filed 2002·Granted Mar 11, 2008·0 cites·20 claims
- 4638USRE39799EMemory cell array and method for manufacturing itINFINEON TECHNOLOGIES AG·Filed 2003·Granted Aug 28, 2007·1 cites·14 claims
- 4737US2006292459A1EUV reflection mask and method for producing itKAMM FRANK-MICHAEL·Filed 2006·Application pending·0 cites
- 4834US2009011556A9Method for producing a microelectronic structureBEITEL GERHARD·Filed 2001·Application pending·0 cites
- 4933US2006147839A1Photosensitive coating material for a substrateINFINEON TECHNOLOGIES AG·Filed 2006·Application pending·0 cites
- 5032US5626279AMethod for fastening a first substrate on a second substrate and employment of said method for manufacturing a three-dimensional circuit arrangementSIEMENS AG·Filed 1995·Granted May 6, 1997·3 cites·20 claims
Showing the top 50 of 51 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →