Inventor · disambiguated record
Masahide Okumura
Also filed as: OKUMURA MASAHIDE
31 granted patents·543 citations·filing 1976–2002
97Inventor score
Top patents by PatentIndex Score
31 records- 0193US7094744B1Method for producing sheetlike detergentKAO CORP·Filed 2000·Granted Aug 22, 2006·66 cites·24 claims
- 0292US6159644AMethod of fabricating semiconductor circuit devices utilizing multiple exposuresHITACHI LTD·Filed 1996·Granted Dec 12, 2000·100 cites·7 claims
- 0390US4039829AStereoscopic measuring apparatusHITACHI LTD·Filed 1976·Granted Aug 2, 1977·28 cites·5 claims
- 0486US6121625ACharged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 1998·Granted Sep 19, 2000·30 cites·11 claims
- 0586US4600839ASmall-dimension measurement system by scanning electron beamHITACHI LTD·Filed 1984·Granted Jul 15, 1986·35 cites·4 claims
- 0681US4841191APiezoelectric actuator control apparatusHITACHI LTD·Filed 1988·Granted Jun 20, 1989·46 cites·9 claims
- 0779US4099704AVacuum valve apparatusHITACHI LTD·Filed 1976·Granted Jul 11, 1978·32 cites·10 claims
- 0878US4090106AField emision electron gun with controlled power supplyHITACHI LTD·Filed 1976·Granted May 16, 1978·24 cites·7 claims
- 0976US4692579AElectron beam lithography apparatusHITACHI LTD·Filed 1985·Granted Sep 8, 1987·21 cites·7 claims
- 1075US6441383B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2001·Granted Aug 27, 2002·6 cites·1 claims
- 1175US6262428B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Jul 17, 2001·6 cites·3 claims
- 1274US4670652ACharged particle beam microprobe apparatusHITACHI LTD·Filed 1985·Granted Jun 2, 1987·19 cites·2 claims
- 1370US6320198B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Nov 20, 2001·4 cites·1 claims
- 1469US5650631AElectron beam writing systemHITACHI LTD·Filed 1995·Granted Jul 22, 1997·22 cites·30 claims
- 1565US4099054ASem having d-c bias of video signal controlled by maximum and/or minimum of crt beam currentHITACHI LTD·Filed 1977·Granted Jul 4, 1978·10 cites·17 claims
- 1663US5424550ACharged particle beam exposure apparatusHITACHI LTD·Filed 1994·Granted Jun 13, 1995·14 cites·60 claims
- 1760US4701620AElectron beam exposure apparatusHITACHI LTD·Filed 1986·Granted Oct 20, 1987·10 cites·3 claims
- 1858US5402863AApparatus to automatically adjust spring tension of an elevator brake to maintain brake torqueMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Apr 4, 1995·17 cites·10 claims
- 1957US4829444ACharged particle beam lithography systemHITACHI LTD·Filed 1986·Granted May 9, 1989·9 cites·3 claims
- 2056US6555833B2Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2002·Granted Apr 29, 2003·1 cites·2 claims
- 2155US4059783AField emission apparatusHITACHI LTD·Filed 1977·Granted Nov 22, 1977·7 cites·10 claims
- 2252US6403973B1Electron beam exposure method and apparatus and semiconductor device manufactured using the sameHITACHI LTD·Filed 2000·Granted Jun 11, 2002·6 cites·8 claims
- 2351US4808829AMark position detection system for use in charged particle beam apparatusHITACHI LTD·Filed 1987·Granted Feb 28, 1989·8 cites·4 claims
- 2451US4015191AD.C. high voltage power source with precise load current measurementHITACHI LTD·Filed 1976·Granted Mar 29, 1977·8 cites·10 claims
- 2548US6881441B1Method for intermittently forming laid layersKAO CORP·Filed 2000·Granted Apr 19, 2005·1 cites·5 claims
- 2646US6583431B2Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2002·Granted Jun 24, 2003·0 cites·1 claims
- 2746US6509572B2Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2002·Granted Jan 21, 2003·0 cites·1 claims
- 2846US4437008AElectron beam control systemNIPPON TELEGRAPH & TELEPHONE·Filed 1981·Granted Mar 13, 1984·5 cites·4 claims
- 2944US6329665B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Dec 11, 2001·0 cites·1 claims
- 3041US5281827ACharged particle beam exposure apparatusHITACHI LTD·Filed 1991·Granted Jan 25, 1994·5 cites·15 claims
- 3129US5050709AElevator control apparatusMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Sep 24, 1991·3 cites·4 claims
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