Inventor · disambiguated record
Petrus Anton Willem Cornelia Maria Van Eijck
Also filed as: VAN EIJCK PETRUS ANTON WILLEM · VAN EIJCK PETRUS ANTON WILLEM CORNELIA MARIA · VAN EIJCK PETRUS ANTON WILLERN CORNELIA MARIA
6 granted patents·1 pending application·47 citations·filing 2004–2017
81Inventor score
Top patents by PatentIndex Score
7 records- 0193US7352440B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·37 cites·18 claims
- 0287US9182222B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2012·Granted Nov 10, 2015·3 cites·53 claims
- 0386US8441617B2Substrate placement in immersion lithographyHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2011·Granted May 14, 2013·3 cites·12 claims
- 0479US8077291B2Substrate placement in immersion lithographyHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2007·Granted Dec 13, 2011·3 cites·14 claims
- 0577US9740106B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2015·Granted Aug 22, 2017·1 cites·66 claims
- 0660US10345711B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2017·Granted Jul 9, 2019·0 cites·20 claims
- 0736US2011013188A1Object Alignment Measurement Method and ApparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →