Inventor · disambiguated record
Eugene Joseph Karwacki, Jr.
Also filed as: KARWACKI EUGENE J · KARWACKI EUGENE J JR · KARWACKI EUGENE JOSEPH · KARWACKI JR EUGENE
39 granted patents·28 pending applications·2,320 citations·filing 1990–2025
98Inventor score
Top patents by PatentIndex Score
67 records- 0198US7357138B2Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materialsAIR PROD & CHEM·Filed 2003·Granted Apr 15, 2008·559 cites·14 claims
- 0298US7098149B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2003·Granted Aug 29, 2006·624 cites·31 claims
- 0397US8795411B2Method for recovering high-value components from waste gas streamsHUFTON JEFFREY RAYMOND·Filed 2012·Granted Aug 5, 2014·50 cites·17 claims
- 0497US7332445B2Porous low dielectric constant compositions and methods for making and using sameAIR PROD & CHEM·Filed 2005·Granted Feb 19, 2008·65 cites·55 claims
- 0597US7055263B2Method for cleaning deposition chambers for high dielectric constant materialsAIR PROD & CHEM·Filed 2003·Granted Jun 6, 2006·385 cites·21 claims
- 0696US8298628B2Low temperature deposition of silicon-containing filmsYANG LIU·Filed 2009·Granted Oct 30, 2012·58 cites·4 claims
- 0794US8535414B2Recovering of xenon by adsorption processJOHNSON ANDREW DAVID·Filed 2011·Granted Sep 17, 2013·51 cites·18 claims
- 0894US7129199B2Process solutions containing surfactantsAIR PROD & CHEM·Filed 2003·Granted Oct 31, 2006·63 cites·14 claims
- 0992US8591634B2Method and equipment for selectively collecting process effluentWINCHESTER DAVID CHARLES·Filed 2011·Granted Nov 26, 2013·50 cites·20 claims
- 1092US6686594B2On-line UV-Visible light halogen gas analyzer for semiconductor processing effluent monitoringAIR PROD & CHEM·Filed 2001·Granted Feb 3, 2004·53 cites·43 claims
- 1190US7591270B2Process solutions containing surfactantsAIR PROD & CHEM·Filed 2006·Granted Sep 22, 2009·11 cites·15 claims
- 1290US7581549B2Method for removing carbon-containing residues from a substrateAIR PROD & CHEM·Filed 2005·Granted Sep 1, 2009·18 cites·20 claims
- 1390US7404990B2Non-thermal process for forming porous low dielectric constant filmsAIR PROD & CHEM·Filed 2002·Granted Jul 29, 2008·47 cites·33 claims
- 1489US8399349B2Materials and methods of forming controlled voidVRTIS RAYMOND NICHOLAS·Filed 2007·Granted Mar 19, 2013·13 cites·13 claims
- 1589US2025304804A1Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 1688US7468290B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2003·Granted Dec 23, 2008·33 cites·20 claims
- 1787US7932188B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2008·Granted Apr 26, 2011·9 cites·19 claims
- 1887US7285154B2Xenon recovery systemAIR PROD & CHEM·Filed 2004·Granted Oct 23, 2007·42 cites·24 claims
- 1986US8227395B2Process solutions containing surfactantsZHANG PENG·Filed 2010·Granted Jul 24, 2012·4 cites·5 claims
- 2084US2023348736A1Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 2183US8828505B2Plasma enhanced cyclic chemical vapor deposition of silicon-containing filmsTHRIDANDAM HAREESH·Filed 2012·Granted Sep 9, 2014·7 cites·6 claims
- 2283US8278222B2Selective etching and formation of xenon difluorideWU DINGJUN·Filed 2009·Granted Oct 2, 2012·12 cites·9 claims
- 2383US6641986B1Acetylenic diol surfactant solutions and methods of using sameAIR PROD & CHEM·Filed 2002·Granted Nov 4, 2003·36 cites·19 claims
- 2481US7521405B2Process solutions containing surfactantsAIR PROD & CHEM·Filed 2004·Granted Apr 21, 2009·16 cites·25 claims
- 2579US8129577B2Process and system for providing acetyleneMAYKUT TIMOTHY JOHN·Filed 2009·Granted Mar 6, 2012·2 cites·5 claims
- 2678US11725111B2Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2021·Granted Aug 15, 2023·0 cites·6 claims
- 2778US6783868B2Halogen addition for improved adhesion of CVD copper to barrierAIR PROD & CHEM·Filed 2002·Granted Aug 31, 2004·19 cites·18 claims
- 2876US8915992B2Process and system for providing acetyleneMAYKUT TIMOTHY JOHN·Filed 2012·Granted Dec 23, 2014·2 cites·5 claims
- 2976US7119032B2Method to protect internal components of semiconductor processing equipment using layered superlattice materialsAIR PROD & CHEM·Filed 2004·Granted Oct 10, 2006·14 cites·19 claims
- 3073US7470454B2Non-thermal process for forming porous low dielectric constant filmsAIR PROD & CHEM·Filed 2003·Granted Dec 30, 2008·14 cites·40 claims
- 3170US9447287B2Compositions and processes for depositing carbon-doped silicon-containing filmsXIAO MANCHAO·Filed 2012·Granted Sep 20, 2016·1 cites·24 claims
- 3269US6509266B1Halogen addition for improved adhesion of CVD copper to barrierAIR PROD & CHEM·Filed 2001·Granted Jan 21, 2003·12 cites·30 claims
- 3366US8846522B2Materials and methods of forming controlled voidAIR PROD & CHEM·Filed 2013·Granted Sep 30, 2014·1 cites·7 claims
- 3466US5569151AHandling and delivery system for dangerous gasesAIR PROD & CHEM·Filed 1995·Granted Oct 29, 1996·31 cites·10 claims
- 3566US2019287798A1Compositions and Processes for Depositing Carbon-Doped Silicon-Containing FilmsVERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 3665US8906455B2Low temperature deposition of silicon-containing filmsYANG LIU·Filed 2012·Granted Dec 9, 2014·1 cites·16 claims
- 3761US7434719B2Addition of D2 to H2 to detect and calibrate atomic hydrogen formed by dissociative electron attachmentAIR PROD & CHEM·Filed 2005·Granted Oct 14, 2008·1 cites·23 claims
- 3859US9293361B2Materials and methods of forming controlled voidAIR PROD & CHEM·Filed 2014·Granted Mar 22, 2016·0 cites·20 claims
- 3959US2009008426A1Addition of D2 to H2 to Detect and Calibrate Atomic Hydrogen Formed By Dissociative Electron attachmentAIR PROD & CHEM·Filed 2008·Application pending·0 cites
- 4058US7267842B2Method for removing titanium dioxide deposits from a reactorAIR PROD & CHEM·Filed 2004·Granted Sep 11, 2007·3 cites·20 claims
- 4155US2011171583A1Process Solutions Containing SurfactantsAIR PROD & CHEM·Filed 2010·Application pending·0 cites
- 4253US7371688B2Removal of transition metal ternary and/or quaternary barrier materials from a substrateAIR PROD & CHEM·Filed 2004·Granted May 13, 2008·5 cites·19 claims
- 4353US2008063984A1Process Solutions Containing SurfactantsAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 4453US2008207007A1Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon-Containing FilmsAIR PROD & CHEM·Filed 2008·Application pending·0 cites
- 4551US6857433B2Process for cleaning a glass-coating reactor using a reactive gasAIR PROD & CHEM·Filed 2002·Granted Feb 22, 2005·3 cites·25 claims
- 4648US2006196525A1Method for removing a residue from a chamberVRTIS RAYMOND N·Filed 2005·Application pending·0 cites
- 4748US2007224829A1Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch PlasmasAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 4846US2008124946A1Organosilane compounds for modifying dielectrical properties of silicon oxide and silicon nitride filmsAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 4945US2008047579A1Detecting the endpoint of a cleaning processJI BING·Filed 2006·Application pending·0 cites
- 5044US2004053172A1Acetylenic diol surfactant solutions and methods of using sameFiled 2003·Application pending·0 cites
Showing the top 50 of 67 patent records by PatentIndex Score.
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