Inventor · disambiguated record
Hachishiro Iizuka
Also filed as: IIZUKA HACHISHIRO
27 granted patents·19 pending applications·686 citations·filing 2002–2025
95Inventor score
Top patents by PatentIndex Score
46 records- 0198US8282769B2Shower head and plasma processing apparatus having sameIIZUKA HACHISHIRO·Filed 2010·Granted Oct 9, 2012·549 cites·13 claims
- 0295US8152925B2Baffle plate and substrate processing apparatusIIZUKA HACHISHIRO·Filed 2009·Granted Apr 10, 2012·36 cites·17 claims
- 0394US8366828B2Shower head and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Feb 5, 2013·19 cites·20 claims
- 0488US8608903B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Dec 17, 2013·9 cites·13 claims
- 0588US8236106B2Shower head and substrate processing apparatusIIZUKA HACHISHIRO·Filed 2009·Granted Aug 7, 2012·21 cites·20 claims
- 0683US8852387B2Plasma processing apparatus and shower headIIZUKA HACHISHIRO·Filed 2011·Granted Oct 7, 2014·6 cites·8 claims
- 0778US8852386B2Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2010·Granted Oct 7, 2014·5 cites·5 claims
- 0875US8747609B2Plasma processing apparatus and shower headIIZUKA HACHISHIRO·Filed 2010·Granted Jun 10, 2014·4 cites·8 claims
- 0975US8674607B2Plasma processing apparatus and processing gas supply structure thereofIIZUKA HACHISHIRO·Filed 2011·Granted Mar 18, 2014·3 cites·7 claims
- 1074US8758550B2Shower head and plasma processing apparatus having sameIIZUKA HACHISHIRO·Filed 2010·Granted Jun 24, 2014·3 cites·9 claims
- 1171US8758511B2Film forming apparatus and vaporizerIIZUKA HACHISHIRO·Filed 2005·Granted Jun 24, 2014·2 cites·25 claims
- 1269US8043471B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Oct 25, 2011·2 cites·24 claims
- 1367US8986495B2Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2010·Granted Mar 24, 2015·2 cites·5 claims
- 1464US7666260B2Vaporizer and semiconductor processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 23, 2010·9 cites·30 claims
- 1558US9117633B2Plasma processing apparatus and processing gas supply structure thereofIIZUKA HACHISHIRO·Filed 2011·Granted Aug 25, 2015·1 cites·13 claims
- 1657US9807862B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Oct 31, 2017·1 cites·13 claims
- 1757US2025201532A1Substrate processing device and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1856US7413611B2Gas reaction system and semiconductor processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Aug 19, 2008·5 cites·17 claims
- 1956US2009314435A1Plasma processing unitTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2054US8052364B2Coupling member and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Nov 8, 2011·0 cites·12 claims
- 2154US7513954B2Plasma processing apparatus and substrate mounting table employed thereinTOKYO ELECTRON LTD·Filed 2002·Granted Apr 7, 2009·4 cites·24 claims
- 2254US7232502B2Sheet-fed treating deviceTOKYO ELECTRON LTD·Filed 2002·Granted Jun 19, 2007·4 cites·16 claims
- 2352US8221581B2Gas supply mechanism and substrate processing apparatusIIZUKA HACHISHIRO·Filed 2008·Granted Jul 17, 2012·0 cites·20 claims
- 2452US2009000743A1Substrate processing apparatus and shower headTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2551US12463084B2Shower head and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Nov 4, 2025·0 cites·16 claims
- 2650US11414754B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Aug 16, 2022·0 cites·6 claims
- 2749US11476132B2Sealing structure, vacuum processing apparatus and sealing methodTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·0 cites·7 claims
- 2849US2025179630A1Substrate Treatment Device, Fluid Activation Device, Substrate Treatment Method, and Fluid Activation MethodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2948US2021079526A1Substrate processing apparatus and shower headTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 3046US11621151B2Upper electrode and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Apr 4, 2023·0 cites·14 claims
- 3145US2007227659A1Plasma etching apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3245US2009266300A1Substrate processing apparatus and substrate placing tableTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3344US2021233750A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 3442US9196461B2Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2011·Granted Nov 24, 2015·0 cites·9 claims
- 3542US2007022954A1Gas treatment device and heat readiting methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3642US2009038548A1Substrate treating apparatus and treating gas emitting mechanismTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3741US2012103523A1Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2011·Application pending·0 cites
- 3840US2004144492A1Plasma processing deviceIKEDA TARO·Filed 2002·Application pending·0 cites
- 3940US2007095284A1Gas treating device and film forming deviceIIZUKA HACHISHIRO·Filed 2006·Application pending·0 cites
- 4038US2011284165A1Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2011·Application pending·0 cites
- 4138US2022084798A1Plasma processing apparatus and electrode structureTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 4237US2017133245A1Substrate mounting mechanism and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 4337US2005000450A1Treatment subject elevating mechanism, and treating device using the sameFiled 2002·Application pending·0 cites
- 4434US2007261735A1Liquid Amount Monitoring Apparatus, Semiconductor Manufacturing Apparatus Having the Liquid Amount Monitoring Apparatus Mounted Thereon, and Liquid Material/Liquid Amount Monitoring MethodYASUMURO AKIRA·Filed 2005·Application pending·0 cites
- 4533US2010307686A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 4627USD581012SMiddle plate for the shower headTOKYO ELECTRON LTD·Filed 2005·Granted Nov 18, 2008·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →