Inventor · disambiguated record
David Hurley
Also filed as: HURLEY DAVID · HURLEY DAVID F
8 granted patents·2 pending applications·4 citations·filing 2015–2024
74Inventor score
Files withTOKYO ELECTRON LTD10
Top patents by PatentIndex Score
10 records- 0191US10003018B1Vertical multi-batch magnetic annealing systems for reduced footprint manufacturing environmentsTOKYO ELECTRON LTD·Filed 2017·Granted Jun 19, 2018·4 cites·30 claims
- 0275US2025120154A1Semiconductor Manufacturing Platform with In-Situ Electrical Bias and Methods ThereofTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0369US11837652B2Semiconductor processing system with in-situ electrical bias and methods thereofTOKYO ELECTRON LTD·Filed 2022·Granted Dec 5, 2023·0 cites·20 claims
- 0466US12211907B2Semiconductor manufacturing platform with in-situ electrical bias and methods thereofTOKYO ELECTRON LTD·Filed 2021·Granted Jan 28, 2025·0 cites·20 claims
- 0560US11335792B2Semiconductor processing system with in-situ electrical bias and methods thereofTOKYO ELECTRON LTD·Filed 2020·Granted May 17, 2022·0 cites·20 claims
- 0654US12235045B2Magnetic annealing equipment and methodTOKYO ELECTRON LTD·Filed 2022·Granted Feb 25, 2025·0 cites·20 claims
- 0754US11894240B2Semiconductor processing systems with in-situ electrical biasTOKYO ELECTRON LTD·Filed 2021·Granted Feb 6, 2024·0 cites·23 claims
- 0854US11527345B2Workpiece magnetizing system and method of operatingTOKYO ELECTRON LTD·Filed 2018·Granted Dec 13, 2022·0 cites·29 claims
- 0938US2020232090A1Substrate processing device and processing systemTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1032US10319905B2Method and system for performing post-etch annealing of a workpieceTOKYO ELECTRON LTD·Filed 2015·Granted Jun 11, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →