Inventor · disambiguated record
Erik Loopstra
Also filed as: LOOPSTRA ERIK · LOOPSTRA ERIK R · LOOPSTRA ERIK ROELOFF
9 granted patents·5 pending applications·119 citations·filing 1996–2025
85Inventor score
Top patents by PatentIndex Score
14 records- 0188US6765712B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Jul 20, 2004·30 cites·26 claims
- 0285US6226075B1Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devicesASM LITHOGRAPHY·Filed 1998·Granted May 1, 2001·50 cites·21 claims
- 0379US10908508B2Position measurement of optical elements in a lithographic apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Feb 2, 2021·1 cites·21 claims
- 0478US10509325B2Position measurement of optical elements in a lithographic apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Dec 17, 2019·1 cites·21 claims
- 0575US5767948ALithographic device with a three-dimensionally positionable mask holderPHILIPS CORP·Filed 1996·Granted Jun 16, 1998·37 cites·18 claims
- 0668US2021149309A1Position measurement of optical elements in a lithographic apparatusZEISS CARL SMT GMBH·Filed 2021·Application pending·0 cites
- 0768US2025264712A1Adaptive mirror with mechanical mediator layer and microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0865US12117731B2Method for producing a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Oct 15, 2024·0 cites·17 claims
- 0964US2023375939A1Method for producing a multi-part mirror of a projection illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1060US12372884B2Device for positioning and holding at least one optical element, measurement systemZEISS CARL SMT GMBH·Filed 2023·Granted Jul 29, 2025·0 cites·9 claims
- 1158US10599051B2Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Mar 24, 2020·0 cites·19 claims
- 1258US2024019613A1Method for producing a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1358US2024027730A1Method for producing a mirror of a lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1456US10481500B2Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this typeMANN HANS JUERGEN·Filed 2011·Granted Nov 19, 2019·0 cites·14 claims
Join the waitlist — get patent alerts
Get an alert when Erik Loopstra files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →