Inventor · disambiguated record
Yoshitaka Komuro
Also filed as: KOMURO YOSHITAKA
42 granted patents·8 pending applications·132 citations·filing 2007–2023
97Inventor score
Top patents by PatentIndex Score
50 records- 0196US9244347B2Resist composition, compound, polymeric compound and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jan 26, 2016·19 cites·18 claims
- 0293US11221557B2Resist composition, method of forming resist pattern, compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Jan 11, 2022·8 cites·37 claims
- 0393US10394122B2Resist composition, method for forming resist pattern, compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Aug 27, 2019·6 cites·11 claims
- 0493US9766541B2Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Sep 19, 2017·10 cites·16 claims
- 0593US9045398B2Sulfonium salt and photo-acid generatorSAN APRO LTD·Filed 2014·Granted Jun 2, 2015·11 cites·6 claims
- 0692US11256169B2Resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Feb 22, 2022·7 cites·31 claims
- 0790US9164379B2Resist composition, method for forming resist pattern, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Oct 20, 2015·6 cites·12 claims
- 0889US11281099B2Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compoundTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Mar 22, 2022·2 cites·8 claims
- 0989US9341947B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted May 17, 2016·4 cites·20 claims
- 1089US9005874B2Compound, polymeric compound, acid generator, resist composition, and method of forming resist patternKOMURO YOSHITAKA·Filed 2012·Granted Apr 14, 2015·13 cites·11 claims
- 1186US10295905B2Resist composition, method for forming resist pattern, and polymer compoundTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted May 21, 2019·5 cites·6 claims
- 1286US9354515B2Resist composition, acid generator, polymeric compound and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted May 31, 2016·5 cites·17 claims
- 1386US9164380B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Oct 20, 2015·5 cites·6 claims
- 1483US10366888B2Pattern forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Jul 30, 2019·3 cites·17 claims
- 1582US7955777B2Compound, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 7, 2011·4 cites·14 claims
- 1681US9063416B2Resist composition, method of forming resist pattern and compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jun 23, 2015·3 cites·8 claims
- 1780US9366960B2Negative resist composition, method of forming resist pattern, and complexTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jun 14, 2016·2 cites·10 claims
- 1879US10324377B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jun 18, 2019·2 cites·8 claims
- 1977US9104101B2Resist composition, method of forming resist pattern and polymeric compoundMATSUZAWA KENSUKE·Filed 2012·Granted Aug 11, 2015·4 cites·11 claims
- 2075US9499646B2Negative resist composition, method of forming resist pattern and complexTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Nov 22, 2016·1 cites·20 claims
- 2175US8497395B2CompoundUTSUMI YOSHIYUKI·Filed 2011·Granted Jul 30, 2013·1 cites·1 claims
- 2274US8785106B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Jul 22, 2014·2 cites·3 claims
- 2371US11667605B2Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compoundTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Jun 6, 2023·0 cites·18 claims
- 2470US8298748B2Positive resist composition, method of forming resist pattern, and polymeric compoundSESHIMO TAKEHIRO·Filed 2010·Granted Oct 30, 2012·2 cites·6 claims
- 2561US11780946B2Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Oct 10, 2023·0 cites·10 claims
- 2658US2023408917A1Resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 2755US11560444B2Method of producing block copolymer capable of creating specific structure patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Jan 24, 2023·0 cites·7 claims
- 2854US7858287B2Photosensitive resin, and photosensitive compositionHYOGO PREFECTURE·Filed 2007·Granted Dec 28, 2010·7 cites·7 claims
- 2952US2021055656A1Resist composition, method of forming resist pattern, polymeric compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 3051US11747724B2Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming methodAIST·Filed 2020·Granted Sep 5, 2023·0 cites·8 claims
- 3151US2022171286A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Application pending·0 cites
- 3250US2021141307A1Resist composition and method of forming resist patternTOKYO OHKA KYGYO CO LTD·Filed 2020·Application pending·0 cites
- 3349US9164381B2Resist composition, method of forming resist pattern, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Oct 20, 2015·0 cites·9 claims
- 3447US9557647B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jan 31, 2017·0 cites·13 claims
- 3545US11709425B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Jul 25, 2023·0 cites·14 claims
- 3645US10414918B2Method of preparing polymer compoundTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Sep 17, 2019·0 cites·12 claims
- 3745US9235123B2Resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jan 12, 2016·0 cites·3 claims
- 3844US11703756B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Jul 18, 2023·0 cites·15 claims
- 3944US9606433B2Resist composition, method of forming resist pattern, polymeric compound and compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Mar 28, 2017·0 cites·12 claims
- 4044US9411227B2Resist composition, method of forming resist pattern, compound, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Aug 9, 2016·0 cites·17 claims
- 4143US10317797B2Pattern forming method for forming a patternTOKYO ELECTRON LTD·Filed 2017·Granted Jun 11, 2019·0 cites·6 claims
- 4243US8614049B2Resist composition and method of forming resist patternUTSUMI YOSHIYUKI·Filed 2011·Granted Dec 24, 2013·0 cites·6 claims
- 4342US10100134B2Method for manufacturing polymer compoundTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·0 cites·2 claims
- 4442US9862695B2Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compoundDAICEL CORP·Filed 2015·Granted Jan 9, 2018·0 cites·20 claims
- 4542US2014220492A1Resist composition, polymeric compound, compound and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 4639US2013065180A1Resist composition and method of forming resist patternKUROSAWA TSUYOSHI·Filed 2012·Application pending·0 cites
- 4736US9639002B2Method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted May 2, 2017·0 cites·4 claims
- 4836US2012015299A1Resist composition, method of forming resist pattern, novel compound, and acid generatorKOMURO YOSHITAKA·Filed 2011·Application pending·0 cites
- 4936US2012015297A1Resist composition, method of forming resist pattern, novel compound, and acid generatorKOMURO YOSHITAKA·Filed 2011·Application pending·0 cites
- 5035US9017919B2Resist composition, method of forming resist pattern, novel compound and acid generatorUTSUMI YOSHIYUKI·Filed 2011·Granted Apr 28, 2015·0 cites·9 claims
Join the waitlist — get patent alerts
Get an alert when Yoshitaka Komuro files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →