Inventor · disambiguated record
Shiela R. Woodard
Also filed as: WOODARD SHIELA · WOODARD SHIELA R · WOODARD SHIELA RHEA
9 granted patents·4 pending applications·40 citations·filing 2002–2023
81Inventor score
Top patents by PatentIndex Score
13 records- 0189US6652674B1Oxidation resistant molybdenumUNITED TECHNOLOGIES CORP·Filed 2002·Granted Nov 25, 2003·38 cites·3 claims
- 0288US10633760B2Method to prevent gap in cylindral seeds around an internal ceramic coreUNITED TECHNOLOGIES CORP·Filed 2018·Granted Apr 28, 2020·2 cites·10 claims
- 0387US12434295B2Arcuate seed casting methodRTX CORP·Filed 2023·Granted Oct 7, 2025·0 cites·20 claims
- 0482US12005493B2Arcuate seed casting methodRAYTHEON TECH CORP·Filed 2022·Granted Jun 11, 2024·0 cites·20 claims
- 0580US11806780B2Arcuate seed casting methodRAYTHEON TECH CORP·Filed 2021·Granted Nov 7, 2023·0 cites·20 claims
- 0679US12123104B2Arcuate seed casting methodRAYTHEON TECH CORP·Filed 2022·Granted Oct 22, 2024·0 cites·19 claims
- 0774US11383295B2Arcuate seed casting methodRAYTHEON TECH CORP·Filed 2020·Granted Jul 12, 2022·0 cites·17 claims
- 0874US11377753B2Arcuate seed casting methodRAYTHEON TECH CORP·Filed 2020·Granted Jul 5, 2022·0 cites·20 claims
- 0974US11198175B2Arcuate seed casting methodRAYTHEON TECH CORP·Filed 2020·Granted Dec 14, 2021·0 cites·18 claims
- 1052US2021324499A1Metallic alloyRAYTHEON TECH CORP·Filed 2021·Application pending·0 cites
- 1150US2010260613A1Process for preventing the formation of secondary reaction zone in susceptible articles, and articles manufactured using sameUNITED TECHNOLOGIES CORP·Filed 2006·Application pending·0 cites
- 1246US2011256421A1Metallic coating for single crystal alloysUNITED TECHNOLOGIES CORP·Filed 2010·Application pending·0 cites
- 1342US2017304888A1Casting core and method for testing a hollow metal articleUNITED TECHNOLOGIES CORP·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Shiela R. Woodard files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →