Inventor · disambiguated record
Vinayak Rastogi
Also filed as: RASTOGI VINAYAK
11 granted patents·2 pending applications·160 citations·filing 2015–2019
88Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD13
Top patents by PatentIndex Score
13 records- 0197US9666447B2Method for selectivity enhancement during dry plasma etchingTOKYO ELECTRON LTD·Filed 2015·Granted May 30, 2017·41 cites·23 claims
- 0297US9607843B2Method for roughness improvement and selectivity enhancement during arc layer etch via adjustment of carbon-fluorine contentTOKYO ELECTRON LTD·Filed 2015·Granted Mar 28, 2017·40 cites·20 claims
- 0397US9576816B2Method for roughness improvement and selectivity enhancement during arc layer etch using hydrogenTOKYO ELECTRON LTD·Filed 2015·Granted Feb 21, 2017·38 cites·19 claims
- 0497US9530667B2Method for roughness improvement and selectivity enhancement during arc layer etch using carbonTOKYO ELECTRON LTD·Filed 2015·Granted Dec 27, 2016·38 cites·20 claims
- 0579US10366902B2Methods for cyclic etching of a patterned layerTOKYO ELECTRON LTD·Filed 2017·Granted Jul 30, 2019·2 cites·12 claims
- 0671US10535531B2Method of cyclic plasma etching of organic film using carbon-based chemistryTOKYO ELECTRON LTD·Filed 2018·Granted Jan 14, 2020·1 cites·21 claims
- 0760US10971373B2Methods for cyclic etching of a patterned layerTOKYO ELECTRON LTD·Filed 2019·Granted Apr 6, 2021·0 cites·7 claims
- 0849US10381235B2Method of selective silicon nitride etchingTOKYO ELECTRON LTD·Filed 2017·Granted Aug 13, 2019·0 cites·14 claims
- 0947US10541146B2Method of cyclic plasma etching of organic film using sulfur-based chemistryTOKYO ELECTRON LTD·Filed 2018·Granted Jan 21, 2020·0 cites·20 claims
- 1042US9947597B2Defectivity metrology during DSA patterningTOKYO ELECTRON LTD·Filed 2017·Granted Apr 17, 2018·0 cites·20 claims
- 1140US2018294168A1Method for anisotropic dry etching of titanium-containing filmsTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1238US2017345673A1Method of selective silicon oxide etchingTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1337US9576812B2Partial etch memorization via flash additionTOKYO ELECTRON LTD·Filed 2016·Granted Feb 21, 2017·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →